Patents by Inventor Masahide Suenaga

Masahide Suenaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210061929
    Abstract: An active-energy-ray-curable composition including a pigment, a polymerizable compound, and a pigment-adsorptive component is provided. The pigment is at least one selected from the group consisting of strontium titanate, calcium titanate, zinc sulfide, and zinc oxide. The polymerizable compound contains an acrylamide compound (A1) having a specific ester structure.
    Type: Application
    Filed: August 25, 2020
    Publication date: March 4, 2021
    Inventors: Masahide KOBAYASHI, Mitsunobu MORITA, Takashi OKADA, Takenori SUENAGA, Soh NOGUCHI, Tatsuki YAMAGUCHI
  • Patent number: 10829631
    Abstract: A composition contains an acrylamide compound A1 having an ester structure and a polymerization initiator B1 having a molecular weight of 800 or more.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: November 10, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Takao Hiraoka, Mitsunobu Morita, Takashi Okada, Soh Noguchi, Tatsuki Yamaguchi, Masahide Kobayashi, Takenori Suenaga
  • Patent number: 10822507
    Abstract: A curable composition is provided comprising an acrylamide compound represented by the following general formula (1): wherein, X represents a branched alkylene group having 2 to 5 carbon atoms, and Y represents the following general formula (2): wherein, R represents an alkyl group having 1 to 4 carbon atoms, and * represents a binding site with X.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: November 3, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Takenori Suenaga, Masahide Kobayashi, Mitsunobu Morita, Soh Noguchi, Takashi Okada
  • Publication number: 20200299425
    Abstract: An active energy ray curable composition contains an acrylamide compound A1 represented by the following Chemical formula 1 or the following Chemical formula 2; a multi-functional polymerizable compound B1 having an SI value of 3 or less in a skin sensitivity test; a polymerization initiator C1 having no maximum absorption peak in a wavelength range of from 365 to 405 nm; and a hydrogen donor D,
    Type: Application
    Filed: March 18, 2020
    Publication date: September 24, 2020
    Inventors: Masahide KOBAYASHI, Mitsunobu MORITA, Takashi OKADA, Takenori SUENAGA, Soh NOGUCHI, Tatsuki YAMAGUCHI
  • Publication number: 20200038310
    Abstract: Provided is a composition including: an acrylamide compound represented by general formula (1) below; urethane (meth)acrylate having a SI value of 3 or less in a skin sensitization test; and a polymerization initiator having a molecular weight of 800 or greater, where in general formula (1), R1 represents an alkyl group containing 1 through 6 carbon atoms, X represents an alkylene group containing 1 through 6 carbon atoms, and Y represents any one selected from the group consisting of general formula (2) below and general formula (3) below, where in general formula (2), R2 represents an alkyl group containing 1 through 10 carbon atoms, and * represents a binding site with X above, where in general formula (3), R2 represents an alkyl group containing 1 through 10 carbon atoms, and * represents a binding site with X above.
    Type: Application
    Filed: June 14, 2019
    Publication date: February 6, 2020
    Inventors: Takenori SUENAGA, Masahide Kobayashi, Mitsunobu Morita, Takashi Okada, Soh Noguchi, Tatsuki Yamaguchi
  • Publication number: 20200038309
    Abstract: Provided is a composition including: an acrylamide compound represented by general formula (1) in 20% by mass or greater but 50% by mass or less; a multifunctional monomer in 40% by mass or greater but 70% by mass or less; and a polymerization initiator, where in general formula (1), R1 represents alkyl group containing 1 through 6 carbon atoms, X represents alkylene group containing 1 through 6 carbon atoms, and Y represents any one selected from the group consisting of general formula (2) below and general formula (3) below, where in general formula (2), R2 represents alkyl group containing 1 through 10 carbon atoms, and * represents binding site with X above, where in general formula (3), R2 represents alkyl group containing 1 through 10 carbon atoms, and * represents binding site with X above.
    Type: Application
    Filed: June 14, 2019
    Publication date: February 6, 2020
    Inventors: Takenori Suenaga, Masahide Kobayashi, Mitsunobu Morita, Takashi Okada, Soh Noguchi, Tatsuki Yamaguchi
  • Publication number: 20200032068
    Abstract: Provided is a composition including an acrylamide compound having a molecular weight of 150 or greater but 250 or less (A1), a polyfunctional polymerizable compound including an alkylene oxide group (A2), and a polyfunctional polymerizable compound (A3) different from the polyfunctional polymerizable compound (A2).
    Type: Application
    Filed: June 14, 2019
    Publication date: January 30, 2020
    Inventors: Tatsuki YAMAGUCHI, Masahide KOBAYASHI, Mitsunobu MORITA, Takashi OKADA, Soh NOGUCHI, Takenori SUENAGA
  • Publication number: 20200031969
    Abstract: Provided is a composition including an acrylamide compound having a molecular weight of 150 or greater but 250 or less (A1), and a monomer having a cyclic structure represented by General Formula (3) below, or General Formula (4) below, or both (A2), where, in General Formulae (3) and (4), L is a single bond or a straight chain or branched alkylene group that has from 1 through 10 carbon atoms and may include an oxygen atom, a nitrogen atom, or a sulfur atom; A is a cyclic structure that has from 2 through 10 carbon atoms and may include an oxygen atom, a nitrogen atom, or a sulfur atom; R6 is a hydrogen atom or a methyl group; and R7 and R8 are each a straight chain or branched alkyl group having from 1 through 10 carbon atoms.
    Type: Application
    Filed: July 26, 2019
    Publication date: January 30, 2020
    Inventors: Masahide KOBAYASHI, Mitsunobu MORITA, Takenori SUENAGA, Soh NOGUCHI, Takashi OKADA, Tatsuki YAMAGUCHI
  • Publication number: 20200032089
    Abstract: Provided is a composition including an acrylamide compound (A1) having a molecular weight of 150 or greater but 250 or less, and a trifunctional or higher polymerizable compound (A2), wherein an amount of the trifunctional or higher polymerizable compound (A2) is 1% by mass or greater but 30% by mass or less relative to a total amount of the composition.
    Type: Application
    Filed: May 30, 2019
    Publication date: January 30, 2020
    Inventors: Masahide KOBAYASHI, Mitsunobu Morita, Takenori Suenaga, Soh Noguchi, Takashi Okada, Tatsuki Yamaguchi
  • Publication number: 20200010662
    Abstract: A composition contains an acrylamide compound A1 having an ester structure and a polymerization initiator B1 having a molecular weight of 800 or more.
    Type: Application
    Filed: July 1, 2019
    Publication date: January 9, 2020
    Inventors: Takao HIRAOKA, Mitsunobu MORITA, Takashi OKADA, Soh NOGUCHI, Tatsuki YAMAGUCHI, Masahide KOBAYASHI, Takenori SUENAGA
  • Publication number: 20190284408
    Abstract: A curable composition is provided comprising an acrylamide compound represented by the following general formula (1): wherein, X represents a branched alkylene group having 2 to 5 carbon atoms, and Y represents the following general formula (2): wherein, R represents an alkyl group having 1 to 4 carbon atoms, and * represents a binding site with X.
    Type: Application
    Filed: March 5, 2019
    Publication date: September 19, 2019
    Inventors: Takenori SUENAGA, Masahide KOBAYASHI, Mitsunobu MORITA, Soh NOGUCHI, Takashi OKADA
  • Patent number: 4596646
    Abstract: A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5.times.10.sup.-7 -1.times.10.sup.-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.
    Type: Grant
    Filed: February 23, 1983
    Date of Patent: June 24, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Hiroshi Yamamoto, Masahide Suenaga, Noboru Shimizu
  • Patent number: 4556925
    Abstract: A magnetoresistive head comprising a magnetoresistive element, to which a magnetic bias field is applied, is disposed opposite to a magnetic recording medium moving relative thereto, and the resistance value of the magnetoresistive element varying as a result of the relative movement of the magnetoresistive element and the magnetic recording medium is detected to reproduce information recorded on the magnetic recording medium. The magnetoresistive element of the magnetic head has an elongate shape extending along the easy axis of magnetization and has protrusions at its longitudinal ends. The protrusions have, for example, a semicircular or triangular contour. These protrusions are effective for suppressing formation of undesirable domain walls in the magnetoresistive element, so that the magnetic head can operate without substantial variation of its output voltage level and with reduced Barkhousen noise.
    Type: Grant
    Filed: July 28, 1982
    Date of Patent: December 3, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Kousaku Chida, Masaki Ohura
  • Patent number: 4503394
    Abstract: A magnetoelectric conversion element comprises a magnetoresistive effect material having a closed domain structure, a pair of contacts for supply of current flowing through the magnetoresistive effect material, and a bias electrode disposed between the contacts for biasing the direction of the current flow. The bias electrode is disposed so that the respective angles of intersection between the directions of current flow through different magnetic domains of the magnetoresistive effect material biased by the bias electrode and the directions of spontaneous magnetization biased by an external magnetic field are both increased or decreased.
    Type: Grant
    Filed: June 22, 1982
    Date of Patent: March 5, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kanji Kawakami, Shinji Narishige, Masahide Suenaga
  • Patent number: 4462881
    Abstract: A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.
    Type: Grant
    Filed: November 18, 1981
    Date of Patent: July 31, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Yamamoto, Noboru Shimizu, Masahide Suenaga, Yukihisa Tsukada, Tooru Takeura
  • Patent number: 4443294
    Abstract: In forming a magnetic film pattern of permalloy by photoetching, the permalloy magnetic film formed on a substrate is etched in an etching solution containing ferric chloride, hydrochloric acid and phosphoric acid, thereby gradually reducing the thickness of the film pattern at the side edges in a tapered state. The permalloy magnetic film can be easily taper-etched without any deterioration of magnetic properties of permalloy magnetic film and substrate surface, but with a greatly improved yield of magnetic film head production and a greatly improved reliability.
    Type: Grant
    Filed: June 9, 1982
    Date of Patent: April 17, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Yukihisa Tsukada, Hiroshi Yamamoto
  • Patent number: 4411757
    Abstract: Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.
    Type: Grant
    Filed: June 8, 1982
    Date of Patent: October 25, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Masahide Suenaga, Yukihisa Tsukada, Noboru Shimizu, Hiroshi Yamamoto
  • Patent number: 4301353
    Abstract: A method for producing a magnetic head, comprising the step of irradiating peripheral parts other than a track portion and/or a slider portion with a laser beam so as to selectively remove surface parts of the irradiated parts, thereby to form the track portion and/or the slider portion. According to this method, the track portion and/or the slider portion of the magnetic head can be worked at high working rate, at high precision and with low working deformation, with the result that the magnetic head of excellent reproduced output and crosstalk characteristics can be readily manufactured.
    Type: Grant
    Filed: February 28, 1980
    Date of Patent: November 17, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Noboru Shimizu, Mitsuhiro Kudo, Hiroshi Yamaguchi, Masao Mitani