Patents by Inventor Masahiro Atsumi

Masahiro Atsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240052477
    Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
    Type: Application
    Filed: October 11, 2023
    Publication date: February 15, 2024
    Applicant: Canon Anelva Corporation
    Inventor: Masahiro ATSUMI
  • Patent number: 11821067
    Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
    Type: Grant
    Filed: April 28, 2020
    Date of Patent: November 21, 2023
    Assignee: CANON ANELVA CORPORATION
    Inventor: Masahiro Atsumi
  • Patent number: 10917960
    Abstract: A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: February 9, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Masahiro Atsumi, Hidekazu Nishimura, Masahiro Shibamoto, Hiroshi Yakushiji
  • Publication number: 20200255933
    Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
    Type: Application
    Filed: April 28, 2020
    Publication date: August 13, 2020
    Applicant: Canon Anelva Corporation
    Inventor: Masahiro ATSUMI
  • Patent number: 10676813
    Abstract: This invention provides a deposition apparatus which forms a film on a substrate, comprising: a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: June 9, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventor: Masahiro Atsumi
  • Patent number: 10501210
    Abstract: In an aerospace vehicle in which a satellite is detachably adapted to the first stage rocket and the second stage rocket, an electronic device 65 is installed in the satellite 60, wherein the electronic device 65 controls the first stage rocket 10 and the second stage rocket 20 before the satellite is detached from the first stage rocket 10 and the second stage rocket 20. Thereby, it is unnecessary to provide sensors, radio devices and electronic devices for exclusive use with respect to the first stage rocket 10 and the second stage rocket 20 so that a manufacturing cost of the rockets 10 and 20 can be reduced and a total weight of the rockets 10 and 20 can become lighter by omitting these equipments. Thus, an aerospace vehicle system within the rockets 10 and 20 can be simplified and a launch of the aerospace vehicle can be prepared within a short period.
    Type: Grant
    Filed: October 20, 2008
    Date of Patent: December 10, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Yoshikatsu Kuroda, Masahiro Atsumi, Naohiko Abe, Masahiro Kato
  • Publication number: 20170202077
    Abstract: A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.
    Type: Application
    Filed: December 30, 2016
    Publication date: July 13, 2017
    Applicant: CANON ANELVA CORPORATION
    Inventors: Masahiro ATSUMI, Hidekazu NISHIMURA, Masahiro SHIBAMOTO, Hiroshi YAKUSHIJI
  • Publication number: 20160326630
    Abstract: This invention provides a deposition apparatus which forms a film on a substrate, comprising: a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
    Type: Application
    Filed: July 15, 2016
    Publication date: November 10, 2016
    Applicant: CANON ANELVA CORPORATION
    Inventor: Masahiro ATSUMI
  • Publication number: 20140230728
    Abstract: A vacuum processing apparatus includes a process chamber, a load lock chamber connected to the process chamber, and a transfer device configured to transfer a substrate from the load lock chamber to the process chamber. The transfer device is configured to move the substrate by gravity. The transfer device includes a guide configured to form a transfer path when the substrate moves by the gravity, and a stopper configured to limit movement of the substrate by the gravity when holding the substrate, and cancel the limitation when moving the substrate.
    Type: Application
    Filed: April 28, 2014
    Publication date: August 21, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventors: Yuji Kajihara, Shogo Hiramatsu, Kazuto Yamanaka, Takashi Ueda, Kazutoshi Yoshibayashi, Kenji Sato, Hajime Sahase, Hirohisa Hirayanagi, Masahiro Atsumi
  • Patent number: 8770906
    Abstract: A substrate support apparatus has a substrate holding portion to be inserted into a center hole formed in a substrate to support the substrate in a vertical orientation, and includes a first connecting plate connected to the substrate holding portion and a second connecting plate which faces the first connecting plate and is connectable to a transport robot that transports the substrate to a substrate holder. In addition, a shock absorbing member is arranged between the first connecting plate and the second connecting plate so as to allow a movement of the first connecting plate relative to the second connecting plate in horizontal and vertical directions. Support members are configured to connect the first connecting plate to the second connecting plate while allowing the movement of the first connecting plate relative to the second connecting plate.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: July 8, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Masahiro Atsumi, Masaaki Ishida
  • Publication number: 20100221089
    Abstract: A substrate support apparatus which inserts a substrate holding portion into a center hole formed in a substrate, and supports the substrate in a vertical orientation by the substrate holding portion, comprises a first connecting plate connected to the substrate holding portion, a second connecting plate which faces the first connecting plate and is connected to a transport robot that transports the substrate to a substrate holder, at least three linear support members configured to connect the first connecting plate to the second connecting plate, and an elastic shock absorbing member inserted between the first connecting plate and the second connecting plate.
    Type: Application
    Filed: February 17, 2010
    Publication date: September 2, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Masahiro Atsumi, Masaaki Ishida
  • Publication number: 20090206205
    Abstract: In an aerospace vehicle in which a satellite is detachably adapted to the first step rocket and the second step rocket, an electronic device 65 is installed in the satellite 60, wherein the electronic device 65 controls the first step rocket 10 and the second step rocket 20 before the satellite is detached from the first step rocket 10 and the second step rocket 20. Thereby, it is unnecessary to provide sensors, radio devices and electronic devices for exclusive use with respect to the first step rocket 10 and the second step rocket so that a manufacturing cost of the rockets 10 and 20 can be reduced and a total weight of the rockets 10 and 20 can become lighter by omitting these equipments. Thus, an aerospace vehicle system within the rockets 10 and 20 can be simplified and a launch of the aerospace vehicle can be prepared within a short period.
    Type: Application
    Filed: October 20, 2008
    Publication date: August 20, 2009
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Yoshikatsu KURODA, Masahiro ATSUMI, Naohiko ABE, Masahiro KATO
  • Patent number: 5407331
    Abstract: An integrated motor-driven pump includes an electromagnet disposed in the pump casing opposite a magnet mounted to an impeller of the pump. The impeller is rotatably supported within the casing, and is rotated by inducing a repulsion force in the magnet. In addition, a bearing rotatably supporting the impeller is provided in a portion of the casing formed with a flow passageway which leads working fluid handled by the pump flow to both sides of the bearing so that the bearing can be lubricated and cooled by the working fluid.
    Type: Grant
    Filed: January 13, 1993
    Date of Patent: April 18, 1995
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventor: Masahiro Atsumi