Abstract: A method for forming a metallic plug capable of preventing the occurrence of defects due to a short between conductive layers and the decrease of reliability in a conductive layer caused by a change of plug resistance by polishing and eliminating a filling film and an adhesive layer using a slurry for polishing a metal after eliminating a part of the filling film by dry etching beforehand. A metal plug can be obtained by the following steps: forming an end connection opened in an interlayer dielectric so as to expose the surface of a conductive layer under the interlayer dielectric; forming an adhesive layer on the exposed conductive layer and on the interlayer dielectric; forming a filling film on the adhesive layer, which fills the end connection completely; eliminating 60% or more of the film thickness of the filling film formed by dry etching; and polishing and eliminating the filling film and the adhesive layer using a slurry for polishing a metal.