Patents by Inventor Masaaki Tsuchihashi

Masaaki Tsuchihashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040152810
    Abstract: An additive to a polyester base synthetic resin containing a plasticizer that comprises at least one compound selected from hydroxy aliphatic monocarboxylic acid ester and carboxylic acid amide is provided. Also, a polyester base synthetic resin composition comprising a polyester-base synthetic resin, a plasticizer, and at least one compound selected from hydroxy aliphatic monocarboxylic acid ester and carboxylic acid amide are also provided. Further, the invention provides a plasticizer for biodegradable resins that can impart flexibility without disturbing the transparency of the biodegradable resins. The plasticizer for biodegradable resins comprises a compound selected from (i) to (III) below. A biodegradable composition comprises the plasticizer.
    Type: Application
    Filed: November 10, 2003
    Publication date: August 5, 2004
    Inventors: Akira Takenaka, Masaaki Tsuchihashi
  • Patent number: 6559209
    Abstract: A rubber composition and method of making a rubber composition which is improved in a dispersibility of silica into rubber, a heat generating property and an abrasion property.
    Type: Grant
    Filed: October 9, 1997
    Date of Patent: May 6, 2003
    Assignees: Bridgestone Corporation, Kao Corporation
    Inventors: Shunji Araki, Masaaki Tsuchihashi, Isao Nishi
  • Patent number: 6416618
    Abstract: There is described a wafer processing apparatus intended to efficiently secure a wafer on an electrostatic chuck. A heater is disposed in a processing chamber for heating a wafer, and a dielectric plate for supporting the wafer is also disposed in the processing chamber. First and second electrodes are embedded in the dielectric plate, and first and second variable D.C. power supplies are disposed so as to supply voltages to the first and second electrodes, respectively. After the wafer has been placed on an electrostatic chuck, the wafer is pre-heated before being subjected to attraction force. After completion of the pre-heating phase, the first and second D.C. power supplies supply voltages to the first and second electrodes, thus securing the wafer on the dielectric plate.
    Type: Grant
    Filed: July 16, 1999
    Date of Patent: July 9, 2002
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Denki Engineering Co., Ltd.
    Inventors: Masaaki Tsuchihashi, Minoru Hanazaki, Hideki Oura
  • Publication number: 20020042462
    Abstract: An additive for a rubber composition consists essentially of an ester of (i) an aliphatic polyvalent carboxylic acid with (iii) a (poly)oxyalkylene derivative, and having at least one carboxyl group in its molecule, or an ester of (ii) an aromatic polyvalent carboxylic acid with (iii) a (poly)oxyalkylene derivative, and having at least one carboxyl group bonded to an aromatic ring in its molecule. And also, it relates to an additive composition, a rubber composition and a pneumatic tire using such an additive for a rubber composition.
    Type: Application
    Filed: August 8, 2001
    Publication date: April 11, 2002
    Applicant: BRIDGESTONE CORPORATION
    Inventors: Daisuke Nohara, Jingo Shirasaka, Isao Nishi, Masaaki Tsuchihashi, Tetsuo Takano
  • Patent number: 6355710
    Abstract: A rubber composition comprising (A) at least one natural or synthetic diene rubber, (B) an inorganic filler comprising at least one of silica and silicates as the main component and (C) an addition salt of an amine represented by general formula (I): wherein R1 represents a C8 to C24 alkyl group, an aryl group or an aralkyl group, R2 and R3 represent a hydrogen atom, a C1 to C12 alkyl group, an aryl group, an aralkyl group or a hydroxyalkyl group and R4 represents a C6 to C24 alkyl or alkenyl group, an aryl group or an aralkyl group; and a pneumatic tire produced by using the rubber composition.
    Type: Grant
    Filed: August 28, 2000
    Date of Patent: March 12, 2002
    Assignees: Bridgestone Corporation, Kao Corporation
    Inventors: Kazuhiro Yanagisawa, Masaaki Tsuchihashi, Isao Nishi, Tetsuo Takano
  • Publication number: 20020002950
    Abstract: There is described a wafer processing apparatus intended to efficiently secure a wafer on an electrostatic chuck. A heater is disposed in a processing chamber for heating a wafer, and a dielectric plate for supporting the wafer is also disposed in the processing chamber. First and second electrodes are embedded in the dielectric plate, and first and second variable D.C. power supplies are disposed so as to supply voltages to the first and second electrodes, respectively. After the wafer has been placed on an electrostatic chuck, the wafer is pre-heated before being subjected to attraction force. After completion of the pre-heating phase, the first and second D.C. power supplies supply voltages to the first and second electrodes, thus securing the wafer on the dielectric plate.
    Type: Application
    Filed: July 16, 1999
    Publication date: January 10, 2002
    Inventors: MASAAKI TSUCHIHASHI, MINORU HANAZAKI, HIDEKI OURA
  • Patent number: 6273023
    Abstract: A plasma processing apparatus capable of attracting and holding a semiconductor wafer reliably once the processing of the semiconductor wafer is started includes: a vacuum chamber; an electrode arranged inside the vacuum chamber; a dielectric film formed on a surface of the electrode; a gas supply port leading to the vacuum chamber; a high-frequency electric power supply connected to the electrode; a memory operation unit which depends on a processing condition for producing a desired plasma, to calculate and output the voltage value corresponding to the sum of a value of a minimal actual attract and hold voltage required to be applied between one surface of the semiconductor wafer mounted on the dielectric film and a surface of the dielectric film to attract and hold one surface of the semiconductor wafer on the surface of the dielectric film and a value of a self-bias voltage generated at the other surface of the semiconductor wafer when the desired plasma is produced; and an electrostatic chuck power suppl
    Type: Grant
    Filed: January 11, 1999
    Date of Patent: August 14, 2001
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masaaki Tsuchihashi, Minoru Hanazaki
  • Patent number: 6130277
    Abstract: Provided are a rubber composition improved in an anti-static property and a pneumatic tire using the same for its tread part, wherein the rubber composition comprises natural rubber and/or diene base synthetic rubber and a white filler as a filler, and further comprises an anionic anti-static agent or a polyoxyalkylene glycol compound represented by the flowing formulas (I), (II) or (III): ##STR1## wherein R.sup.1 and R.sup.3 each represent a linear or branched, saturated or unsaturated aliphatic hydrocarbon group having 1 to 21 carbon atoms, or an aryl group; R.sup.4 and R.sup.5 each represent a hydrogen atom, a linear or branched, saturated or unsaturated aliphatic hydrocarbon group having 1 to 21 carbon atoms, or an aryl group; R.sup.1 and R.sup.3 in the above formula (I), R.sup.4 and R.sup.3 in the above formula (II) and R.sup.4 and R.sup.5 in the above formula (III) in one same molecule may be the same as or different from each other; R.sup.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: October 10, 2000
    Assignee: Bridgestone Corporation
    Inventors: Nobuyuki Okamura, Masaaki Tsuchihashi, Isao Nishi
  • Patent number: 6109208
    Abstract: A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.
    Type: Grant
    Filed: July 27, 1998
    Date of Patent: August 29, 2000
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Electric Engineering Company Limited
    Inventors: Masaaki Tsuchihashi, Minoru Hanazaki, Toshio Komemura, Mutumi Tuda, Kouichi Ono, Kouji Oku, Shinji Nakaguma
  • Patent number: 6054016
    Abstract: There is provided a plasma generating apparatus comprising: a waveguide for guiding a microwave; a vacuum vessel connected to the waveguide, having a means for supplying a gas for discharging electrons and a means for evacuating; and a dielectric member in a tube-like shape or a rod-like shape which is inserted in the vacuum vessel, wherein the dielectric member is provided with a means for emitting the microwave, whereby it is possible to apply the electric power of microwave effectively to plasma of high density exceeding so-called cut-off density and to homogenize the distribution of plasma in the vacuum vessel.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: April 25, 2000
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Electric Engineering Co., Ltd.
    Inventors: Mutumi Tuda, Kouichi Ono, Masaaki Tsuchihashi, Minoru Hanazaki, Toshio Komemura, Kouji Oku, Shinji Nakaguma
  • Patent number: 6024105
    Abstract: An introduction pipe for gas or the like for introducing water or water vapor is connected to a vacuum process chamber. The vacuum process chamber is evacuated through an evacuation exhaust port, and the introduced water vapor or water is solidified or liquefied by adiabatic expansion using a floating fine particle as a core. The particle on which the water vapor or the like is solidified or liquefied is discharged outside the vacuum process chamber. Thus, a semiconductor manufacturing device capable of reducing the number of fine particles on a wafer without decreasing uptime ratio is achieved.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: February 15, 2000
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Minoru Hanazaki, Masaaki Tsuchihashi
  • Patent number: 6008304
    Abstract: An additive for masticating natural rubber comprising at least one compound selected from the group consisting of benzoic acids, naphthoic acids, dicarboxylic acids and compounds represented by Formula (IV): ##STR1## wherein m and n each represent an integer of 1 to 3; p represents an integer of 1 to 4; m+n+p=6; X is O, NR.sup.8 or (R.sup.9 O).sub.q ; R.sup.6 is a C.sub.1 .about.C.sub.24 alkyl, a C.sub.2 .about.C.sub.24 alkenyl, or a C.sub.6 .about.C.sub.24 aryl group; and R.sup.7 is H, OH, an alkyl, alkenyl or aryl group; R.sup.8 is H or a C.sub.1 .about.C.sub.24 alkyl group; R.sup.9 is a C.sub.1 .about.C.sub.4 alkyl group; q is an integer of 1 to 5, a mastication method and a natural rubber composition each of which uses the additive, and a pneumatic tire using the natural rubber composition.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: December 28, 1999
    Assignees: Bridgestone Corporation, KAO Corporation
    Inventors: Daisuke Nohara, Masaaki Tsuchihashi, Isao Nishi
  • Patent number: 4645788
    Abstract: The cold resistance of chloroprene rubber can be improved by blending an ester derived from a specified glycol component and a specified fatty acid component without any adverse effect upon the other physical and chemical properties of the rubber. This ester is not extracted with oily matters such as oil or grease, so that the resulting chloroprene rubber composition hardly exhibits a decrease in cold resistance even after extraction with oily matters.
    Type: Grant
    Filed: December 6, 1985
    Date of Patent: February 24, 1987
    Assignees: Kao Corporation, Toyoda Gosei Co. Ltd.
    Inventors: Tadaoki Okumoto, Rikizo Nakata, Masayoshi Ichikawa, Masaaki Tsuchihashi, Koichi Sakai
  • Patent number: 4171957
    Abstract: A mixed fuel of coal and fuel oil can be effectively stabilized by adding thereinto a compound obtained by the condensation reaction between a sulfonated aromatic compound having a hydrophobic group and formalin.
    Type: Grant
    Filed: April 7, 1978
    Date of Patent: October 23, 1979
    Assignee: Kao Soap Co., Ltd.
    Inventors: Noboru Moriyama, Masaaki Tsuchihashi