Patents by Inventor Masaaki Asakura

Masaaki Asakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9975779
    Abstract: A CVD-SiC formed body has low light transmittance and high resistivity, and may suitably be used as a member for an etcher that is used for a semiconductor production process, for example. The SiC formed body is formed using a CVD method, and includes 1 to 30 mass ppm of boron atoms, and more than 100 mass ppm and 1000 mass ppm or less of nitrogen atoms. The SiC formed body preferably has a resistivity of more than 10 ?·cm and 100,000 ?·cm or less, and a light transmittance at a wavelength of 950 nm of 0 to 1%.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: May 22, 2018
    Assignee: TOKAI CARBON CO., LTD.
    Inventors: Takaomi Sugihara, Masaaki Asakura, Takeshi Tokunaga, Tetsuya Sadaki
  • Publication number: 20150151975
    Abstract: A CVD-SiC formed body has low light transmittance and high resistivity, and may suitably be used as a member for an etcher that is used for a semiconductor production process, for example. The SiC formed body is formed using a CVD method, and includes 1 to 30 mass ppm of boron atoms, and more than 100 mass ppm and 1000 mass ppm or less of nitrogen atoms. The SiC formed body preferably has a resistivity of more than 10 ?·cm and 100,000 ?·cm or less, and a light transmittance at a wavelength of 950 nm of 0 to 1%.
    Type: Application
    Filed: September 13, 2012
    Publication date: June 4, 2015
    Applicant: TOKAI CARBON CO., LTD.
    Inventors: Takaomi Sugihara, Masaaki Asakura, Takeshi Tokunaga, Tetsuya Sadaki