Patents by Inventor Masahiko Mitsuzuka
Masahiko Mitsuzuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11647675Abstract: A piezoelectric substrate attachment structure including a press section pressed by contact, a piezoelectric substrate provided adjacent to the press section, and a base section provided adjacent to the piezoelectric substrate on an opposite side from the press section. The following relationship Equation (a) is satisfied: da/E?a<db/E?b??(a) wherein da is a thickness of the press section in a direction of adjacency to the piezoelectric substrate, E?a is a storage modulus of the press section from dynamic viscoelastic analysis, db is a thickness of the base section in the adjacency direction, and E?b is a storage modulus of the base section from dynamic viscoelastic analysis.Type: GrantFiled: September 22, 2017Date of Patent: May 9, 2023Assignee: Mitsui Chemicals, Inc.Inventors: Kazuhiro Tanimoto, Masahiko Mitsuzuka, Mitsunobu Yoshida
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Patent number: 11462673Abstract: A piezoelectric substrate attachment structure including a cable-shaped piezoelectric substrate, a press section provided adjacent to the piezoelectric substrate and pressed from an opposite side from the piezoelectric substrate, and a base section provided adjacent to the piezoelectric substrate on an opposite side from the press section. A ratio Eb/Ea of a Young's modulus Eb of the base section to a Young's modulus Ea of the press section being 10?1 or lower.Type: GrantFiled: September 22, 2017Date of Patent: October 4, 2022Assignee: MITSUI CHEMICALS, INC.Inventors: Mitsunobu Yoshida, Kazuhiro Tanimoto, Masahiko Mitsuzuka
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Patent number: 10626213Abstract: The photoelastic polyurethane resin has a Young's modulus at 25° C. of 2 to 5 MPa, a photoelastic constant at 25° C. of 1000×10?12 Pa?1 to 100000×10?12 Pa?1, and a glass transition temperature of ?60° C. to ?21° C.Type: GrantFiled: February 5, 2016Date of Patent: April 21, 2020Assignees: MITSUI CHEMICALS, INC., A SCHOOL CORPORATION KANSAI UNIVERSITYInventors: Masahiko Mitsuzuka, Satoshi Yamasaki, Yoshiro Tajitsu
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Publication number: 20200020846Abstract: A piezoelectric substrate attachment structure including a press section pressed by contact, a piezoelectric substrate provided adjacent to the press section, and a base section provided adjacent to the piezoelectric substrate on an opposite side from the press section. The following relationship Equation (a) is satisfied: da/E?a<db/E?b??(a) wherein da is a thickness of the press section in a direction of adjacency to the piezoelectric substrate, E?a is a storage modulus of the press section from dynamic viscoelastic analysis, db is a thickness of the base section in the adjacency direction, and E?b is a storage modulus of the base section from dynamic viscoelastic analysis.Type: ApplicationFiled: September 22, 2017Publication date: January 16, 2020Applicant: Mitsui Chemicals, Inc.Inventors: Kazuhiro TANIMOTO, Masahiko MITSUZUKA, Mitsunobu YOSHIDA
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Patent number: 10455951Abstract: The cushioning material having a sensor 1 includes a resin sheet 4 composed of photoelastic resin, a cushioning material 21 laminated on the resin sheet 4, a photosensor 15 including a light generating unit 5 and a light receiving unit 8 that are disposed to face each other so as to sandwich the resin sheet 4, and a processor 3 that detects a stress applied to the resin sheet 4 based on the light signal detected by the photosensor 15.Type: GrantFiled: February 5, 2016Date of Patent: October 29, 2019Assignees: MITSUI CHEMICALS, INC., A SCHOOL CORPORATION KANSAI UNIVERSITYInventors: Masahiko Mitsuzuka, Satoshi Yamasaki, Yoshiro Tajitsu
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Publication number: 20190214542Abstract: A piezoelectric substrate attachment structure including a cable-shaped piezoelectric substrate, a press section provided adjacent to the piezoelectric substrate and pressed from an opposite side from the piezoelectric substrate, and a base section provided adjacent to the piezoelectric substrate on an opposite side from the press section. A ratio Eb/Ea of a Young's modulus Eb of the base section to a Young's modulus Ea of the press section being 10?1 or lower.Type: ApplicationFiled: September 22, 2017Publication date: July 11, 2019Applicant: Mitsui Chemicals, Inc.Inventors: Mitsunobu YOSHIDA, Kazuhiro TANIMOTO, Masahiko MITSUZUKA
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Publication number: 20180022861Abstract: The photoelastic polyurethane resin has a Young's modulus at 25° C. of 2 to 5 MPa, a photoelastic constant at 25° C. of 1000×10?12 Pa?1 to 100000×10?12 Pa?1, and a glass transition temperature of ?60° C. to ?21° C.Type: ApplicationFiled: February 5, 2016Publication date: January 25, 2018Applicants: MITSUI CHEMICALS, INC., A SCHOOL CORPORATION KANSAI UNIVERSITYInventors: Masahiko MITSUZUKA, Satoshi YAMASAKI, Yoshiro TAJITSU
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Publication number: 20180020841Abstract: The cushioning material having a sensor 1 includes a resin sheet 4 composed of photoelastic resin, a cushioning material 21 laminated on the resin sheet 4, a photosensor 15 including a light generating unit 5 and a light receiving unit 8 that are disposed to face each other so as to sandwich the resin sheet 4, and a processor 3 that detects a stress applied to the resin sheet 4 based on the light signal detected by the photosensor 15.Type: ApplicationFiled: February 5, 2016Publication date: January 25, 2018Applicants: MITSUI CHEMICALS, INC., A SCHOOL CORPORATION KANSAI UNIVERSITYInventors: Masahiko MITSUZUKA, Satoshi YAMASAKI, Yoshiro TAJITSU
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Patent number: 7977429Abstract: Polymers having polyolefin segments as the side chain, with a structural unit represented by the following Formula (1): wherein A is an olefin polymer having a weight average molecular weight of 400 to 500,000; R is H, an alkyl group, or an aralkyl group; W and Z are each O, HN, or S; and x and y are each 0 or 1, with the proviso that at least one of them is 1. The polymer can be applied as an antistatic agent, a cosmetic additive, a releasing agent for toner, a pigment dispersant, a lubricant for vinyl chloride resins, a coating material, an emulsion composition and the like.Type: GrantFiled: January 20, 2005Date of Patent: July 12, 2011Assignee: Mitsui Chemicals, Inc.Inventors: Naoshi Nagai, Masahiko Mitsuzuka, Kazuoki Nakai, Motoaki Isokawa, Shiro Nakatsuka, Daiki Taneichi, Shirou Honma, Toshimitsu Narutaki
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Publication number: 20070154431Abstract: Polymers having polyolefin segments as the side chain, with a structural unit represented by the following Formula (1): wherein A is an olefin polymer having a weight average molecular weight of 400 to 500,000; R is H, an alkyl group, or an aralkyl group; W and Z are each O, HN, or S; and x and y are each 0 or 1, with the proviso that at least one of them is 1. The polymer can be applied as an antistatic agent, a cosmetic additive, a releasing agent for toner, a pigment dispersant, a lubricant for vinyl chloride resins, a coating material, an emulsion composition and the like.Type: ApplicationFiled: January 20, 2005Publication date: July 5, 2007Applicant: Mitsui Chemicals, Inc.Inventors: Naoshi Nagai, Masahiko Mitsuzuka, Kazuoki Nakai, Motoaki Isokawa, Shiro Nakatsuka, Daiki Taneichi, Shirou Honma, Toshimitsu Narutaki
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Patent number: 6646093Abstract: Water-soluble polyurethane according to the present invention is obtained from polyalkylene glycols, diisocyanates, and comb-shaped hydrophobic diols represented by the following general formula (3): wherein each of R1, R2 and R3 is a hydrocarbon group; each of Y and Y′ is hydrogen, a methyl group or a CH2Cl group; each of Z and Z′ is oxygen, sulfur or a CH2 group; n is an integer of 0 to 15 when Z is oxygen and is 0 when Z is sulfur or a CH2 group; n′ is an integer of 0 to 15 when Z′ is oxygen and is 0 when Z′ is sulfur or a CH2 group. The water-soluble polyurethane is used as, for example, an extruding auxiliary for cement materials, a mortar thickening agent, an underwater concrete thickening agent, a ceramics forming binder and a moisturizer for hair cosmetics, all of which are characterized by excellent water retention and high shape retention.Type: GrantFiled: December 12, 2000Date of Patent: November 11, 2003Assignee: Mitsui Chemicals, Inc.Inventors: Manabu Tsuruta, Masahiko Mitsuzuka, Yunzhi Wu
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Patent number: 6515050Abstract: A water-soluble polyurethane obtained from water-soluble polyalkylene glycol, polydiisocyanate, and comb-shaped hydrophobic diol represented by the following general formula: wherein R1 is a hydrocarbon group of 1 to 20 carbon atoms; each of R2 and R3 is a hydrocarbon group or halogenated hydrocarbon group of 4 to 21 carbon atoms; each of X, X′ and X″ is an alkylene group of 2 to 10 carbon atoms; the hydrogen atoms of the above alkylene group may be substituted with an alkyl group, chlorine or an alkyl chloride group; each of Z and Z′ is oxygen, sulfur or a CH2 group; R4 is an alkylene group of 2 to 10 carbon atoms in all; k is an integer of 0 to 15; n is an integer of 0 to 15 when Z is oxygen and is 0 when Z is sulfur or a CH2 group; n′ is an integer of 0 to 15 when Z′ is oxygen and is 0 when Z′ is sulfur or a CH2 group.Type: GrantFiled: February 27, 2001Date of Patent: February 4, 2003Assignee: Mitsui Chemicals, Inc.Inventors: Masahiko Mitsuzuka, Manabu Tsuruta, Yunzhi Wu
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Publication number: 20020045724Abstract: Water-soluble polyurethane according to the present invention is obtained from polyalkylene glycols, diisocyanates, and comb-shaped hydrophobic diols represented by the following general formula (3): 1Type: ApplicationFiled: December 12, 2000Publication date: April 18, 2002Inventors: Manabu Tsuruta, Masahiko Mitsuzuka, Yunzhi Wu
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Patent number: 5420238Abstract: A method for preparing a highly heat-resistant and burning-resistant poly(silyleneethynylene phenyleneethynylene) having a repeated unit represented by the following structural formula (1A): ##STR1## wherein the phenylene group may be in the o-, m- or p-form, R represents a halogen atom or an alkyl group, alkoxy group, phenoxy group, alkenyl group, alkynyl group, aromatic group, disubstituted amino group or silanyl group; n is an integer ranging from 0 to 4; and R' represents a hydrogen atom, an alkyl group, alkenyl group, alkynyl group or aromatic group, a product obtained by the method and a hardened product obtained by heat-treating, at a temperature ranging from 50.degree.to 700.degree. C., the poly(silyleneethynylene phenyleneethynylene).Type: GrantFiled: March 23, 1994Date of Patent: May 30, 1995Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Masayoshi Ito, Masahiko Mitsuzuka, Kenji Iwata, Koji Inoue, Tetsura Utsumi