Abstract: Aluminum oxide provides, at a thickness of 5 mm, an internal transmittance of 90% or higher for light at a wavelength of 193 nm.

Abstract: A photocurable composition which can be used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other, from which the three-dimensional object having excellent transparency, a high glass transition temperature, and a high hardness can be formed, and which exhibits a high curing rate. The photocurable composition is a photocurable composition used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other. The photocurable composition contains a monofunctional monomer having a polycyclic aliphatic group, a polyfunctional monomer, an alcohol, and an acylphosphine oxide photopolymerization initiator.

Abstract: A method of manufacturing an optical article, wherein an output light flux generating process of generating an output light flux by inputting a light from a light source to an output setting element having a repetition structure; a cured layer forming process of forming a cured layer at an irradiation area that is formed in correspondence with the output area by introducing the output light flux through a projection optical system into a container in which light-curable resin is contained and a stage is arranged and condensing the output light flux; and a stage moving process of moving the stage in a desired distance along the direction of the output flux propagating, are sequentially performed in this order and an irradiation variation process of varying the irradiation area in the cured layer generating process are further included, thereby the optical article is formed on a surface of the stage.

Abstract: A photocurable composition which can be used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other, from which the three-dimensional object having excellent transparency, a high glass transition temperature, and a high hardness can be formed, and which exhibits a high curing rate. The photocurable composition is a photocurable composition used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other. The photocurable composition contains a monofunctional monomer having a polycyclic aliphatic group, a polyfunctional monomer, an alcohol, and an acylphosphine oxide photopolymerization initiator.

Abstract: A method of manufacturing an optical article, wherein an output light flux generating process of generating an output light flux by inputting a light from a light source to an output setting element having a repetition structure; a cured layer forming process of forming a cured layer at an irradiation area that is formed in correspondence with the output area by introducing the output light flux through a projection optical system into a container in which light-curable resin is contained and a stage is arranged and condensing the output light flux; and a stage moving process of moving the stage in a desired distance along the direction of the output flux propagating, are sequentially performed in this order and an irradiation variation process of varying the irradiation area in the cured layer generating process are further included, thereby the optical article is formed on a surface of the stage.

Abstract: Aluminum oxide provides, at a thickness of 5 mm, an internal transmittance of 90% or higher for light at a wavelength of 193 nm.

Abstract: An optical member is provided with a substrate and a Cu-proof protective layer formed on or above the substrate.

Abstract: There is provided a temperature measurement method for measuring a temperature of an ultraviolet light transmittance member transmitting ultraviolet light. The method includes: detecting ultraviolet light transmitted through the ultraviolet light transmittance member using a spectroscopic measurement unit, and obtaining an absorption edge wavelength of the ultraviolet light transmittance member; and deriving a temperature of the ultraviolet light transmittance member on the basis of the obtained absorption edge wavelength.

Abstract: There is provided a temperature measurement method for measuring a temperature of an ultraviolet light transmittance member transmitting ultraviolet light. The method includes: detecting ultraviolet light transmitted through the ultraviolet light transmittance member using a spectroscopic measurement unit, and obtaining an absorption edge wavelength of the ultraviolet light transmittance member; and deriving a temperature of the ultraviolet light transmittance member on the basis of the obtained absorption edge wavelength.

Abstract: A method of inspecting a synthetic silica glass molded body includes: irradiating the synthetic silica glass molded body with a spectrum line of an Hg lamp having a wavelength of 248 nm; measuring light emitted by the synthetic silica glass molded body; and a procedure which may include screening a portion which satisfies a condition that a ratio of the bright line intensity and the fluorescent light intensity is of a certain value or less, or which may include determining whether a condition that a ratio of a minimum value and a maximum value of a measured fluorescent light intensity is in a certain range is satisfied or not.

Abstract: A method of inspecting a synthetic silica glass molded body includes: irradiating the synthetic silica glass molded body with a spectrum line of an Hg lamp having a wavelength of 248 nm; measuring light emitted by the synthetic silica glass molded body; and a procedure which may include screening a portion which satisfies a condition that a ratio of the bright line intensity and the fluorescent light intensity is of a certain value or less, or which may include determining whether a condition that a ratio of a minimum value and a maximum value of a measured fluorescent light intensity is in a certain range is satisfied or not.

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising: a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less, and so that a concentration of aluminium thereon is 10 ng/cm2 or less, before accommodating the synthetic silica glass block in the mold; a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200° C. to 1900° C.; a step of heating the mold at a temperature condition of 1700° C. to 1900° C.

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae satisfying either grade 1 or grade 2 (Japan Optical Glass Industry Society Standard), an absorption coefficient ? at 3585 cm?1 equal to or below 0.035/cm, and the content of aluminum and lithium being equal to or below 1 and 0.5 ppm, respectively.

Abstract: In an exposure apparatus, a light source emits ultraviolet light having a wavelength of 300 nm or less, a homogenizer reduces energy density inhomogeneity of the ultraviolet light in a plane perpendicular to an optical axis, and an exposure object is exposed by applying the ultraviolet light passed through a plurality of optical components. At least one of the plurality of optical components is a synthetic silica glass component, and all the synthetic silica glass component is placed closer to the exposure object than is the homogenizer placed closest to the light source.

Abstract: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. In ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.

Abstract: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: ?I?2L?1.7?0.02 (ns·mJ?2·cm2.3·pulse2) wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm?2·pulse?1) per pulse, and ? is the pulse width (unit: ns).

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a mask by using a laser beam having a wavelength shorter than 250 nm as a light source, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae therein satisfying either grade 1 or grade 2 as defined in Japan Optical Glass Industry Society Standard (JOGIS), an absorption coefficient ? for an infrared absorption band of a hydroxyl group located at 3585 cm?1 being equal to or below 0.035/cm, and the content of aluminum being equal to or below 1 ppm while the content of lithium being equal to or below 0.5 ppm.

Abstract: In an exposure apparatus, an exposure object 15 is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12. At least one of the plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12 is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: ?I?2L?1.7?0.02 (ns·mJ?2·cm2.3·pulse2) (L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm?2·pulse?1) per pulse, and ? is the pulse width (unit: ns)).