Patents by Inventor Masafumi Takebayashi

Masafumi Takebayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7799378
    Abstract: A solution having a polymer dissolved in a hydrophobic organic solvent is cast on a substrate, said organic solvent is evaporated in a moist atmosphere to condense moisture contained in an atmosphere prevailing on a surface of said cast solution into micro-droplets, said micro-droplets are dispersed on the surface of said cast solution or in said cast solution into a close-packed structure, said micro-droplets, condensed and dispersed on the surface of said cast solution or in said cast solution, are evaporated to obtain a porous honeycomb structure with said droplets used as casts, and said porous honeycomb structure is at least bisected by peeling in a thickness direction, thereby obtaining honeycomb structures wherein micro-pillars or anisotropic micro-pillars are regularly formed and arranged by said bisection on the peeled sections.
    Type: Grant
    Filed: November 27, 2003
    Date of Patent: September 21, 2010
    Assignee: Japan Science and Technology Agency
    Inventors: Masaru Tanaka, Masatsugu Shimomura, Masafumi Takebayashi, Hiroshi Yabu
  • Publication number: 20060097361
    Abstract: A solution having a polymer dissolved in a hydrophobic organic solvent is cast on a substrate, said organic solvent is evaporated in a moist atmosphere to condense moisture contained in an atmosphere prevailing on a surface of said cast solution into micro-droplets, said micro-droplets are dispersed on the surface of said cast solution or in said cast solution into a close-packed structure, said micro-droplets, condensed and dispersed on the surface of said cast solution or in said cast solution, are evaporated to obtain a porous honeycomb structure with said droplets used as casts, and said porous honeycomb structure is at least bisected by peeling in a thickness direction, thereby obtaining honeycomb structures wherein micro-pillars or anisotropic micro-pillars are regularly formed and arranged by said bisection on the peeled sections.
    Type: Application
    Filed: November 27, 2003
    Publication date: May 11, 2006
    Inventors: Masaru Tanaka, Masatsugu Shimomura, Masafumi Takebayashi, Hiroshi Yabu
  • Patent number: 6855408
    Abstract: A composite metallic material 1 according to the invention is used for, e.g., electrolytic capacitors, and includes a metallic material substrate 10 and a high polymer thin layer 11 having a fine pattern 12 formed on at least one surface of the substrate 10 by self-organization. This high polymer thin film 11 is formed by, for example, drying hydrophobic organic solvent solution of high polymer compound. By subjecting this composite metallic material 1 to etching processing, etching pits are formed uniformly with high density based on the fine pattern.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: February 15, 2005
    Assignee: Showa Denko K.K.
    Inventors: Masatsugu Shimomura, Masaru Tanaka, Hiroshi Yabu, Masafumi Takebayashi, Ryuji Monden, Tamami Koyama, Yoshikazu Hosoda, Masashi Sakaguchi
  • Publication number: 20040076795
    Abstract: A composite metallic material 1 according to the invention is used for, e.g., electrolytic capacitors, and includes a metallic material substrate 10 and a high polymer thin layer 11 having a fine pattern 12 formed on at least one surface of the substrate 10 by self-organization. This high polymer thin film 11 is formed by, for example, drying hydrophobic organic solvent solution of high polymer compound. By subjecting this composite metallic material 1 to etching processing, etching pits are formed uniformly with high density based on the fine pattern.
    Type: Application
    Filed: January 27, 2003
    Publication date: April 22, 2004
    Applicant: SHOWA DENKO K.K.
    Inventors: Masatsugu Shimomura, Masaru Tanaka, Hiroshi Yabu, Masafumi Takebayashi, Ryuji Monden, Tamami Koyama, Yoshikazu Hosoda, Masashi Sakaguchi