Abstract: In a magnetic head, a head element and bumps connected thereto are formed on one end face of a slider substrate, and an insulating film is formed on the other end face opposite from the one end face. Therefore, even when the slider is electrically charged, the other end face thereof does not contact bumps formed in another slider substrate, and charges of the slider substrate will not move into the bumps. This prevents the slider substrate from electrostatic damage.

Abstract: An exposure mask for exposing a photosensitive resist layer formed on the surface of a substrate having an element so that the resist layer remains in the shape of an ABS pattern includes a mark provided within a light transmission section for exposure. The mark determines a relative position between the substrate and the light transmission section on the basis of the element. An exposure method using the exposure mask includes the steps of: determining a relative position between the substrate and the light transmission section on the basis of the element by the mark provided within the light transmission section of the exposure mask; exposing the photosensitive resist layer on the surface of the substrate through the light transmission section of the exposure mask; and developing the exposed photosensitive resist layer so that the resist layer is left in the shape of the ABS pattern.

Abstract: In a magnetic head, a head element and bumps connected thereto are formed on one end face of a slider substrate, and an insulating film is formed on the other end face opposite from the one end face. Therefore, even when the slider is electrically charged, the other end face thereof does not contact bumps formed in another slider substrate, and charges of the slider substrate will not move into the bumps. This prevents the slider substrate from electrostatic damage.

Abstract: Since each interval between slider bars 6 is filled with a resist film 12, the surface of each slider bar 6 is made flat. Consequently, the surface of the resist film 13 bonded to the surface of each slider bar can be easily made flat, whereby the etching patterns of ABS planes can be formed on the surface of the resist film 13 with a good dimensional accuracy.

Abstract: In a production supervising system of a work, a wireless type production supervising data processing apparatus is mounted on the work. The wireless type production supervising data processing apparatus includes a wireless type interface unit, and an IC card. The IC card includes CPU, EEPROM for storing the production supervising data, ROM for storing the program data, and RAM capable of storing other data than the production supervising data. The wireless type interface unit includes antennas, a receiver, a transmitter, a demodulator connected to the receiver, and a modulator connected to the transmitter. During the production of the work, the production supervising data previously stored in EEPROM are read from the IC card and processed in the interface unit and thereafter transmitted from the interface unit toward the external data controlling apparatus.