Patents by Inventor Masabumi Kubota

Masabumi Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4937205
    Abstract: In a plasma doping process utilizing a radio frequency discharging in a vacuum by for doping an impurity into a semiconductor substrate, the radio frequency discharging is made intermittently and under controlling of average current of the discharging, thereby the impurity concentration is desirably controlled; and especially by selecting the vacuum in a range between 1.times.10.sup.-4 -5.times.10.sup.-2 torr, undesirable deposition of the impurity on the substrate surface is evadable.
    Type: Grant
    Filed: August 4, 1988
    Date of Patent: June 26, 1990
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Ichiro Nakayama, Bunji Mizuno, Masabumi Kubota, Masuo Tanno