Patents by Inventor Masachika Yoshino
Masachika Yoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7345105Abstract: A conductive adhesive composition is obtained by mixing a binder resin with 30-98 wt % based on the adhesive composition of a silver powder as a conductive agent. The silver powder contains a silver powder consisting of flat primary particles and having a massive agglomerate structure and a tap density of 0.1-1.5 g/cm3 in an amount of 30-98 wt % based on the adhesive composition. The conductive adhesive composition cures into a product having improved conductivity, adhesion, heat resistance, moisture resistance, ease of working and heat transfer.Type: GrantFiled: December 18, 2003Date of Patent: March 18, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masachika Yoshino, Motoo Fukushima, Toshio Shiobara
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Patent number: 7147920Abstract: In a wafer dicing/die bonding sheet comprising a backing member, an adhesive layer, and a protective member, the adhesive layer is made of an adhesive composition comprising a phenolic hydroxyl radical-bearing polyimide resin, an epoxy resin, and an epoxy resin curing agent, the ratio of the total weight of the epoxy resin and the epoxy resin curing agent to the weight of the polyimide resin being from 0.1:1 to 3:1. Due to heat resistance, improved adhesive properties and a low modulus of elasticity, the wafer dicing/die bonding sheet is effective for reducing the warpage of a chip after die bonding.Type: GrantFiled: November 17, 2003Date of Patent: December 12, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Shiobara, Nobuhiro Ichiroku, Hideki Akiba, Masachika Yoshino
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Patent number: 7026382Abstract: A conductive resin composition primarily comprising (A) 100 parts by weight of a thermosetting or thermoplastic resin, (B) 5–2,000 parts by weight of a conductive filler, and (C) 0.1–300 parts by weight of organic resin or rubber particulates has a low volume resistivity and stability thereof, and is effectively adherent. When applied to semiconductor packages, the composition can prevent the semiconductor chips from warpage or cracking due to thermal stresses in the semiconductor packages, ensuring the fabrication of semiconductor devices with high reliability.Type: GrantFiled: April 24, 2003Date of Patent: April 11, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hideki Akiba, Masachika Yoshino, Nobuhiro Ichiroku, Toshio Shiobara
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Patent number: 6969554Abstract: A silicon composition as described below, which is suitable for sealing semiconductors, is provided. The silicone composition comprises (A) a diorganopolysiloxane with at least two alkenyl groups bonded to silicon atoms, (B) an organohydrogenpolysiloxane with at least two hydrogen atoms bonded to silicon atoms, (C) an adhesion imparting constituent, (D) a platinum group metal based catalyst, and (E) a compound represented by a general formula (1): (wherein, R1 represents a monovalent hydrocarbon group of at least 10 carbon atoms, which may contain a hydroxyl group or an ether linkage). The silicon composition displays excellent adhesion to semiconductor chips, and enables the production of a semiconductor device with superior resistance to moisture permeation.Type: GrantFiled: January 28, 2003Date of Patent: November 29, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsutomu Kashiwagi, Masachika Yoshino
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Patent number: 6949619Abstract: A polyimide resin having phenolic hydroxyl radicals in its skeleton is prepared using a diamine bearing an aromatic ring having an amino radical attached thereto and another aromatic ring having a phenolic hydroxyl radical. The polyimide resin and a composition comprising the polyimide resin, an epoxy resin and a curing agent are suited for use as varnish, adhesive and adhesive film for which adhesion and heat resistance are required.Type: GrantFiled: July 18, 2003Date of Patent: September 27, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Nobuhiro Ichiroku, Masachika Yoshino, Hideki Akiba, Toshio Shiobara
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Patent number: 6806509Abstract: A potting composition comprising (A) an organopolysiloxane having a vinyl group at an end of its molecular chain, (B) an organohydrogenpolysiloxane, (C) a platinum group metal catalyst, and optionally, (D) an organosilicon compound having a silicon atom-bonded alkoxy group. The cured product of the composition has a refractive index of 1.41-1.56 at 25° C. and 589 nm (sodium D line). The composition is suited for the embedment and protection of light-emitting semiconductor members. A package in which a light-emitting semiconductor member is embedded and protected with the potting composition undergoes little discoloration and maintains a high emission efficiency in heating tests, thus offering a light-emitting semiconductor device featuring a long life and energy saving.Type: GrantFiled: March 11, 2004Date of Patent: October 19, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masachika Yoshino, Toshio Shiobara
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Publication number: 20040178509Abstract: A potting composition comprising (A) an organopolysiloxane having a vinyl group at an end of its molecular chain, (B) an organohydrogenpolysiloxane, (C) a platinum group metal catalyst, and optionally, (D) an organosilicon compound having a silicon atom-bonded alkoxy group. The cured product of the composition has a refractive index of 1.41-1.56 at 25° C. and 589 nm (sodium D line). The composition is suited for the embedment and protection of light-emitting semiconductor members. A package in which a light-emitting semiconductor member is embedded and protected with the potting composition undergoes little discoloration and maintains a high emission efficiency in heating tests, thus offering a light-emitting semiconductor device featuring a long life and energy saving.Type: ApplicationFiled: March 11, 2004Publication date: September 16, 2004Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masachika Yoshino, Toshio Shiobara
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Publication number: 20040105990Abstract: In a wafer dicing/die bonding sheet comprising a backing member, an adhesive layer, and a protective member, the adhesive layer is made of an adhesive composition comprising a phenolic hydroxyl radical-bearing polyimide resin, an epoxy resin, and an epoxy resin curing agent, the ratio of the total weight of the epoxy resin and the epoxy resin curing agent to the weight of the polyimide resin being from 0.1:1 to 3:1. Due to heat resistance, improved adhesive properties and a low modulus of elasticity, the wafer dicing/die bonding sheet is effective for reducing the warpage of a chip after die bonding.Type: ApplicationFiled: November 17, 2003Publication date: June 3, 2004Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Shiobara, Nobuhiro Ichiroku, Hideki Akiba, Masachika Yoshino
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Publication number: 20040019174Abstract: A polyimide resin having phenolic hydroxyl radicals in its skeleton is prepared using a diamine bearing an aromatic ring having an amino radical attached thereto and another aromatic ring having a phenolic hydroxyl radical. The polyimide resin and a composition comprising the polyimide resin, an epoxy resin and a curing agent are suited for use as varnish, adhesive and adhesive film for which adhesion and heat resistance are required.Type: ApplicationFiled: July 18, 2003Publication date: January 29, 2004Inventors: Nobuhiro Ichiroku, Masachika Yoshino, Hideki Akiba, Toshio Shiobara
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Publication number: 20030216505Abstract: A conductive resin composition primarily comprising (A) 100 parts by weight of a thermosetting or thermoplastic resin, (B) 5-2,000 parts by weight of a conductive filler, and (C) 0.1-300 parts by weight of organic resin or rubber particulates has a low volume resistivity and stability thereof, and is effectively adherent. When applied to semiconductor packages, the composition can prevent the semiconductor chips from warpage or cracking due to thermal stresses in the semiconductor packages, ensuring the fabrication of semiconductor devices with high reliability.Type: ApplicationFiled: April 24, 2003Publication date: November 20, 2003Inventors: Hideki Akiba, Masachika Yoshino, Nobuhiro Ichiroku, Toshio Shiobara
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Publication number: 20030181624Abstract: A silicone composition of a composition described below which is suitable for sealing semiconductors is provided.Type: ApplicationFiled: January 28, 2003Publication date: September 25, 2003Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Tsutomu Kashiwagi, Masachika Yoshino
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Patent number: 6518332Abstract: Semiconductor encapsulating epoxy resin compositions comprising an epoxy resin, a phenolic resin curing agent, a fire retardant comprising zinc molybdate carried on spherical silica having a mean particle diameter of 0.2-20 &mgr;m and a specific surface of 1-20 m2/g, and an inorganic filler are able to provide cured products having excellent fire retardance. The compositions have good flow and curing properties and excellent reliability and do not pose a hazard to human health or the environment.Type: GrantFiled: April 25, 2001Date of Patent: February 11, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Eiichi Asano, Kazutoshi Tomiyoshi, Masachika Yoshino, Toshio Shiobara, Shoichi Osada
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Publication number: 20020102429Abstract: Semiconductor encapsulating epoxy resin compositions comprising an epoxy resin, a phenolic resin curing agent, a fire retardant comprising zinc molybdate carried on spherical silica having a mean particle diameter of 0.2-20 &mgr;m and a specific surface of 1-20 m2/g, and an inorganic filler are able to provide cured products having excellent fire retardance. The compositions have good flow and curing properties and excellent reliability and do not pose a hazard to human health or the environment.Type: ApplicationFiled: April 25, 2001Publication date: August 1, 2002Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Eiichi Asano, Kazutoshi Tomiyoshi, Masachika Yoshino, Toshio Shiobara, Shoichi Osada
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Patent number: 6103026Abstract: A corrosion-resistant copper material has a surface layer of a copper alloy containing 10-50 at % (i.e. % by atom) of silicon and of 10-1,000 .ANG. thick. It is produced simply by annealing a copper material containing 0.01-5 at % of silicon at 100-600.degree. C. in a hydrogen-containing gas. Because of its excellent resistance to surface corrosion due to heat and aging, the resulting copper material lends itself well to automotive and electrical applications requiring heat resistance, and is also suitable for use in electrical wire and in leadframes for semiconductor devices.Type: GrantFiled: April 3, 1998Date of Patent: August 15, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masachika Yoshino, Toshio Shiobara, Naoya Noguchi
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Patent number: 6084037Abstract: In an epoxy resin composition comprising an epoxy resin, a curing agent, and an inorganic filler, there are blended a salt of trimellitic anhydride with 1,8-diazabicyclo(5.4.0)undecene-7 as a curing accelerator and a mercapto-containing silane coupling agent. The composition is shelf stable and smoothly flowing and cures into a product having improved adhesion, moisture resistance and electrical properties. The composition is suitable for the encapsulation of semiconductor devices.Type: GrantFiled: December 18, 1997Date of Patent: July 4, 2000Assignee: Shin -Etsu Chemical Co., Ltd.Inventors: Hisashi Shimizu, Minoru Takei, Masachika Yoshino, Toshio Shiobara
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Patent number: 5563203Abstract: A silicone rubber composition is prepared by mixing 100 parts by weight of an alkenyl-containing organopolysiloxane having a degree of polymerization of at least 3,000 and 5 to 30 parts by weight of finely divided silica having a specific surface of at least 50 m.sup.2 /g with 0.5 to 10 parts by weight of an organopolysiloxane resin having a weight average molecular weight of 500 to 50,000, a OH group content of 0.0001 to 0.01 mol/g, and a liquefying temperature of 50.degree. to 150.degree. C., at a temperature above the liquefying temperature of the resin. The composition has high plasticity in an uncured base compound form and is effective for extrusion molding. The composition cures into silicone rubber having low hardness, good flexibility and excellent physical properties, finding a variety of applications.Type: GrantFiled: November 14, 1994Date of Patent: October 8, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masachika Yoshino, Naoki Omura, Terukazu Sato, Masayuki Yoshida
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Patent number: 5519082Abstract: A curable silicone rubber composition contains (A) an organopolysiloxane raw rubber containing 0.01-1% by weight of vinyl and having a viscosity of 10.sup.3 -10.sup.6 poise at 25.degree. C., (B) an organopolysiloxane oil containing 0.1-10% by weight of vinyl and having a viscosity of 0.05-100 poise at 25.degree. C., (C) an organopolysiloxane copolymer composed mainly of a triorganosiloxy unit (M) and SiO.sub.2 unit (Q) in a molar ratio (M/Q) between 0.6 and 1.2 and containing 0.1-10% by weight of vinyl, (D) an organohydrogensiloxane containing at least three silylidyne groups, (E) a platinum catalyst, and (F) finely divided silica as essential components. The composition is hot air vulcanizable into a silicone rubber which is improved in hardness, modulus, tear strength and compression set.Type: GrantFiled: April 12, 1995Date of Patent: May 21, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Masachika Yoshino
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Patent number: 5367001Abstract: A impression composition comprising:(A) a polyether polymer having at least two alkenyl groups in its molecule,(B) a polyorganohydrogensiloxane having at least three silicon-bonded hydrogen atoms in its molecule,(C) a platinum catalyst,(D) an inorganic filler, and(E) an antioxidant.This composition of has hydrophilic nature and a small cure shrinkage; hence it enables precise impression in a wet environment like in a mouth.Type: GrantFiled: April 9, 1993Date of Patent: November 22, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kunio Itoh, Yoshio Inoue, Hironao Fujiki, Masachika Yoshino
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Patent number: 5340872Abstract: Silicone rubber compositions which comprise (A) an organopolysiloxane, which possesses at least one triorganosilyl-amine group expressed by the following equation (1) at its molecular end and a degree of polymerization which is at least 2000, and the silicone rubber compositions which further comprise (B) a fine powdered silica whose specific surface area is at least 50 m.sup.2 /g, ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are each a substituted or unsubstituted monovalent hydrocarbon group, each of which can be the same or different. The silicone rubber compositions are a non-fluidity type; therefore, they offer superior workability and formability. Further, silicone rubber obtained by the curing of the said compositions possess superior physical properties, extremely low hardness, flexibility, and good rubber elasticity, thus they are useful as raw materials of various products.Type: GrantFiled: May 21, 1993Date of Patent: August 23, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshio Inoue, Masachika Yoshino
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Patent number: 5246982Abstract: A silicone rubber composition comprises:(A) an organopolysiloxane R.sub.a SiO.sub.(4-a)/2 having an average degree of polymerization of 3000 or greater, wherein R is a substituted or unsubstituted monovalent hydrocarbon group, and 0.0001-0.05 mol % of R is alkenyl; a is 1.95-2.05; and(B) a fine powder of hydrophobic silica, wherein the specific surface area is 50 m.sup.2 /g or greater, the silica surface includes hydrophobic groups f MesiO.sub.3/2 and Me.sub.2 SiO in a weight ratio (MeSiO.sub.3/2)/(Me.sub.2 SiO) or 5/95-95/5, and the total carbon content contained in the MeSiO.sub.3/2 and Me.sub.2 SiO groups account for 0.5 wt % of greater of the silica. A material obtained by hardening this rubber composition has desirable resistance to steam and LLC.Type: GrantFiled: March 30, 1992Date of Patent: September 21, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshio Inoue, Masachika Yoshino