Abstract: A substrate processing apparatus includes a guard that catches liquid scattered outward from a spin chuck, a cup defining a liquid receiving groove to catch liquid that is guided downward by the guard, a guard elevating/lowering unit that moves the guard in an up/down direction, a cleaning liquid supplying unit that supplies cleaning liquid, discharged from a cleaning liquid nozzle, to the liquid receiving groove via the spin chuck and the guard, a cleaning liquid draining unit that drains the cleaning liquid in the liquid receiving groove, and a controller that controls the cleaning liquid supplying unit and the cleaning liquid draining unit to accumulate cleaning liquid in the liquid receiving groove and controls the guard elevating/lowering unit to cause a lower end portion of the cylindrical portion to be immersed in the cleaning liquid in the liquid receiving groove.

Abstract: A recover piping cleaning method is a method of cleaning a recovery piping into which a chemical liquid used for processing of a substrate is led via a processing cup, the recovery piping being arranged to lead the led chemical liquid into a predetermined chemical liquid recovery piping, the method including a piping cleaning step of cleaning the interior of the recovery piping by using a cleaning liquid by, while supplying the cleaning liquid to the recovery piping, leading the liquid led into the recovery piping into a drain piping which is different from the chemical liquid recovery piping, and a cleaning chemical liquid supplying step of, supplying the cleaning chemical liquid from a cleaning chemical liquid supply piping connected to the recovery piping to the recovery piping while leading the liquid led into the recovery piping into the drain piping.

Abstract: The controller of a substrate processing apparatus carries out a liquid column forming step in which cleaning liquid is discharged through a lower surface nozzle when a spin chuck is not holding a substrate, to form a liquid column extending upward from the lower surface nozzle, and, in parallel with the liquid column forming step, a first dropping portion cleaning step in which an upper surface nozzle is reciprocated horizontally between a first position where a dropping portion of the upper surface nozzle does not contact the liquid column and a second position where the dropping portion of the upper surface nozzle does not contact the liquid column, so as to cause the upper surface nozzle to pass through a first middle position where the upper discharge port of the upper surface nozzle overlaps with the liquid column in a plan view.

Abstract: A recover piping cleaning method is a method of cleaning a recovery piping into which a chemical liquid used for processing of a substrate is led via a processing cup, the recovery piping being arranged to lead the led chemical liquid into a predetermined chemical liquid recovery piping, the method including a piping cleaning step of cleaning the interior of the recovery piping by using a cleaning liquid by, while supplying the cleaning liquid to the recovery piping, leading the liquid led into the recovery piping into a drain piping which is different from the chemical liquid recovery piping, and a cleaning chemical liquid supplying step of, supplying the cleaning chemical liquid from a cleaning chemical liquid supply piping connected to the recovery piping to the recovery piping while leading the liquid led into the recovery piping into the drain piping.

Abstract: The controller of a substrate processing apparatus carries out a liquid column forming step in which cleaning liquid is discharged through a lower surface nozzle when a spin chuck is not holding a substrate, to form a liquid column extending upward from the lower surface nozzle, and, in parallel with the liquid column forming step, a first dropping portion cleaning step in which an upper surface nozzle is reciprocated horizontally between a first position where a dropping portion of the upper surface nozzle does not contact the liquid column and a second position where the dropping portion of the upper surface nozzle does not contact the liquid column, so as to cause the upper surface nozzle to pass through a first middle position where the upper discharge port of the upper surface nozzle overlaps with the liquid column in a plan view.

Abstract: A substrate processing apparatus includes a guard that catches liquid scattered outward from a spin chuck, a cup defining a liquid receiving groove to catch liquid that is guided downward by the guard, a guard elevating/lowering unit that moves the guard in an up/down direction, a cleaning liquid supplying unit that supplies cleaning liquid, discharged from a cleaning liquid nozzle, to the liquid receiving groove via the spin chuck and the guard, a cleaning liquid draining unit that drains the cleaning liquid in the liquid receiving groove, and a controller that controls the cleaning liquid supplying unit and the cleaning liquid draining unit to accumulate cleaning liquid in the liquid receiving groove and controls the guard elevating/lowering unit to cause a lower end portion of the cylindrical portion to be immersed in the cleaning liquid in the liquid receiving groove.

Abstract: A tack labeler includes a reeling-out unit for reeling out a label formation base material pair from a base material pair roll set on a roll holder; a base material pair accumulation unit for accumulating the label formation base material pair; a separating-delivering unit for pulling out the label formation base material pair from the base material pair accumulation unit, separating the label formation base material pair into respective label formation base materials, and delivering the respective label formation base materials; cutting units for successively cutting connection portions of cut lines formed on each of the label formation base materials; adhering units for adhering the tack labels cut off from each of the label formation base materials onto containers conveyed to adherence positions; and base material collecting units for winding up and collecting each of the label formation base materials.

Abstract: The present invention is to provide a tack labeler capable of automatically adhering tack labels without using release papers to articles to be adhered.

Abstract: A tack labeler includes a reeling-out unit for reeling out a label formation base material pair from a base material pair roll set on a roll holder; a base material pair accumulation unit for accumulating the label formation base material pair; a separating-delivering unit for pulling out the label formation base material pair from the base material pair accumulation unit, separating the label formation base material pair into respective label formation base materials, and delivering the respective label formation base materials; cutting units for successively cutting connection portions of cut lines formed on each of the label formation base materials; adhering units for adhering the tack labels cut off from each of the label formation base materials onto containers conveyed to adherence positions; and base material collecting units for winding up and collecting each of the label formation base materials.

Abstract: The present invention is to provide a tack labeler capable of automatically adhering this type of tack labels without using release papers to articles to be adhered.

Abstract: A method of and apparatus for cleaning a substrate which require shorter processing time with high processing efficiency are disclosed. A cleaning brush pivots about a pivot axis between two positions. An ultrasonic cleaning nozzle pivots about a pivot axis between two positions. To perform a cleaning process, the cleaning brush and the ultrasonic cleaning nozzle are driven in accordance with a processing pattern previously produced by an operator. The processing pattern is produced so that the movement of the cleaning brush between two positions and the movement of the ultrasonic cleaning nozzle between two positions are not caused simultaneously. Any processing pattern desired by the operator may be produced if this requirement is satisfied. Execution of the cleaning process in accordance with the processing pattern allows cleaning of a substrate using the cleaning brush and the ultrasonic cleaning nozzle at the same time.

Abstract: A substrate holding apparatus holds a rotating substrate without idly rotating the substrate and keeps the substrate in proper balance while the substrate is rotated. In a revolvable holding member, a column-shaped holding part is disposed on a top surface of a column-shaped supporting part, at an eccentric position with respect to a rotation axis of the supporting part. The revolvable holding member is supported by a rotation base for free rotation, and linked to a magnet holding part which incorporates a permanent magnet. On the other hand, a ring-shaped magnet which is disposed in a processing liquid collecting cup is freely driven by an air cylinder in a vertical direction. As the ring-shaped magnet is moved upward or downward and crosses a predetermined line as viewed in a positional relationship relative to the permanent magnet, which is at a height where the permanent magnet is disposed, the direction of a magnetic line of flux of the ring-shaped magnet is reversed.

Abstract: An aperture plate is disposed between a reduction optical system (imaging optical system) and a light source unit in which a plurality of light source parts each emitting a light beam are arranged in a predetermined arrangement pattern. In the aperture plate, a plurality of apertures are arranged in the same pattern as the arrangement pattern of the light source parts. Light beams from the light source parts are directed toward the reduction optical system through the apertures which face the respective light source parts so that reduction images of the apertures are formed on a photosensitive material. Even if the light source parts are located a little displaced from a predetermined arrangement pattern, images of the apertures will be focused on a photosensitive material. This enables easy adjustment of the locations of the light source parts and recording of a high quality image.

Abstract: A film applying and removing device in a drum type picture scanning recording apparatus is adapted that a photosensitive film is wound onto a rotary drum to be scanned by an exposing head, and comprises a first tray for accommodating a plurality of unexposed films, a film ascending and descending means for ascending the tip end of the film in the tray to contact it with the surface of the drum, a vacuum suctioning means to hold the tip end on the surface of the drum, an inversely rotatable driving means to rotate the drum and guide means for introducing a second tray for receiving exposed films.