Patents by Inventor Masachika Yoshino

Masachika Yoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7345105
    Abstract: A conductive adhesive composition is obtained by mixing a binder resin with 30-98 wt % based on the adhesive composition of a silver powder as a conductive agent. The silver powder contains a silver powder consisting of flat primary particles and having a massive agglomerate structure and a tap density of 0.1-1.5 g/cm3 in an amount of 30-98 wt % based on the adhesive composition. The conductive adhesive composition cures into a product having improved conductivity, adhesion, heat resistance, moisture resistance, ease of working and heat transfer.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: March 18, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Motoo Fukushima, Toshio Shiobara
  • Patent number: 7147920
    Abstract: In a wafer dicing/die bonding sheet comprising a backing member, an adhesive layer, and a protective member, the adhesive layer is made of an adhesive composition comprising a phenolic hydroxyl radical-bearing polyimide resin, an epoxy resin, and an epoxy resin curing agent, the ratio of the total weight of the epoxy resin and the epoxy resin curing agent to the weight of the polyimide resin being from 0.1:1 to 3:1. Due to heat resistance, improved adhesive properties and a low modulus of elasticity, the wafer dicing/die bonding sheet is effective for reducing the warpage of a chip after die bonding.
    Type: Grant
    Filed: November 17, 2003
    Date of Patent: December 12, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Nobuhiro Ichiroku, Hideki Akiba, Masachika Yoshino
  • Patent number: 7026382
    Abstract: A conductive resin composition primarily comprising (A) 100 parts by weight of a thermosetting or thermoplastic resin, (B) 5–2,000 parts by weight of a conductive filler, and (C) 0.1–300 parts by weight of organic resin or rubber particulates has a low volume resistivity and stability thereof, and is effectively adherent. When applied to semiconductor packages, the composition can prevent the semiconductor chips from warpage or cracking due to thermal stresses in the semiconductor packages, ensuring the fabrication of semiconductor devices with high reliability.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: April 11, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideki Akiba, Masachika Yoshino, Nobuhiro Ichiroku, Toshio Shiobara
  • Patent number: 6969554
    Abstract: A silicon composition as described below, which is suitable for sealing semiconductors, is provided. The silicone composition comprises (A) a diorganopolysiloxane with at least two alkenyl groups bonded to silicon atoms, (B) an organohydrogenpolysiloxane with at least two hydrogen atoms bonded to silicon atoms, (C) an adhesion imparting constituent, (D) a platinum group metal based catalyst, and (E) a compound represented by a general formula (1): (wherein, R1 represents a monovalent hydrocarbon group of at least 10 carbon atoms, which may contain a hydroxyl group or an ether linkage). The silicon composition displays excellent adhesion to semiconductor chips, and enables the production of a semiconductor device with superior resistance to moisture permeation.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: November 29, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsutomu Kashiwagi, Masachika Yoshino
  • Patent number: 6949619
    Abstract: A polyimide resin having phenolic hydroxyl radicals in its skeleton is prepared using a diamine bearing an aromatic ring having an amino radical attached thereto and another aromatic ring having a phenolic hydroxyl radical. The polyimide resin and a composition comprising the polyimide resin, an epoxy resin and a curing agent are suited for use as varnish, adhesive and adhesive film for which adhesion and heat resistance are required.
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: September 27, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Nobuhiro Ichiroku, Masachika Yoshino, Hideki Akiba, Toshio Shiobara
  • Patent number: 6806509
    Abstract: A potting composition comprising (A) an organopolysiloxane having a vinyl group at an end of its molecular chain, (B) an organohydrogenpolysiloxane, (C) a platinum group metal catalyst, and optionally, (D) an organosilicon compound having a silicon atom-bonded alkoxy group. The cured product of the composition has a refractive index of 1.41-1.56 at 25° C. and 589 nm (sodium D line). The composition is suited for the embedment and protection of light-emitting semiconductor members. A package in which a light-emitting semiconductor member is embedded and protected with the potting composition undergoes little discoloration and maintains a high emission efficiency in heating tests, thus offering a light-emitting semiconductor device featuring a long life and energy saving.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: October 19, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Toshio Shiobara
  • Publication number: 20040178509
    Abstract: A potting composition comprising (A) an organopolysiloxane having a vinyl group at an end of its molecular chain, (B) an organohydrogenpolysiloxane, (C) a platinum group metal catalyst, and optionally, (D) an organosilicon compound having a silicon atom-bonded alkoxy group. The cured product of the composition has a refractive index of 1.41-1.56 at 25° C. and 589 nm (sodium D line). The composition is suited for the embedment and protection of light-emitting semiconductor members. A package in which a light-emitting semiconductor member is embedded and protected with the potting composition undergoes little discoloration and maintains a high emission efficiency in heating tests, thus offering a light-emitting semiconductor device featuring a long life and energy saving.
    Type: Application
    Filed: March 11, 2004
    Publication date: September 16, 2004
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Toshio Shiobara
  • Publication number: 20040105990
    Abstract: In a wafer dicing/die bonding sheet comprising a backing member, an adhesive layer, and a protective member, the adhesive layer is made of an adhesive composition comprising a phenolic hydroxyl radical-bearing polyimide resin, an epoxy resin, and an epoxy resin curing agent, the ratio of the total weight of the epoxy resin and the epoxy resin curing agent to the weight of the polyimide resin being from 0.1:1 to 3:1. Due to heat resistance, improved adhesive properties and a low modulus of elasticity, the wafer dicing/die bonding sheet is effective for reducing the warpage of a chip after die bonding.
    Type: Application
    Filed: November 17, 2003
    Publication date: June 3, 2004
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Nobuhiro Ichiroku, Hideki Akiba, Masachika Yoshino
  • Publication number: 20040019174
    Abstract: A polyimide resin having phenolic hydroxyl radicals in its skeleton is prepared using a diamine bearing an aromatic ring having an amino radical attached thereto and another aromatic ring having a phenolic hydroxyl radical. The polyimide resin and a composition comprising the polyimide resin, an epoxy resin and a curing agent are suited for use as varnish, adhesive and adhesive film for which adhesion and heat resistance are required.
    Type: Application
    Filed: July 18, 2003
    Publication date: January 29, 2004
    Inventors: Nobuhiro Ichiroku, Masachika Yoshino, Hideki Akiba, Toshio Shiobara
  • Publication number: 20030216505
    Abstract: A conductive resin composition primarily comprising (A) 100 parts by weight of a thermosetting or thermoplastic resin, (B) 5-2,000 parts by weight of a conductive filler, and (C) 0.1-300 parts by weight of organic resin or rubber particulates has a low volume resistivity and stability thereof, and is effectively adherent. When applied to semiconductor packages, the composition can prevent the semiconductor chips from warpage or cracking due to thermal stresses in the semiconductor packages, ensuring the fabrication of semiconductor devices with high reliability.
    Type: Application
    Filed: April 24, 2003
    Publication date: November 20, 2003
    Inventors: Hideki Akiba, Masachika Yoshino, Nobuhiro Ichiroku, Toshio Shiobara
  • Publication number: 20030181624
    Abstract: A silicone composition of a composition described below which is suitable for sealing semiconductors is provided.
    Type: Application
    Filed: January 28, 2003
    Publication date: September 25, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsutomu Kashiwagi, Masachika Yoshino
  • Patent number: 6518332
    Abstract: Semiconductor encapsulating epoxy resin compositions comprising an epoxy resin, a phenolic resin curing agent, a fire retardant comprising zinc molybdate carried on spherical silica having a mean particle diameter of 0.2-20 &mgr;m and a specific surface of 1-20 m2/g, and an inorganic filler are able to provide cured products having excellent fire retardance. The compositions have good flow and curing properties and excellent reliability and do not pose a hazard to human health or the environment.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: February 11, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Eiichi Asano, Kazutoshi Tomiyoshi, Masachika Yoshino, Toshio Shiobara, Shoichi Osada
  • Publication number: 20020102429
    Abstract: Semiconductor encapsulating epoxy resin compositions comprising an epoxy resin, a phenolic resin curing agent, a fire retardant comprising zinc molybdate carried on spherical silica having a mean particle diameter of 0.2-20 &mgr;m and a specific surface of 1-20 m2/g, and an inorganic filler are able to provide cured products having excellent fire retardance. The compositions have good flow and curing properties and excellent reliability and do not pose a hazard to human health or the environment.
    Type: Application
    Filed: April 25, 2001
    Publication date: August 1, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Eiichi Asano, Kazutoshi Tomiyoshi, Masachika Yoshino, Toshio Shiobara, Shoichi Osada
  • Patent number: 6103026
    Abstract: A corrosion-resistant copper material has a surface layer of a copper alloy containing 10-50 at % (i.e. % by atom) of silicon and of 10-1,000 .ANG. thick. It is produced simply by annealing a copper material containing 0.01-5 at % of silicon at 100-600.degree. C. in a hydrogen-containing gas. Because of its excellent resistance to surface corrosion due to heat and aging, the resulting copper material lends itself well to automotive and electrical applications requiring heat resistance, and is also suitable for use in electrical wire and in leadframes for semiconductor devices.
    Type: Grant
    Filed: April 3, 1998
    Date of Patent: August 15, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Toshio Shiobara, Naoya Noguchi
  • Patent number: 6084037
    Abstract: In an epoxy resin composition comprising an epoxy resin, a curing agent, and an inorganic filler, there are blended a salt of trimellitic anhydride with 1,8-diazabicyclo(5.4.0)undecene-7 as a curing accelerator and a mercapto-containing silane coupling agent. The composition is shelf stable and smoothly flowing and cures into a product having improved adhesion, moisture resistance and electrical properties. The composition is suitable for the encapsulation of semiconductor devices.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: July 4, 2000
    Assignee: Shin -Etsu Chemical Co., Ltd.
    Inventors: Hisashi Shimizu, Minoru Takei, Masachika Yoshino, Toshio Shiobara
  • Patent number: 5563203
    Abstract: A silicone rubber composition is prepared by mixing 100 parts by weight of an alkenyl-containing organopolysiloxane having a degree of polymerization of at least 3,000 and 5 to 30 parts by weight of finely divided silica having a specific surface of at least 50 m.sup.2 /g with 0.5 to 10 parts by weight of an organopolysiloxane resin having a weight average molecular weight of 500 to 50,000, a OH group content of 0.0001 to 0.01 mol/g, and a liquefying temperature of 50.degree. to 150.degree. C., at a temperature above the liquefying temperature of the resin. The composition has high plasticity in an uncured base compound form and is effective for extrusion molding. The composition cures into silicone rubber having low hardness, good flexibility and excellent physical properties, finding a variety of applications.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: October 8, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Naoki Omura, Terukazu Sato, Masayuki Yoshida
  • Patent number: 5519082
    Abstract: A curable silicone rubber composition contains (A) an organopolysiloxane raw rubber containing 0.01-1% by weight of vinyl and having a viscosity of 10.sup.3 -10.sup.6 poise at 25.degree. C., (B) an organopolysiloxane oil containing 0.1-10% by weight of vinyl and having a viscosity of 0.05-100 poise at 25.degree. C., (C) an organopolysiloxane copolymer composed mainly of a triorganosiloxy unit (M) and SiO.sub.2 unit (Q) in a molar ratio (M/Q) between 0.6 and 1.2 and containing 0.1-10% by weight of vinyl, (D) an organohydrogensiloxane containing at least three silylidyne groups, (E) a platinum catalyst, and (F) finely divided silica as essential components. The composition is hot air vulcanizable into a silicone rubber which is improved in hardness, modulus, tear strength and compression set.
    Type: Grant
    Filed: April 12, 1995
    Date of Patent: May 21, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Masachika Yoshino
  • Patent number: 5367001
    Abstract: A impression composition comprising:(A) a polyether polymer having at least two alkenyl groups in its molecule,(B) a polyorganohydrogensiloxane having at least three silicon-bonded hydrogen atoms in its molecule,(C) a platinum catalyst,(D) an inorganic filler, and(E) an antioxidant.This composition of has hydrophilic nature and a small cure shrinkage; hence it enables precise impression in a wet environment like in a mouth.
    Type: Grant
    Filed: April 9, 1993
    Date of Patent: November 22, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Yoshio Inoue, Hironao Fujiki, Masachika Yoshino
  • Patent number: 5340872
    Abstract: Silicone rubber compositions which comprise (A) an organopolysiloxane, which possesses at least one triorganosilyl-amine group expressed by the following equation (1) at its molecular end and a degree of polymerization which is at least 2000, and the silicone rubber compositions which further comprise (B) a fine powdered silica whose specific surface area is at least 50 m.sup.2 /g, ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are each a substituted or unsubstituted monovalent hydrocarbon group, each of which can be the same or different. The silicone rubber compositions are a non-fluidity type; therefore, they offer superior workability and formability. Further, silicone rubber obtained by the curing of the said compositions possess superior physical properties, extremely low hardness, flexibility, and good rubber elasticity, thus they are useful as raw materials of various products.
    Type: Grant
    Filed: May 21, 1993
    Date of Patent: August 23, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshio Inoue, Masachika Yoshino
  • Patent number: 5246982
    Abstract: A silicone rubber composition comprises:(A) an organopolysiloxane R.sub.a SiO.sub.(4-a)/2 having an average degree of polymerization of 3000 or greater, wherein R is a substituted or unsubstituted monovalent hydrocarbon group, and 0.0001-0.05 mol % of R is alkenyl; a is 1.95-2.05; and(B) a fine powder of hydrophobic silica, wherein the specific surface area is 50 m.sup.2 /g or greater, the silica surface includes hydrophobic groups f MesiO.sub.3/2 and Me.sub.2 SiO in a weight ratio (MeSiO.sub.3/2)/(Me.sub.2 SiO) or 5/95-95/5, and the total carbon content contained in the MeSiO.sub.3/2 and Me.sub.2 SiO groups account for 0.5 wt % of greater of the silica. A material obtained by hardening this rubber composition has desirable resistance to steam and LLC.
    Type: Grant
    Filed: March 30, 1992
    Date of Patent: September 21, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshio Inoue, Masachika Yoshino