Patents by Inventor Masahide Kawaraya

Masahide Kawaraya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7625477
    Abstract: This invention provides an electrodeposition paint comprising particles of at least one metallic compound selected from bismuth hydroxide, zirconium compound and tungsten compound, said particles of the metallic compound having an average particle diameter of 1-1,000 nm. The electrodeposition paint forms coating film excelling in corrosion resistance, finished appearance, paint stability and so on.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: December 1, 2009
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Masahide Kawaraya, Toshimitsu Muramatsu, Yuji Hirose
  • Patent number: 7511298
    Abstract: The present invention provides a process for forming a semiconductor film, comprising the steps of applying a semiconductor particle dispersion liquid to a substrate surface by spray coating in such a manner that the atomized droplets of the dispersion liquid discharged from the spray coater have a mean diameter of about 30 ?m or less, and drying the coating to form a porous semiconductor film; and use of the semiconductor film obtained by the process.
    Type: Grant
    Filed: October 10, 2003
    Date of Patent: March 31, 2009
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Masahide Kawaraya, Iwao Hayashi
  • Publication number: 20070149655
    Abstract: This invention provides an electrodeposition paint comprising particles of at least one metallic compound selected from bismuth hydroxide, zirconium compound and tungsten compound, said particles of the metallic compound having an average particle diameter of 1-1,000 nm. The electrodeposition paint forms coating film excelling in corrosion resistance, finished appearance, paint stability and so on.
    Type: Application
    Filed: December 22, 2006
    Publication date: June 28, 2007
    Inventors: Masahide Kawaraya, Toshimitsu Muramatsu, Yuji Hirose
  • Publication number: 20060163566
    Abstract: The present invention provides a process for forming a semiconductor film, comprising the steps of applying a semiconductor particle dispersion liquid to a substrate surface by spray coating in such a manner that the atomized droplets of the dispersion liquid discharged from the spray coater have a mean diameter of about 30 ?m or less, and drying the coating to form a porous semiconductor film; and use of the semiconductor film obtained by the process.
    Type: Application
    Filed: October 10, 2003
    Publication date: July 27, 2006
    Inventors: Masahide Kawaraya, Iwao Hayashi
  • Patent number: 6902674
    Abstract: Provided is an efficient treating method for coating material waste water which meets a change in a concentration of contaminants contained in waste water and a change in a treating amount by converting scarcely decomposable substances contained in the coating material waste water to easily decomposable substances. The coating material waste water is irradiated with a micro wave to decompose organic substances contained in the above waste water. Further, the coating material waste water before irradiated with a micro wave may be subjected, if necessary, to coagulation treatment by a flocculant or electrolytic treatment. After irradiating with a micro wave to decompose scarcely decomposable substances contained in the waste water to easily decomposable substances, the resulting treated water is preferably fed to a biological reaction bath and subjected to biological treatment under aerobic or anaerobic atmosphere.
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: June 7, 2005
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Tadamasa Hattori, Masahide Kawaraya, Osamu Isozaki, Naonori Miyata
  • Publication number: 20040104168
    Abstract: Provided is an efficient treating method for coating material waste water which meets a change in a concentration of contaminants contained in waste water and a change in a treating amount by converting scarcely decomposable substances contained in the coating material waste water to easily decomposable substances. The coating material waste water is irradiated with a micro wave to decompose organic substances contained in the above waste water. Further, the coating material waste water before irradiated with a micro wave may be subjected, if necessary, to coagulation treatment by a flocculant or electrolytic treatment. After irradiating with a micro wave to decompose scarcely decomposable substances contained in the waste water to easily decomposable substances, the resulting treated water is preferably fed to a biological reaction bath and subjected to biological treatment under aerobic or anaerobic atmosphere.
    Type: Application
    Filed: June 25, 2003
    Publication date: June 3, 2004
    Inventors: Tadamasa Hattori, Masahide Kawaraya, Osamu Isozaki, Naonori Miyata