Patents by Inventor Masaaki Miyaji

Masaaki Miyaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220380503
    Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.
    Type: Application
    Filed: August 5, 2022
    Publication date: December 1, 2022
    Applicants: JSR CORPORATION, JSR LIFE SCIENCES CORPORATION
    Inventors: Yingjia XU, Masaaki MIYAJI, Kouji TAMORI, Tokio SAWAI, Hiroyuki HONMA, Naoki HAYASHI, Shin-ya OMOTE
  • Patent number: 11493506
    Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: November 8, 2022
    Assignees: JSR CORPORATION, JSR LIFE SCIENCES CORPORATION
    Inventors: Yingjia Xu, Masaaki Miyaji, Kouji Tamori, Tokio Sawai, Hiroyuki Honma, Naoki Hayashi, Shin-ya Omote
  • Publication number: 20220226512
    Abstract: Composite particles, each of which is obtained by forming, on the surface of a gadolinium oxide-containing particle, a cover film that contains a polymer obtained by polymerizing a monomer component containing a monomer having an ethylenically unsaturated bond; a macrophage imaging agent which contains the composite particles; and a method for producing composite particles, wherein a monomer component containing a monomer having an ethylenically unsaturated bond and gadolinium oxide-containing particles are mixed with each other, and after emulsifying the thus-obtained monomer component-containing mixture in water in the presence of a surfactant and a polymerization initiator in water, the monomer component is polymerized, thereby forming cover films on the surfaces of the gadolinium oxide-containing particles.
    Type: Application
    Filed: May 27, 2020
    Publication date: July 21, 2022
    Applicants: KYOTO UNIVERSITY, NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER, JSR CORPORATION
    Inventors: Teruyuki KONDO, Yu KIMURA, Aoi SON, Tetsuya MATSUDA, Hirohiko IMAI, Hirokazu KOSEKI, Tomohiro AOKI, Katsuyuki TAKASE, Masaaki MIYAJI, Koji TAMORI, Takeaki MASUDA, Hirokazu KAI
  • Publication number: 20200300847
    Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.
    Type: Application
    Filed: February 9, 2017
    Publication date: September 24, 2020
    Inventors: Yingjia XU, Masaaki MIYAJI, Kouji TAMORI, TOKIO SAWAI, HIROYUKI HONMA, NAOKI HAYASHI, SHIN-YA OMOTE
  • Patent number: 9051355
    Abstract: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. R—R2??(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R2.
    Type: Grant
    Filed: March 23, 2011
    Date of Patent: June 9, 2015
    Assignee: JSR CORPORATION
    Inventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yusuke Okano, Masaki Momiyama, Takahiro Kawai
  • Patent number: 8846877
    Abstract: An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: September 30, 2014
    Assignee: JSR Corporation
    Inventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yuusuke Okano, Masaki Momiyama, Takahiro Kawai
  • Publication number: 20130041135
    Abstract: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. R—R2 ??(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R2.
    Type: Application
    Filed: March 23, 2011
    Publication date: February 14, 2013
    Applicant: JSR CORPORATION
    Inventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yusuke Okano, Masaki Momiyama, Takahiro Kawai
  • Publication number: 20120115130
    Abstract: A target cell detection method includes performing a test measurement on a dispersion to obtain a measurement result 1, the test measurement being an optical or electromagnetic measurement, and the dispersion including labeled particles and target cells, the labeled particles being particles on each of which a substance that specifically binds to a specific molecule present on a surface of each of the target cells is immobilized, performing measurement that is identical with the test measurement on a dispersion that includes the target cells, but does not include the labeled particles to obtain a measurement result 2, and comparing the measurement result 1 with the measurement result 2.
    Type: Application
    Filed: June 16, 2010
    Publication date: May 10, 2012
    Applicant: JSR CORPORATION
    Inventors: Toshihiko Imai, Masaaki Miyaji
  • Publication number: 20110262748
    Abstract: An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.
    Type: Application
    Filed: September 24, 2009
    Publication date: October 27, 2011
    Applicant: JSR Corporation
    Inventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yuusuke Okano, Masaki Momiyama, Takahiro Kawai
  • Patent number: 7202016
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: April 10, 2007
    Assignee: JSR Corporation
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
  • Patent number: 7105269
    Abstract: 1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8 is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: September 12, 2006
    Assignee: JSR Corporation
    Inventors: Tomoki Nagai, Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji
  • Publication number: 20050214680
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
    Type: Application
    Filed: April 28, 2005
    Publication date: September 29, 2005
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
  • Patent number: 6933094
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: August 23, 2005
    Assignee: JSR Corporation
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
  • Publication number: 20030157423
    Abstract: 1.
    Type: Application
    Filed: December 18, 2002
    Publication date: August 21, 2003
    Inventors: Tomoki Nagai, Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji
  • Patent number: 6517992
    Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: February 11, 2003
    Assignee: JSR Corporation
    Inventors: Yong Wang, Eiichi Kobayashi, Masaaki Miyaji, Jun Numata, Tsutomu Shimokawa
  • Publication number: 20020058201
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), 1
    Type: Application
    Filed: September 18, 2001
    Publication date: May 16, 2002
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa