Patents by Inventor Masahide Nishimura

Masahide Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the formation of phosphosilicate glass coating
    Patent number: 4781945
    Abstract: A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas. According to this deposition process, the undesirable formation and adhesion of particulate by-products such as SiO.sub.2, P.sub.2 O.sub.5, and H.sub.2 SiO.sub.3 to the substrate surface can be effectively prevented, and the step coverage can be improved.
    Type: Grant
    Filed: June 23, 1987
    Date of Patent: November 1, 1988
    Assignee: Fujitsu Limited
    Inventors: Masahide Nishimura, Kanetake Takasaki, Kenji Koyama, Atsuhiro Tsukune