Patents by Inventor Mary Kathryn Gutberlet

Mary Kathryn Gutberlet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithographic method and mask devices utilized for multiple exposures in the field of a feature
    Patent number: 8268517
    Abstract: A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tf that is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tc that is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.
    Type: Grant
    Filed: March 1, 2011
    Date of Patent: September 18, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Mary Kathryn Gutberlet, Rambod Nader, Michael Andrew Parker, Douglas Johnson Werner
  • PHOTOLITHOGRAPHIC METHOD AND MASK DEVICES UTILIZED FOR MULTIPLE EXPOSURES IN THE FIELD OF A FEATURE
    Publication number: 20110151360
    Abstract: A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tf that is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tc that is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.
    Type: Application
    Filed: March 1, 2011
    Publication date: June 23, 2011
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Mary Kathryn Gutberlet, Rambod Nader, Michael Andrew Parker, Douglas Johnson Werner
  • Photolithographic method and mask devices utilized for multiple exposures in the field of a feature
    Patent number: 7919231
    Abstract: A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through the set of masks using the masks sequentially to create at least one character field area of the photoresist, and a character area of the photoresist. Ultimately, because the character areas of the photoresist are exposed to some light energy density from the non-opaque mask character field areas during each mask exposure step, the total photoresist exposure time to create the series of characters is less than that of the prior art.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: April 5, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Mary Kathryn Gutberlet, Rambod Nader, Michael Andrew Parker, Douglas Johnson Werner
  • Method of manufacturing a magnetic head with integration of a small flash field, zero bias, and non-reactive ion milling for pole tip uniformity
    Patent number: 7818875
    Abstract: A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a P2 pole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P1) using the second pole (P2) as a mask.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: October 26, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamame, Daniel Wayne Bedell, Mary Kathryn Gutberlet, Clarence Kai-Sheng Hsieh, Aron Pentek, Yi Zheng
  • System and method for forming serial numbers on HDD wafers
    Patent number: 7531907
    Abstract: Both the wafer serial number and slider region location indicia on the wafer are formed on the front surface of the wafer using optical principles, i.e., without using a laser.
    Type: Grant
    Filed: June 13, 2005
    Date of Patent: May 12, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Unal Murat Guruz, Mary Kathryn Gutberlet, Douglas Johnson Werner, Yvette Chung Nga Winton
  • Photolithographic method and mask devices utilized for multiple exposures in the field of a feature
    Publication number: 20090081562
    Abstract: A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through the set of masks using the masks sequentially to create at least one character field area of the photoresist, and a character area of the photoresist. Ultimately, because the character areas of the photoresist are exposed to some light energy density from the non-opaque mask character field areas during each mask exposure step, the total photoresist exposure time to create the series of characters is less than that of the prior art.
    Type: Application
    Filed: September 4, 2007
    Publication date: March 26, 2009
    Inventors: Mary Kathryn Gutberlet, Rambod Nader, Michael Andrew Parker, Douglas Johnson Werner