Patents by Inventor Masaaki Kishimura
Masaaki Kishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7816471Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: December 23, 2009Date of Patent: October 19, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100099836Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: ApplicationFiled: December 23, 2009Publication date: April 22, 2010Inventors: Hitoshi WATANABE, Hidetaka Hayamizu, Masaaki Kishimura
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Patent number: 7662897Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: January 20, 2006Date of Patent: February 16, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Patent number: 7655743Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: June 26, 2008Date of Patent: February 2, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20080268377Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: ApplicationFiled: June 26, 2008Publication date: October 30, 2008Inventors: Hitoshi WATANABE, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20060116494Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: ApplicationFiled: January 20, 2006Publication date: June 1, 2006Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20060116493Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: ApplicationFiled: January 20, 2006Publication date: June 1, 2006Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Patent number: 7015291Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: March 14, 2003Date of Patent: March 21, 2006Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20050238990Abstract: A photoresist resin of the invention contains at least a constitutional repeating unit A containing a group capable of partially leaving by the action of an acid to thereby become soluble in an alkali, and a constitutional repeating unit B containing an alicyclic skeleton having a polar group, and has a weight-average molecular weight of 3000 to 15000 and has a content of polymer fractions each having a molecular weight exceeding 40000 of 4 percent by weight or less of the total resin. The molecular weight distribution (Mw/Mn) of the resin is, for example, from about 1.1 to about 3.0, and preferably from about 1.5 to about 2.5.Type: ApplicationFiled: June 17, 2004Publication date: October 27, 2005Inventors: Shigeki Kambara, Masaaki Kishimura
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Publication number: 20050100815Abstract: The process for producing a photoresist polymeric compound of the present invention is characterized by a process for producing a photoresist polymeric compound having a repeated unit corresponding to at least one monomer selected from a monomer (a) having a lactone skeleton, a monomer (b) having a group which becomes soluble in alkali by elimination with an acid and a monomer (c) having an alicyclic skeleton having a hydroxyl group, wherein the process comprises the step of; (i) the polymerization step (A) polymerizing a mixture of monomers containing at least one monomer selected from the above monomers (a), (b) and (c), and the extraction step (B) of extracting a polymer formed in the polymerization by using an organic solvent and water to partition the formed polymer into an organic solvent layer and a metal component as an impurity into an aqueous layer, or (ii) the step (I) passing a polymer solution, which contains a polymer having a repeated unit corresponding to at least one of the above monomers (a)Type: ApplicationFiled: March 14, 2003Publication date: May 12, 2005Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20040253644Abstract: The present invention provides a method for obtaining a novel antigen to which antibodies associated with rheumatoid arthritis (RA) reacts specifically and detecting RA patients by using the antigen, as well as a composition and a kit for the same. cDNA libraries were made from synovial cells, and a screening for the antigen was conducted by using IgG in synovial fluid from RA patients. Thus, a clone A polypeptide, which is a novel polypeptide as a RA antigen, and follistatin related protein (FRP), which is known as a polypeptide but novel as a RA antigen, were isolated. An antibody to these polypeptide antigens or their derivatives was detected. These polypeptides could provide a marker for prediction or diagnosis of RA.Type: ApplicationFiled: July 2, 2004Publication date: December 16, 2004Applicant: Kaneka CorporationInventors: Shoichi Osaki, Masao Tanaka, Masaaki Kishimura, Kazuwa Nakao, Fumio Osakada
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Patent number: 5252440Abstract: A methacrylic resin composition for optical discs comprising 100 parts by weight of a copolymer composed of from 95 to 99.7% by weight of methyl methacrylate (A) and from 0.3 to 5% by weight of at least one monomer (B) selected from the group consisting of methyl acrylate, ethyl acrylate and butyl acrylate, and having a heat distortion temperature of at least 95.degree. C., a melt flow rate of from 1.0 to 10.0 g/10 min and a tensile strength of at least 660 kg/cm.sup.2, and from 0.05 to 2.0 parts by weight of at least one releasing agent (C) selected from the group consisting of a fatty acid alkyl ester of the formula R.sub.1 COOR.sub.2 wherein each of R.sub.1 and R.sub.2 is an alkyl group having from 5 to 20 carbon atoms, cetanol and a stearic acid glycerol ester.Type: GrantFiled: April 13, 1992Date of Patent: October 12, 1993Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Fumio Sato, Yasunori Shimomura, Masaaki Kishimura
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Patent number: 5147537Abstract: The present invention relates to a carrier for affinity chromatography comprising an insoluble carrier and antibodies which are modified by activated polyethyleneglycol and immobilized on the insoluble carrier, the antibodies being modified by activated polyethylene glycol at a location other than at an immobilizing site.Type: GrantFiled: January 31, 1992Date of Patent: September 15, 1992Assignee: Chisso CorporationInventors: Eizo Sada, Shigeo Katoh, Akihiko Kondo, Masaaki Kishimura
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Patent number: 4604416Abstract: A methacrylic resin composition having excellent impact resistance and antistatic property is described. This composition comprises (I) 50-99.8 wt. % of a methacrylic resin comprised of 80-100 wt. % of methyl methacrylate units and 0-20 wt. % of other copolymerizable monomer units, (II) 0.1-40 wt. % of a rubbery component which is a polymer containing an elastomeric portion comprising at least 50 wt. % of 1,3-butadiene and/or acrylic acid ester units, and (III) 0.1-10 wt. % of a specified compound.Type: GrantFiled: December 13, 1984Date of Patent: August 5, 1986Assignee: Mitsubishi Rayon Company Ltd.Inventors: Yoshio Nakai, Katsusuke Yamauchi, Masaaki Kishimura, Masamitsu Tateyama
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Patent number: 4510279Abstract: A methacrylate resin composition for optical information recording medium, excellent in releasability from mold, consisting of (A) 100 parts by weight of a methacrylate resin and (B) 0.1 to 3.0 parts by weight of a surface active agent having a fluoroalkyl group.Type: GrantFiled: August 6, 1982Date of Patent: April 9, 1985Assignees: Mitsubishi Rayon Co., Ltd., Sony CorporationInventors: Masaaki Kishimura, Nobuyuki Arakawa