Patents by Inventor Masahiko Itabashi

Masahiko Itabashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240094659
    Abstract: A cartridge includes: a casing having a first opening; a storage bag accommodated in the casing and having a second opening; a seal for closing the second opening; a shaft rotatable; and a cap for closing the first opening. Toner is configured to be replenished through the first opening. Toner stored in the storage bag is configured to be discharged into the casing through the second opening. The shaft is rotatable about a first axis extending in a first direction together with the seal such that the seal closing the second opening is peeled off to open the second opening. The cap is attachable to and detachable from the casing.
    Type: Application
    Filed: August 21, 2023
    Publication date: March 21, 2024
    Applicant: BROTHER KOGYO KABUSHIKI KAISHA
    Inventors: Nao ITABASHI, Masahiko HAYAKAWA, Sakiho HAYAKAWA, Hotaka KAKUTANI, Shintaro FUKUOKA, Haruka KIZU, Yuki NAGASHIMA
  • Patent number: 6568073
    Abstract: The present invention provides a process for the fabrication of a wiring board, which comprises the following steps: (a) forming a first wiring pattern on a first side of a self-supporting carrier metal foil so as to obtain a self-supporting wiring sheet comprising the carrier metal foil and the first wiring pattern; (b) superposing and pressing the first side of said self-supporting wiring sheet on and against an insulating substrate so that the first wiring pattern is_embedded in the insulating substrate and constitutes a surface with the insulating substrate; and (c) etching off desired portions of said carrier metal foil to form a second wiring pattern made of said carrier metal foil remaining on the surface constituted by the insulating substrate and the first wiring pattern. The present invention also provides the wiring board for electrical tests so fabricated.
    Type: Grant
    Filed: March 6, 1998
    Date of Patent: May 27, 2003
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Naoki Fukutomi, Hidehiro Nakamura, Hajime Nakayama, Yoshiaki Tsubomatsu, Masanori Nakamura, Kouichi Kaitou, Atsushi Kuwano, Itsuo Watanabe, Masahiko Itabashi
  • Patent number: 6133534
    Abstract: A wiring board for electrical tests; having an insulating substrate, wiring of predetermined pattern which is embedded in the insulating substrate, and bump electrodes which are formed on the wiring and which are respectively brought into contact with corresponding electrodes of an article to-be-tested. Thus, even when the electrode pitch of the article to-be-tested such as a semiconductor device has become smaller(for example, less than 0.1 [mm]), the electrodes can be formed so as to cope with the electrical tests of the article.
    Type: Grant
    Filed: April 27, 1994
    Date of Patent: October 17, 2000
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Naoki Fukutomi, Hidehiro Nakamura, Hajime Nakayama, Yoshiaki Tsubomatsu, Masanori Nakamura, Kouichi Kaitou, Atsushi Kuwano, Itsuo Watanabe, Masahiko Itabashi
  • Patent number: 5504992
    Abstract: The object of the present invention is to provide a wiring board fabrication process which is, not only so smooth on the surface that a fine wiring pattern can be formed thereon, but also suitable for mounting electronic parts having fine pitch terminals.The present invention is a fabrication process of a wiring board which comprises a wiring conductive line embedded in the surface of an insulating substrate so that the upper face of the conductive line and the surface of the substrate are flat, and a through-hole land which is a conductive portion projected from the surface of the substrate in a through-hole portion, which is characterized in removing the conductive portion projected from the surface of the substrate in the through-hole portion so as to have a flat surface on the surface of the substrate.
    Type: Grant
    Filed: June 30, 1994
    Date of Patent: April 9, 1996
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Toshio Yamazaki, Masahiko Itabashi, Hirohito Ohhata
  • Patent number: 4895734
    Abstract: An insulating film formed by a plasma CVD method at the substrate temperature of 350.degree. to 550.degree. C.l is good in electric properties and heat resistance without causing whitening phenomenon is suitable for use in a thin-film electroluminescent device.
    Type: Grant
    Filed: March 30, 1988
    Date of Patent: January 23, 1990
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Takeshi Yoshida, Masahiko Itabashi