Abstract: An ejection device includes: an ejection portion that ejects liquid droplets onto one surface of a recording medium that is fed; a first drying portion that applies light energy to the one surface in a noncontact manner to thereby dry the liquid droplets; and a second drying portion that comes in contact with only other surface of the recording medium in which the liquid droplets have been dried toy the first drying portion, and heats the recording medium to thereby dry the recording medium.

Abstract: A substrate attaching/detaching unit includes a stocker accommodating a plurality of substrate holders 80 and adapted so that the substrate holders 80 are aligned in a vertical direction with one another in a horizontal posture, a first substrate holder conveying mechanism that takes the substrate holders 80 into and out of the stocker, an elevating mechanism that raises and lowers the first substrate holder conveying mechanism in the vertical direction, a second substrate holder conveying mechanism that transfers the substrate holder to and from the first substrate holder conveying mechanism, and a substrate attaching/detaching mechanism that attaches and detaches the substrate to and from the substrate holder held in the second substrate holder conveying mechanism.

Abstract: An ejection device includes: an ejection portion that ejects liquid droplets onto one surface of a recording medium that is fed; a first drying portion that applies light energy to the one surface in a noncontact manner to thereby dry the liquid droplets; and a second drying portion that comes in contact with only other surface of the recording medium in which the liquid droplets have been dried toy the first drying portion, and heats the recording medium to thereby dry the recording medium.

Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.

Abstract: A substrate processing apparatus comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract: Provided is a droplet ejection apparatus including: an ejecting mechanism in which plural ejection units which eject droplets from a nozzle to a transported recording medium are disposed in a zig-zag form in an intersection direction that intersects a transport direction of the recording medium; and a release unit which releases humidified air from a release port which is open in the recording medium side between ejection units in the intersection direction.

Abstract: A substrate processing apparatus is described herein. The substrate processing apparatus comprises a transferring device including: a grasping section configured to grasp a substrate holder, a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract: Provided is a droplet ejection apparatus including: an ejecting mechanism in which plural ejection units which eject droplets from a nozzle to a transported recording medium are disposed in a zigzag form in an intersection direction that intersects a transport direction of the recording medium; and a release unit which releases humidified air from a release port which is open in the recording medium side between ejection units in the intersection direction.

Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.

Abstract: A substrate attaching/detaching unit includes a stocker accommodating a plurality of substrate holders 80 and adapted so that the substrate holders 80 are aligned in a vertical direction with one another in a horizontal posture, a first substrate holder conveying mechanism that takes the substrate holders 80 into and out of the stocker, an elevating mechanism that raises and lowers the first substrate holder conveying mechanism in the vertical direction, a second substrate holder conveying mechanism that transfers the substrate holder to and from the first substrate holder conveying mechanism, and a substrate attaching/detaching mechanism that attaches and detaches the substrate to and from the substrate holder held in the second substrate holder conveying mechanism.

Abstract: A drying device includes: a drying unit including: a heating space having a heating unit; a drying space that has a conveyance path of a recording medium and in which the recording medium is dried by radiation heat produced by the heating unit; and a partition member that separates the heating space and the drying space from each other in such a manner that gas can move between the heating space and the drying space; a first supply unit that supplies gas to the drying unit in a direction that is opposite to a conveying direction of the recording medium; and a second supply unit that supplies gas to the drying unit in a direction from the heating unit to the partition member.

Abstract: A substrate processing apparatus capable of inhibiting diffusion of a chemical solution atmosphere around a processing bath. The substrate processing apparatus has a processing bath for storing a substrate holder holding a substrate and for processing the substrate, a lifter configured to support the substrate holder, store the substrate holder in the processing bath, and take out the substrate holder from the processing bath, and a cover configured to cover the periphery of the substrate holder taken out from the processing bath by the lifter.

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract: A drying device includes: a drying unit including: a heating space having a heating unit; a drying space that has a conveyance path of a recording medium and in which the recording medium is dried by radiation heat produced by the heating unit; and a partition member that separates the heating space and the drying space from each other in such a manner that gas can move between the heating space and the drying space; a first supply unit that supplies gas to the drying unit in a direction that is opposite to a conveying direction of the recording medium; and a second supply unit that supplies gas to the drying unit in a direction from the heating unit to the partition member.

Abstract: An image forming apparatus includes: a conveying device that conveys a recording medium; a droplets ejecting device that ejects droplets onto the recording medium being conveyed by the conveying device; a drying unit that dries the droplets that have been ejected on the recording medium being conveyed by the conveying device; and a varying unit that varies a conveyance path length from the droplets ejecting device to the drying unit in accordance with at least one of a conveyance speed of the recording medium and an ejected droplets permeation characteristic of the recording medium.

Abstract: An image forming apparatus includes: a conveying device that conveys a recording medium; a droplets ejecting device that ejects droplets onto the recording medium being conveyed by the conveying device; a drying unit that dries the droplets that have been ejected on the recording medium being conveyed by the conveying device; and a varying unit that varies a conveyance path length from the droplets ejecting device to the drying unit in accordance with at least one of a conveyance speed of the recording medium and an ejected droplets permeation characteristic of the recording medium.

Abstract: A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

Abstract: A plating apparatus has an ashing unit (300) configured to perform an ashing process on a resist (502) applied on a surface of a seed layer (500) formed on a substrate (W), and a pre-wetting section (26) configured to provide hydrophilicity to a surface of the substrate after the ashing process. The plating apparatus includes a pre-soaking section (28) configured to bring the surface of the substrate into contact with a treatment solution to clean or activate a surface of the seed layer formed on the substrate. The plating apparatus also includes a plating unit (34) configured to bring the surface of the substrate into a plating solution in a plating tank while the resist is used as a mask so as to form a plated film (504) on the surface of the seed layer formed on the substrate.

Abstract: A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.