Patents by Inventor Masaaki Yomo

Masaaki Yomo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor manufacturing system
    Publication number: 20030164932
    Abstract: A method of determining an exposure value for exposing a resist film, comprises the steps of: estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent sequential exposure and development processes; and compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 4, 2003
    Applicant: NEC CORPORATION
    Inventors: Masao Ikuno, Masahiko Kishi, Masaaki Yomo
  • Method for compensating exposure value for exposure process in semiconductor manufacturing system
    Patent number: 6599670
    Abstract: A method of determining an exposure value for exposing a resist film, comprises the steps of: estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent sequential exposure and development processes; and compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: July 29, 2003
    Assignee: NEC Electronics Corporation
    Inventors: Masao Ikuno, Masahiko Kishi, Masaaki Yomo
  • Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor Manufacturing system
    Publication number: 20020009657
    Abstract: A method of determining an exposure value for exposing a resist film, comprises the steps of: estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent sequential exposure and development processes; and compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
    Type: Application
    Filed: May 30, 2001
    Publication date: January 24, 2002
    Applicant: NEC Corporation
    Inventors: Masao Ikuno, Masahiko Kishi, Masaaki Yomo