Patents by Inventor Masaaki Otsuki

Masaaki Otsuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4828739
    Abstract: The present invention concerns a lubricating composition which comprises:(A) 100 parts by weight of polyorganosiloxane having a viscosity of 50 cSt or more at 25.degree. C., wherein an organic group bonded to a silicon atom being a monovalent hydrocarbon group containing no aliphatic unsaturated bonding and(B) 0.01 to 7 parts by weight of polymethylsilsesquioxane powder having an average particle size of 0.05 to 50 .mu.m.Also, the present invention concerns a hydraulic fluid which comprises:(C) 100 parts by weight of polyorganosiloxane having a viscosity of 500 cSt or more at 25.degree. C., wherein an organic group bonded to a silicon atom being a methyl group or a phenyl group, and0.01 to 7 parts by weight of Component (B) as mentioned above.
    Type: Grant
    Filed: April 13, 1988
    Date of Patent: May 9, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Yoshiyuki Satoh, Shinji Kida, Hiroshi Kimura, Masaaki Otsuki
  • Patent number: 4602959
    Abstract: Disclosed is a method for preventing multiplication of algae which is characterized by coating the surfaces of solid materials with a silicone emulsion composition prepared by emulsion polymerization of:(1) 0.1 to 60% by weight of a reaction product prepared by reacting(A) 50 to 99.9% by weight of a polydiorganosilozane having more than one silanol group on the average in each molecule and having a viscosity of 5 to 10,000 cSt at 25.degree. C. with(B) 0.1 to 50% by weight of a product prepared by reacting (a) 1 mol of a compound represented by the formula: ##STR1## wherein Q.sup.1 is a monovalent group selected from the group consisting of a hydrogen atom, --CH.sub.3, --CH.sub.2 CH.sub.2 NH.sub.2 and --CH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, R.sup.1 is a divalent hydrocarbon group having 1 to 4 carbon atoms, R.sup.2 and R.sup.3 are monovalent hydrocarbon groups each having 1 to 4 carbon atoms, and a is an integer of 0 or 1,with (b) 0.5 to 3.
    Type: Grant
    Filed: April 17, 1985
    Date of Patent: July 29, 1986
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Akitsugu Kurita, Shinji Kida, Masaaki Otsuki
  • Patent number: 4515979
    Abstract: A process for preventing odor in a polyoxyalkylene group-containing polyorganosiloxane comprising adding phytic acid to the polyoxyalkylene group-containing polyorganosiloxane during and/or after its production.
    Type: Grant
    Filed: June 21, 1984
    Date of Patent: May 7, 1985
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Masaaki Otsuki, Shinji Kida
  • Patent number: 4462828
    Abstract: A polishing agent composition containing a polyorganosiloxane preparation comprising:(A) from 4 to 40% by weight of a benzene soluble polyorganosiloxane resin comprising:(1) 70 to 100 mole percent (R.sup.1).sub.3 SiO.sub.1/2 units, and(2) 0 to 30 mole percent (R.sup.2).sub.2 SiO units and having Si bonded OR.sup.3 groups;(B) from 55 to 95% by weight of a liquid linear or branched polyorganosiloxane terminated by (HO)(R.sup.4).sub.2 SiO.sub.1/2 units or (R.sup.4).sub.3 SiO.sub.1/2 units, and whose units other than the terminal units comprise 90 to 100 mole percent (R.sup.5).sub.2 SiO units and 0 to 10 mole percent(R.sup.5).sub.a SiO.sub.
    Type: Grant
    Filed: June 13, 1983
    Date of Patent: July 31, 1984
    Assignee: General Electric Company
    Inventor: Masaaki Otsuki