Abstract: A process for the preparation of an image is provided, which comprises exposing to light a layer of a composition which changes its stickiness when irradiated with active light, spraying a particulate image-forming material on to the layer, removing the particulate matter which has not been attached to the layer, and then heating the layer to fix the particulate image-forming to the substrate. This process is suitable for the patterning of not only a fluorescent substance for plasma display but also a light-impermeable or sparingly light-permeable material to which photolithography has heretofore been difficultly applied. Furthermore, the thickness of the image-forming material layer can be easily varied by properly selecting the grain diameter of the image-forming material.