Abstract: An assembled grid tray is disclosed, comprising a frame for holding multiple substrate trays to form a larger tray for use in a semiconductor processing tool. The frame may be comprised of two outer frame members that hold one or more of the trays, each with a magnet rail use with a maglev system. The frame may be further comprised of an inner frame member positioned between the outer frame members, which may also include a magnet rail, with the frame members being held in position by one or more outer beam members. The frame members may be fabricated of a material having a similar thermal expansion to trays to be placed in the frame.

Abstract: The invention provides methods and apparatus for using a reinforced gas diffuser in substrate processing. A gas diffuser for use in a PECVD processes includes an aluminum plate with reinforcement material embedded within the aluminum plate. The reinforcement material is adapted to support the aluminum plate and maintain a flatness of the aluminum plate. Numerous other aspects are disclosed.

Abstract: A substrate support and method of fabricating the same are provided. Generally, one method of fabrication includes assembling a subassembly comprising a first reinforcing member and a heating element, supporting the subassembly at least 40 mm from a bottom of a mold, encapsulating the supported subassembly with molten aluminum, and applying pressure to the molten aluminum. Alternatively, a method of fabrication includes assembling a subassembly comprising a stud disposed through a heating element sandwiched between a first reinforcing member and a second reinforcing member, supporting the subassembly above a bottom of a mold, encapsulating the subassembly disposed in the mold with molten aluminum to form a casting, forming a hole in the casting by removing at least a portion of the stud, and disposing a plug in at least a portion of the hole.

Abstract: A substrate support and method of fabricating the same are provided. Generally, one method of fabrication includes assembling a subassembly comprising a first reinforcing member and a heating element, supporting the subassembly at least 40 mm from a bottom of a mold, encapsulating the supported subassembly with molten aluminum, and applying pressure to the molten aluminum. Alternatively, a method of fabrication includes assembling a subassembly comprising a stud disposed through a heating element sandwiched between a first reinforcing member and a second reinforcing member, supporting the subassembly above a bottom of a mold, encapsulating the subassembly disposed in the mold with molten aluminum to form a casting, forming a hole in the casting by removing at least a portion of the stud, and disposing a plug in at least a portion of the hole.

Abstract: A substrate support and method of fabricating the same are provided. Generally, one method of fabrication includes assembling a subassembly comprising a first reinforcing member and a heating element, supporting the subassembly at least 40mm from a bottom of a mold, encapsulating the supported subassembly with molten aluminum, and applying pressure to the molten aluminum. Alternatively, a method of fabrication includes assembling a subassembly comprising a stud disposed through a heating element sandwiched between a first reinforcing member and a second reinforcing member, supporting the subassembly above a bottom of a mold, encapsulating the subassembly disposed in the mold with molten aluminum to form a casting, forming a hole in the casting by removing at least a portion of the stud, and disposing a plug in at least a portion of the hole.

Abstract: A narrow band excimer laser capable of easily adjusting the rotation of the laser beam by an image rotator provided between a laser chamber and a grating and on the laser beam optical axis. The image rotator is supported with freedom of rotation on the laser beam optical axis and rotates the laser beam about the optical axis so that the plane containing the direction in which the width of the laser beam incident upon the beam expander is narrower is parallel with the plane containing the beam-expansion direction of the beam expander, and the beam expansion direction of the laser beam incident upon the grating is perpendicular to the direction of the grooves of the grating. With this arrangement, a laser beam of narrowed bandwidth can be obtained with high efficiency.

Abstract: A sensor for measuring the temperature of a workpiece including a substrate, wafer, shield or other element in a semiconductor processing system. In the illustrated embodiment, the sensor has a heat shield to reflect away from the heat sensing element, heat from unwanted sources such as susceptors and heating cartridges which can adversely affect the accuracy of the measurement. In addition, the heat shield preferably has a small thermal mass for improved responsivity.

Abstract: A narrow-band excimer laser employing a diffraction grating as a wavelength selective element, which is particularly suited for a light source of a reduction projection aligner. The grating used in the narrow-band excimer laser of the invention is so disposed that the ruling direction of the grating is nearly perpendicular to the direction of laser discharge. When a beam expander is used to expand laser beam falling on the beam expander is so disposed that the direction of beam expansion is nearly perpendicular to that of discharge of the laser. Further, when an aperture is to be used in the laser cavity, the aperture is placed so that the longitudinal direction may be parallel to the direction of laser discharge. Moreover, the front mirror of the laser cavity is a cylindrical one, whose mechanical axis is in parallel with the direction of laser discharge. This makes it possible to provide a narrow-band excimer laser having very high efficiency and excellent durability.

Abstract: A laser system which realizes its stable operation. In the system, a spectrum width of laser light dischargingly excited in a laser chamber is detected by a spectrum width monitor. A controller controls, on the basis of the detected spectrum width, a replenishment amount of gas to be replenished from an F2 gas cylinder into the laser chamber through a sub-tank and on-off valves to cause the spectrum width to become constant.Further, when replenishment of a halogen gas diluted with a buffer gas is carried out, a gas exhaustion step of keeping the internal total gas pressure of the laser chamber constant is omitted.In addition, a laser oscillation pulse number is counted for a predetermined period of time and a replenishment amount of the halogen gas is carried out according to the count value.

Abstract: A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis.

Abstract: A laser wavelength controlling apparatus adapted for controlling the wavelength of a narrow-band oscillation laser beam at a high accuracy for long period of time even if environmental conditions such as the atmospheric temperature and pressure changes to some degree.

Abstract: A wavelength detecting apparatus which assures that the wavelength of a laser light can be detected with accuracy is disclosed. In the subject invention, the temperature of the vapor obtained from an element such as a mercury which contains plural isotopes is elevated in excess of a predetermined temperature so that an emission line of the element becomes plural emission lines. One of the divided emission lines is used as a reference light for the detection of the wavelength of the light to be detected. In addition, a specific isotope of the element may be selected from plural isotopes of a reference element to thereby provide a narrowed emission line for use as a reference light.

Abstract: The present invention provides a wavelength detecting apparatus for detecting the wavelength of a light (11) to be detected with reference to a reference light (31) by allowing the reference light (31) generated and transmitted from a light source (30) and the light (11) to be detected to be irradiated toward an etalon (62) and then detecting the light which has permeated through the etalon (62) by optical detecting means (64). The reference light and the light to be detected are incident on the focusing surface (50) which is located in front of a collimeter lens (61). The incident light is transformed into a parallel light in the collimeter lens (61) and the parallel light is then irradiated toward the etalon (62).

Abstract: A method for controlling a narrow-band oscillation excimer laser which is suitable for control of an excimer laser used as a light source of a reduced projection exposer, and a system thereof. At least two wavelength selective element are disposed within a laser oscillator. There are provided a center wavelength control for causing an oscillation center wavelength determined by these wavelength selective elements to coincide with a desired value, an overlapping control for overlapping the transmission wavelengths of these wavelength selective elements, and a power control for controlling a voltage applied to electrodes located within a laser chamber to thereby control a laser output. Partial gas replacement is carried out when the application voltage to the electrodes within the laser chamber becomes high.

Abstract: An apparatus for controlling an output from an excimer laser device wherein at least two etalons each having a large diameter are arranged between a rear mirror and a laser chamber for the excimer laser device is disclosed. With the apparatus, the operative range of laser light outputted from the excimer laser device can be narrowed by executing superposition control for a wavelength of laser light which transmits through each etalon, while maintaining the number of spatial lateral modes. The apparatus is preferably employable as a light source particularly for a unit for projecting and exposing figures in a reduced size. Superposition control with the use of a superposition control unit, excitation intensity control for laser gas with the use of an excitation intensity control unit and partial gas replacement control for laser gas with the use of a gas control unit are executed in a predetermined timing relationship, respectively.

Abstract: According to present invention, the central wavelength of the central wave of the output laser beam, and the sideband wave power or central wave power of the output laser beam are detected, and the wavelength selective characteristics of wavelength selective elements disposed between a laser chamber and a rear mirror are controlled such that the detected central wavelength falls within a desired allowable range and that the detected power becomes minimum or maximum.

Abstract: A method and apparatus for sensing the wavelength of a laser beam using an optogalvano effect by atoms or molecules in plasma. Atoms or molecules in the plasma are irradiated with the laser beam. The impedance of the plasma at that time is sensed to sense whether the wavelength of the laser beam coincides with a predetermined absolute wavelength. The sensed result is used to control the wavelength of the laser beam.

Abstract: A reduced projection light source comprises a laser device for emitting laser light having a transverse mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing an ultrafine pattern on a semiconductor wafer.

Abstract: Specification of an etalon included in a multimode, narrow-band oscillation excimer laster used as a light source for light exposure in photolithography are set to satisfy a relation S.lambda.W.lambda.R.lambda. (u,v)d.lambda..gtoreq..alpha., where .alpha. is an optical transfer function necessary for light exposure of resist according to a reticle pattern, R.lambda.(u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, W.lambda. is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength .lambda.. Further, an inclination angle .lambda. of the etalon in its normal direction with respect to an optical axis when the etalon is provided between the chamber and rear mirror is set to satisfy a relation .theta.>tan.sup.

Abstract: A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis.