Patents by Inventor Masafumi ODA

Masafumi ODA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11515566
    Abstract: A rechargeable metal halide battery with an optimized active cathode electrolyte solution has high energy density and does not require charging following fabrication. The optimized active cathode electrolyte solution includes (i) a mixture of a metal halide and its corresponding halogen dissolved in an organic solvent at a concentration ratio greater than 0.5 and (ii) an oxidizing gas. The organic solvent is a nitrile-based compound and/or a heterocyclic compound. Glyme may be added to the organic solvent to improve battery performance.
    Type: Grant
    Filed: April 26, 2020
    Date of Patent: November 29, 2022
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Maxwell Giammona, Jangwoo Kim, Young-hye Na, Masafumi Oda, Tsubasa Itakura, Sho Yamazawa, Katsutoshi Suzuki, Kazunari Takeda
  • Publication number: 20210336295
    Abstract: A rechargeable metal halide battery with an optimized active cathode electrolyte solution has high energy density and does not require charging following fabrication. The optimized active cathode electrolyte solution includes (i) a mixture of a metal halide and its corresponding halogen dissolved in an organic solvent at a concentration ratio greater than 0.5 and (ii) an oxidizing gas. The organic solvent is a nitrile-based compound and/or a heterocyclic compound. Glyme may be added to the organic solvent to improve battery performance.
    Type: Application
    Filed: April 26, 2020
    Publication date: October 28, 2021
    Inventors: Maxwell Giammona, Jangwoo Kim, Young-hye Na, Masafumi Oda, Tsubasa Itakura, Sho Yamazawa, Katsutoshi Suzuki, Kazunari Takeda
  • Publication number: 20210336296
    Abstract: A rechargeable metal halide battery with an optimized electrolyte formulation shows high capacity at fast charging rates. The optimized electrolyte includes a metal halide, an oxidizing gas, and a mixed-solvent solution that includes a glyme-based compound that is in a volume fraction of between 20-70 volume % of the mixed-solvent solution. The mixed-solvent solution may further include a nitrile compound and/or a heterocyclic compound.
    Type: Application
    Filed: April 26, 2020
    Publication date: October 28, 2021
    Inventors: Jangwoo Kim, Maxwell Giammona, Young-hye Na, Masafumi Oda, Tsubasa Itakura, Toru Tanaka, Katsutoshi Suzuki, Kazunari Takeda
  • Publication number: 20200067817
    Abstract: A sender communication apparatus of a power line communication system that includes: a communication apparatus that is located at a route node of a tree structure of logical connection and broadcasts a received signal; the sender communication apparatus that is located at a node other than the route node of the tree structure; and a recipient communication apparatus that is located at a node other than the route node of the tree structure, wherein the sender communication apparatus comprises a communicator that communicates with the communication apparatus and the recipient communication apparatus via a power line, and the communicator transmits transmission signals to be transmitted to the recipient communication apparatus, to the communication apparatus in a unicast manner.
    Type: Application
    Filed: August 21, 2019
    Publication date: February 27, 2020
    Inventors: Masafumi ODA, Hidemi NAKADAIRA, Horst KREMER-MERSEBURG
  • Patent number: 9778569
    Abstract: A positive photosensitive resin composition according to the present invention contains at least (A) a polysiloxane compound having at least a structural unit of the general formula (1), (B) a photoacid generator or quinone diazide compound and (C) a solvent [(RX)bR1mSiOn/2]??(1) where RX represents the following group; R1 each represents a hydrogen atom, C1-C3 alkyl group, phenyl group, hydroxy group, C1-C3 alkoxy group or C1-C3 fluoroalkyl group; b represents an integer of 1 to 3; m represents an integer of 0 to 2; n represents an integer of 1 to 3; and b, m and n satisfy b+m+n=4, where X each represents a hydrogen atom or acid labile group; and a represents an integer of 1 to 5. It is possible by the use of this positive photosensitive resin composition to provide a film with high resistance and heat-resistant transparency and provide an electronic component with such a film.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: October 3, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Makoto Seino, Kazuhiro Yamanaka, Masafumi Oda, Junya Nakatsuji
  • Patent number: 9758694
    Abstract: According to one aspect of the present invention, there is provided a curable resin composition including at least: a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups as a component (A-1); and silica whose extract water has a pH of 6.1 or lower at 25° C. as a component (B), wherein the amount of the component (B) relative to the total amount of the components (A-1) and (B) is in a range of 70 to 97 mass %. This curable resin composition is able to, even when formed into various shapes and sizes, prevent foaming during curing and thus is suitable as an encapsulant material for a semiconductor element.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: September 12, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Masafumi Oda, Junya Nakatsuji, Yutaka Sugita, Tsuyoshi Ogawa
  • Publication number: 20160266491
    Abstract: A positive photosensitive resin composition according to the present invention contains at least (A) a polysiloxane compound having at least a structural unit of the general formula (1), (B) a photoacid generator or quinone diazide compound and (C) a solvent [(RX)bR1mSiOn/2]??(1) where RX represents the following group; R1 each represents a hydrogen atom, C1-C3 alkyl group, phenyl group, hydroxy group, C1-C3 alkoxy group or C1-C3 fluoroalkyl group; b represents an integer of 1 to 3; m represents an integer of 0 to 2; n represents an integer of 1 to 3; and b, m and n satisfy b+m+n=4, where X each represents a hydrogen atom or acid labile group; and a represents an integer of 1 to 5. It is possible by the use of this positive photosensitive resin composition to provide a film with high resistance and heat-resistant transparency and provide an electronic component with such a film.
    Type: Application
    Filed: October 24, 2014
    Publication date: September 15, 2016
    Inventors: Makoto SEINO, Kazuhiro YAMANAKA, Masafumi ODA, Junya NAKATSUJI
  • Publication number: 20160215168
    Abstract: According to one aspect of the present invention, there is provided a curable resin composition including at least: a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups as a component (A-1); and silica whose extract water has a pH of 6.1 or lower at 25° C. as a component (B), wherein the amount of the component (B) relative to the total amount of the components (A-1) and (B) is in a range of 70 to 97 mass %. This curable resin composition is able to, even when formed into various shapes and sizes, prevent foaming during curing and thus is suitable as an encapsulant material for a semiconductor element.
    Type: Application
    Filed: January 26, 2016
    Publication date: July 28, 2016
    Inventors: Masafumi ODA, Junya NAKATSUJI, Yutaka SUGITA, Tsuyoshi OGAWA