Patents by Inventor Masaharu Taguchi
Masaharu Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8469046Abstract: The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H2 and O2 by using a simple orifice construction.Type: GrantFiled: April 17, 2007Date of Patent: June 25, 2013Assignee: Fujikin IncorporatedInventors: Yukio Minami, Keiji Hirao, Masaharu Taguchi, Toshiro Nariai, Koji Kawada, Akihiro Morimoto, Nobukazu Ikeda
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Publication number: 20100143239Abstract: The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H2 and O2 by using a simple orifice construction.Type: ApplicationFiled: April 17, 2007Publication date: June 10, 2010Applicant: FUJIKIN INCORPORATEDInventors: Yukio Minami, Keiji Hirao, Masaharu Taguchi, Toshiro Nariai, Koji Kawada, Akihiro Morimoto, Nobukazu Ikeda
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Patent number: 7553459Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: July 26, 2006Date of Patent: June 30, 2009Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7368092Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: December 1, 2003Date of Patent: May 6, 2008Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20070231225Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: June 8, 2007Publication date: October 4, 2007Applicants: FUJIKIN INCORPORATED, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7258845Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: February 2, 2001Date of Patent: August 21, 2007Assignee: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20060292047Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: July 26, 2006Publication date: December 28, 2006Applicant: FUJIKIN INCORPORATEDInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20040137744Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: December 1, 2003Publication date: July 15, 2004Applicants: Fujikin Incorporated, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20020122758Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: February 2, 2001Publication date: September 5, 2002Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura