Patents by Inventor Masahide Suenaga

Masahide Suenaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11976020
    Abstract: A method for producing a (meth)acrylic acid amide compound, the method including: adding at least one selected from the group consisting of an amino group-containing compound and a neutralization salt of the amino group-containing compound to a mixture including (meth)acrylic acid halide and an organic solvent immiscible with water to allow the (meth)acrylic acid halide and at least one selected from the group consisting of the amino group-containing compound and the neutralization salt of the amino group-containing compound to react with each other, to produce the (meth)acrylic acid amide compound.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: May 7, 2024
    Assignee: RICOH COMPANY, LTD.
    Inventors: Mitsunobu Morita, Masahide Kobayashi, Takenori Suenaga, Soh Noguchi, Takashi Okada
  • Patent number: 4596646
    Abstract: A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5.times.10.sup.-7 -1.times.10.sup.-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.
    Type: Grant
    Filed: February 23, 1983
    Date of Patent: June 24, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Hiroshi Yamamoto, Masahide Suenaga, Noboru Shimizu
  • Patent number: 4556925
    Abstract: A magnetoresistive head comprising a magnetoresistive element, to which a magnetic bias field is applied, is disposed opposite to a magnetic recording medium moving relative thereto, and the resistance value of the magnetoresistive element varying as a result of the relative movement of the magnetoresistive element and the magnetic recording medium is detected to reproduce information recorded on the magnetic recording medium. The magnetoresistive element of the magnetic head has an elongate shape extending along the easy axis of magnetization and has protrusions at its longitudinal ends. The protrusions have, for example, a semicircular or triangular contour. These protrusions are effective for suppressing formation of undesirable domain walls in the magnetoresistive element, so that the magnetic head can operate without substantial variation of its output voltage level and with reduced Barkhousen noise.
    Type: Grant
    Filed: July 28, 1982
    Date of Patent: December 3, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Kousaku Chida, Masaki Ohura
  • Patent number: 4503394
    Abstract: A magnetoelectric conversion element comprises a magnetoresistive effect material having a closed domain structure, a pair of contacts for supply of current flowing through the magnetoresistive effect material, and a bias electrode disposed between the contacts for biasing the direction of the current flow. The bias electrode is disposed so that the respective angles of intersection between the directions of current flow through different magnetic domains of the magnetoresistive effect material biased by the bias electrode and the directions of spontaneous magnetization biased by an external magnetic field are both increased or decreased.
    Type: Grant
    Filed: June 22, 1982
    Date of Patent: March 5, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kanji Kawakami, Shinji Narishige, Masahide Suenaga
  • Patent number: 4462881
    Abstract: A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.
    Type: Grant
    Filed: November 18, 1981
    Date of Patent: July 31, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Yamamoto, Noboru Shimizu, Masahide Suenaga, Yukihisa Tsukada, Tooru Takeura
  • Patent number: 4443294
    Abstract: In forming a magnetic film pattern of permalloy by photoetching, the permalloy magnetic film formed on a substrate is etched in an etching solution containing ferric chloride, hydrochloric acid and phosphoric acid, thereby gradually reducing the thickness of the film pattern at the side edges in a tapered state. The permalloy magnetic film can be easily taper-etched without any deterioration of magnetic properties of permalloy magnetic film and substrate surface, but with a greatly improved yield of magnetic film head production and a greatly improved reliability.
    Type: Grant
    Filed: June 9, 1982
    Date of Patent: April 17, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Yukihisa Tsukada, Hiroshi Yamamoto
  • Patent number: 4411757
    Abstract: Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.
    Type: Grant
    Filed: June 8, 1982
    Date of Patent: October 25, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Masahide Suenaga, Yukihisa Tsukada, Noboru Shimizu, Hiroshi Yamamoto
  • Patent number: 4301353
    Abstract: A method for producing a magnetic head, comprising the step of irradiating peripheral parts other than a track portion and/or a slider portion with a laser beam so as to selectively remove surface parts of the irradiated parts, thereby to form the track portion and/or the slider portion. According to this method, the track portion and/or the slider portion of the magnetic head can be worked at high working rate, at high precision and with low working deformation, with the result that the magnetic head of excellent reproduced output and crosstalk characteristics can be readily manufactured.
    Type: Grant
    Filed: February 28, 1980
    Date of Patent: November 17, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Noboru Shimizu, Mitsuhiro Kudo, Hiroshi Yamaguchi, Masao Mitani