Patents by Inventor Masaaki Kobata

Masaaki Kobata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • X-ray irradiation device and analysis device
    Patent number: 9080947
    Abstract: [Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: July 14, 2015
    Assignees: National Institute for Materials Science, Ulvac-PHI, Inc.
    Inventors: Hiromichi Yamazui, Keisuke Kobayashi, Hideo Iwai, Masaaki Kobata
  • X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE
    Publication number: 20130016813
    Abstract: [Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.
    Type: Application
    Filed: March 30, 2011
    Publication date: January 17, 2013
    Applicants: ULVAC-PHI, INC., NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Hiromichi Yamazui, Keisuke Kobayashi, Hideo Iwai, Masaaki Kobata