Abstract: The network device information management apparatus includes: a log data acquisition unit configured to acquire log data from each of the plurality of devices, the log data including information about components of the plurality of devices; and an inventory information estimation unit configured to exclude a common portion of the log data before and after registration of the component to extract a component configuration indicating information about the component newly registered to the device, compare the extracted component configuration with the component configuration extracted from a component registered to another device, estimate the common portion as inventory information, and store the estimated inventory information in storage means.

Abstract: Provided that a process for manufacturing an elastic roller having a mandrel and a coating film. The process comprise a first step of forming a coating film on an outer peripheral surface of a first mandrel, and a second step of forming a coating film on an outer peripheral surface of a second mandrel. The process further comprises a cleaning step between the steps. The cleaning step comprising: making a cleaning member arranged coaxially with the central axis of a circular coating head, in a downstream side in a moving direction of the first mandrel with respect to the circular coating head, making the cleaning member relatively approach the circular coating head; bringing a surface to be cleaned into contact with the cleaning member; rotating the cleaning member while the surface comes in contact with the cleaning member; and inserting the cleaning member into the center hole.

Abstract: Provided that a process for manufacturing an elastic roller having a mandrel and a coating film. The process comprise a first step of forming a coating film on an outer peripheral surface of a first mandrel, and a second step of forming a coating film on an outer peripheral surface of a second mandrel. The process further comprises a cleaning step between the steps. The cleaning step comprising: making a cleaning member arranged coaxially with the central axis of a circular coating head, in a downstream side in a moving direction of the first mandrel with respect to the circular coating head, making the cleaning member relatively approach the circular coating head; bringing a surface to be cleaned into contact with the cleaning member; rotating the cleaning member while the surface comes in contact with the cleaning member; and inserting the cleaning member into the center hole.

Abstract: The present invention provides a conductive member in which it is possible to control a variation in resistance due to physical stress from a contact member, and an uneven density in a halftone image can be prevented. The conductive member is a development roller which includes a conductive shaft core, a conductive elastic layer, and a conductive surface layer. The conductive elastic layer contains silicone rubber and a basic carbon black dispersed in the silicone rubber. The surface layer contains a urethane resin having a carboxyl group in its molecule and an acidic carbon black dispersed in the urethane resin.

Abstract: The present invention provides a conductive member in which it is possible to control a variation in resistance due to physical stress from a contact member, and an uneven density in a halftone image can be prevented. The conductive member is a development roller which includes a conductive shaft core, a conductive elastic layer, and a conductive surface layer. The conductive elastic layer contains silicone rubber and a basic carbon black dispersed in the silicone rubber. The surface layer contains a urethane resin having a carboxyl group in its molecule and an acidic carbon black dispersed in the urethane resin.

Abstract: A magnetron 10 is equipped with a helical filament 39, as an element of a cathode assembly, arranged on a central axis of an anode cylindrical body 13. Assuming that a resistance value of the filament 39 before forming the carbonized layer is R1 and a resistance value of the filament 39 after forming the carbonized layer is R2, a thickness of the carbonized layer 42 of the filament 39 is determined such that a carbonization rate Rx defined by the equation “Rx={(R2?R1)/R1}×100” in a range of from 30 to 50%.

Abstract: A magnetron 10 is equipped with a helical filament 39, as an element of a cathode assembly, arranged on a central axis of an anode cylindrical body 13. Assuming that a resistance value of the filament 39 before forming the carbonized layer is R1 and a resistance value of the filament 39 after forming the carbonized layer is R2, a thickness of the carbonized layer 42 of the filament 39 is determined such that a carbonization rate Rx defined by the equation “Rx={(R2?R1)/R1}×100” in a range of from 30 to 50%.