Abstract: A dilution apparatus for continuously producing a diluted liquid sample, e.g., a chemical-mechanical polishing slurry, for analysis, e.g., particle size distribution, comprises a mixer manifold, a diluent-introducing means, e.g., a flow controlling device, for introducing a diluent, e.g., water, into the mixer manifold, and a liquid sample introducing means, e.g., a pump, for introducing the sample into the mixer manifold. The mixer manifold includes a plurality of ports for receiving a plurality of liquid samples from a plurality of sample points. The dilution apparatus can include a second mixer manifold for continuously producing a second diluted liquid sample, and it can be associated with one or more sensors operable to measure sample properties, e.g., an optical particle counter. The sensors can be operated simultaneously, and the measurements of the sensors can be compared.

Abstract: An apparatus and method for drawing a sample of a chemical-mechanical polishing slurry for analysis of at least one property, e.g., particle size distribution, is described.

Abstract: A dilution apparatus for continuously producing a diluted liquid sample, e.g., a chemical-mechanical polishing slurry, for analysis, e.g., particle size distribution, comprises a mixer manifold, a diluent-introducing means, e.g., a flow controlling device, for introducing a diluent, e.g., water, into the mixer manifold, and a liquid sample introducing means, e.g., a pump, for introducing the sample into the mixer manifold. The mixer manifold includes a plurality of ports for receiving a plurality of liquid samples from a plurality of sample points. The dilution apparatus can include a second mixer manifold for continuously producing a second diluted liquid sample, and it can be associated with one or more sensors operable to measure sample properties, e.g., an optical particle counter. The sensors can be operated simultaneously, and the measurements of the sensors can be compared.

Abstract: An apparatus and method for drawing a sample of a chemical-mechanical polishing slurry for analysis of at least one property, e.g., particle size distribution, is described.

Abstract: A sampling system for use with an optical particle analyzer is disclosed. The sampling system includes a manifold having multiple ports, with each port receiving a chemical-mechanical polishing slurry. Each of the slurries enter the manifold through a separate slurry line. The optical particle analyzer is in operational association with the manifold in order to selectively measure the slurries after going through the manifold. The system flushes the manifold with a flushing fluid, such as ultra-pure water, to flush the slurry sample out of the manifold, followed by a purging with nitrogen to remove the ultra-pure water from the manifold, overall contributing to optimal slurry measurement. The system permits sampling of multiple slurries with a single particle analyzer.