Abstract: To provide a technology indicating guidance for a usage method of information equipment and for solving an abnormality of the information equipment to not only users having knowledge about terminology of the information equipment but also users having none of the knowledge about the terminology of the information equipment. A guidance apparatus receives identifying information of information equipment from a device, reads an image from a database containing images about the information equipment with respect to the received identifying information, creates guidance information containing the read image, transmits the created guidance information to the device, receives information determined by a manipulation about the guidance information on the device, and controls so as to read the image used next for the guidance information from the received information.

Abstract: To provide a technology indicating guidance for a usage method of information equipment and for solving an abnormality of the information equipment to not only users having knowledge about terminology of the information equipment but also users having none of the knowledge about the terminology of the information equipment. A guidance apparatus receives identifying information of information equipment from a device, reads an image from a database containing images about the information equipment with respect to the received identifying information, creates guidance information containing the read image, transmits the created guidance information to the device, receives information determined by a manipulation about the guidance information on the device, and controls so as to read the image used next for the guidance information from the received information.

Abstract: A semiconductor substrate with no reduction in the effective usage area and mechanical strength, and non-uniformity of the resist film thickness, and method of manufacturing and using the same are obtained. A detection mark for detecting the crystal orientation of a silicon wafer having an outer perimeter entirely of a circular contour is formed at a predetermined region of the silicon wafer. The crystal orientation of the semiconductor wafer can easily be detected with the outer perimeter still taking a circular contour. Therefore, various problems encountered in a conventional semiconductor substrate having an orientation flat or notch such as reduction in mechanical strength and effective usage area, and non-uniformity of the resist film can be circumvented.