Patents by Inventor Masahiro Kanno
Masahiro Kanno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230217559Abstract: Provided is a microwave processing apparatus that can irradiate an object with microwaves more uniformly. A microwave processing apparatus 1 includes a cavity that has a cylinder-like shape, and includes an internal space for accommodating an object, the cavity being provided with a microwave passage area in a partial region in an axial direction; a microwave generator; a rotary member that is provided on an outer circumferential side of the cavity so as to be rotatable, and includes, on an outer circumferential side of the microwave passage area, a cylinder-like member having a plurality of areas through which microwaves can pass; and a cover member that is provided while covering the entire cylinder-like member in a circumferential direction, and forms, on an outer circumferential side of the cylinder-like member, a wave guidepath for the microwaves introduced from the microwave generator.Type: ApplicationFiled: February 10, 2021Publication date: July 6, 2023Applicant: MICROWAVE CHEMICAL CO., LTD.Inventors: Yasunori TSUKAHARA, Hisao WATANABE, Ryuhei KINJO, Kazushi UEMURA, Masahiro KANNO
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Publication number: 20230059297Abstract: Provided is a moisture meter includes a mass scale for measuring a mass of a specimen, a heater for heat the specimen, a processor causes the moisture meter to control the heater to heat the specimen until a change in mass of the specimen becomes not more than a predetermined threshold and calculate a moisture content of the specimen, and a storage unit. The processor causes the moisture meter to execute a measurement of a moisture content a plurality of times by using, as the specimen, a standard substance for inspection having a predetermined theoretical moisture content with an arbitrary mass when being heated at a predetermined temperature, to calculate a standard deviation of a measured moisture content in the measurement executed the plurality of times, and a to evaluate an influence of an installation environment by determining whether the standard deviation is not more than a predetermined value.Type: ApplicationFiled: January 16, 2020Publication date: February 23, 2023Inventors: Masahiro KANNO, Yoshikazu NAGANE
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Publication number: 20220412860Abstract: Provided is a moisture meter including a mass measurement unit for measuring the mass of a specimen, a heater for heating the specimen, a control arithmetic unit configured to control the heating unit to heat the specimen until a change in the mass of the specimen becomes not more than a predetermined threshold and calculate the moisture content of the specimen, a timepiece for measuring a heating time, and a storage unit.Type: ApplicationFiled: November 28, 2019Publication date: December 29, 2022Inventor: Masahiro KANNO
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Patent number: 10871392Abstract: Provided is a protective cover for a weighing instrument in which movement of a sliding door does not degrade over time. A protective cover (2) for a weighing instrument includes sliding doors (2L, 2R) defining a weighing chamber (5), an upper frame (11) formed at an upper edge of the sliding door, a lower frame (12) formed at a lower edge of the sliding door, an upper guide rail (17) disposed on the upper frame, and a lower guide rail (18) disposed under the lower frame, where the upper guide rail suspends the upper frame, and between the upper guide rail and the upper frame, balls (215) are disposed at a plurality of positions in a moving direction of the sliding door.Type: GrantFiled: July 26, 2016Date of Patent: December 22, 2020Assignee: A&D COMPANY, LIMITEDInventors: Masahiro Kanno, Shunsuke Kasamatsu
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Patent number: 10474028Abstract: A method for fabricating a template includes providing a substrate having a first protrusion portion, forming, on the first protrusion portion of the substrate, a first film including a plurality of first pattern portions and a second pattern portion surrounding the first pattern portions and having a thickness thicker than the first pattern portions, covering at least a portion of the first film with a second film, removing the second pattern portion and exposing one or more of the first pattern portions by removing a portion of the second film from an upper surface of the first pattern by a first etching process, and forming a second protrusion portion by etching the first protrusion portion using the second film as a mask. The method further includes removing the first pattern portions and processing the first protrusion portion and the second protrusion portion by a second etching process.Type: GrantFiled: March 1, 2018Date of Patent: November 12, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventor: Masahiro Kanno
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Patent number: 10366886Abstract: According to one embodiment, a pattern forming method includes supplying, onto an under layer, a self-organization material including a block copolymer which includes a first polymer and a second polymer, and a third polymer having a molecular structure with oxygen attached to a cyclic structure, wherein the third polymer is bonded to the first polymer, and phase-separating the block copolymer to form a phase-separation pattern on the under layer.Type: GrantFiled: February 28, 2017Date of Patent: July 30, 2019Assignee: Toshiba Memory CorporationInventors: Seiji Morita, Masahiro Kanno, Yusuke Kasahara
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Patent number: 10352839Abstract: Provided are a method and device for improving a response speed in a measurement of viscosity of a fluid and obtaining a continuous smooth measurement graph. A viscometer includes a machine part that generates a shear rate in a sample, a machine drive, a shear rate changing means that outputs a target shear rate of the machine part, and a displacement detection sensor that measures displacement of the machine part, and performs feedback control to control a driving force of the machine drive so that an output value of the displacement detection sensor corresponds to the target shear rate and measures a viscosity of a sample, wherein a feedback gain is simply set for each measurement according to an optimum design or target shear rate.Type: GrantFiled: June 16, 2014Date of Patent: July 16, 2019Assignee: A&D COMPANY, LIMITEDInventors: Masahiro Kanno, Yoshikazu Nagane
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Publication number: 20190162587Abstract: Provided is a protective cover for a weighing instrument in which movement of a sliding door does not degrade over time. A protective cover (2) for a weighing instrument includes sliding doors (2L, 2R) defining a weighing chamber (5), an upper frame (11) formed at an upper edge of the sliding door, a lower frame (12) formed at a lower edge of the sliding door, an upper guide rail (17) disposed on the upper frame, and a lower guide rail (18) disposed under the lower frame, where the upper guide rail suspends the upper frame, and between the upper guide rail and the upper frame, balls (215) are disposed at a plurality of positions in a moving direction of the sliding door.Type: ApplicationFiled: July 26, 2016Publication date: May 30, 2019Inventors: Masahiro KANNO, Shunsuke KASAMATSU
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Publication number: 20190079392Abstract: A method for fabricating a template includes providing a substrate having a first protrusion portion, forming, on the first protrusion portion of the substrate, a first film including a plurality of first pattern portions and a second pattern portion surrounding the first pattern portions and having a thickness thicker than the first pattern portions, covering at least a portion of the first film with a second film, removing the second pattern portion and exposing one or more of the first pattern portions by removing a portion of the second film from an upper surface of the first pattern by a first etching process, and forming a second protrusion portion by etching the first protrusion portion using the second film as a mask. The method further includes removing the first pattern portions and processing the first protrusion portion and the second protrusion portion by a second etching process.Type: ApplicationFiled: March 1, 2018Publication date: March 14, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventor: Masahiro KANNO
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Publication number: 20180076019Abstract: According to one embodiment, a pattern forming method includes supplying, onto an under layer, a self-organization material including a block copolymer which includes a first polymer and a second polymer, and a third polymer having a molecular structure with oxygen attached to a cyclic structure, wherein the third polymer is bonded to the first polymer, and phase-separating the block copolymer to form a phase-separation pattern on the under layer.Type: ApplicationFiled: February 28, 2017Publication date: March 15, 2018Inventors: Seiji MORITA, Masahiro KANNO, Yusuke KASAHARA
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Publication number: 20170160176Abstract: Provided are a method and device for improving a response speed in a measurement of viscosity of a fluid and obtaining a continuous smooth measurement graph. A viscometer includes a machine part that generates a shear rate in a sample, a machine drive, a shear rate changing means that outputs a target shear rate of the machine part, and a displacement detection sensor that measures displacement of the machine part, and performs feedback control to control a driving force of the machine drive so that an output value of the displacement detection sensor corresponds to the target shear rate and measures a viscosity of a sample, wherein a feedback gain is simply set for each measurement according to an optimum design or target shear rate.Type: ApplicationFiled: June 16, 2014Publication date: June 8, 2017Applicant: A&D COMPANY, LIMITEDInventors: Masahiro KANNO, Yoshikazu NAGANE
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Patent number: 9291908Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: GrantFiled: June 1, 2015Date of Patent: March 22, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi Hieno, Shigeki Hattori, Hiroko Nakamura, Satoshi Mikoshiba, Koji Asakawa, Masahiro Kanno, Yuriko Seino, Tsukasa Azuma
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Publication number: 20150377759Abstract: Provided is a new method to obtain a shear rate of a fluid and Provided are a program and a device for the method. In the method, a pair of vibrators (1,1) are vibrated by an electromagnetic drive (2) and a viscosity of the sample liquid (9) is calculated by measuring a driving current of a coil (2b), which has a step (S1) of calculating the viscosity (?) of the sample liquid (9), a step (S2) of calculating a driving force (F) on a center of a wet part of the vibrator from the driving current (I), and a step (S3) of calculating a shear stress (S) exerted on the sample liquid from the driving force (F) and a liquid contact area of the vibrator (A), wherein the shear rate (D) is calculated from a ratio between the shear stress (S) and the viscosity (S4).Type: ApplicationFiled: February 28, 2013Publication date: December 31, 2015Inventors: Naoto IZUMO, Masahiro KANNO
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Publication number: 20150261092Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: ApplicationFiled: June 1, 2015Publication date: September 17, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi HIENO, Shigeki HATTORI, Hiroko NAKAMURA, Satoshi MlKOSHIBA, Koji ASAKAWA, Masahiro KANNO, Yuriko SEINO, Tsukasa AZUMA
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Patent number: 9073284Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: GrantFiled: September 25, 2012Date of Patent: July 7, 2015Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi Hieno, Shigeki Hattori, Hiroko Nakamura, Satoshi Mikoshiba, Koji Asakawa, Masahiro Kanno, Yuriko Seino, Tsukasa Azuma
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Patent number: 8986488Abstract: According to one embodiment, a pattern formation method is provided, the pattern formation includes: laminating a self-assembled monolayer and a polymer film on a substrate; causing chemical bonding between the polymer film and the self-assembled monolayer by irradiation with an energy beam to form a polymer surface layer on the self-assembled monolayer; and forming on the polymer surface layer a polymer alloy having a pattern of phase-separated structures.Type: GrantFiled: January 25, 2013Date of Patent: March 24, 2015Assignee: Kabushiki Kaisha ToshibaInventors: Shigeki Hattori, Koji Asakawa, Hiroko Nakamura, Ryota Kitagawa, Yuriko Seino, Masahiro Kanno, Momoka Higa
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Publication number: 20140248439Abstract: According to one embodiment, a pattern formation method includes coating a polymer material on a film to be processed, the polymer material having a first segment and a second segment, the second segment containing a functional group that causes a cross-linking reaction, performing microphase separation of the polymer material to form a self-assembly pattern having a first polymer portion that contains the first segment and a second polymer portion that contains the second segment, performing irradiation with energy rays toward the self-assembly pattern in a cooling state; and selectively removing the first polymer portion.Type: ApplicationFiled: August 1, 2013Publication date: September 4, 2014Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hironobu SATO, Yuriko SEINO, Masahiro KANNO, Hirokazu KATO, Katsutoshi KOBAYASHI, Hiroki YONEMITSU, Ayako KAWANISHI
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Patent number: 8808973Abstract: According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.Type: GrantFiled: February 22, 2012Date of Patent: August 19, 2014Assignee: Kabushiki Kaisha ToshibaInventors: Satoshi Mikoshiba, Koji Asakawa, Hiroko Nakamura, Shigeki Hattori, Atsushi Hieno, Tsukasa Azuma, Yuriko Seino, Masahiro Kanno
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Publication number: 20130078570Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: ApplicationFiled: September 25, 2012Publication date: March 28, 2013Inventors: Atsushi HIENO, Shigeki HATTORI, Hiroko NAKAMURA, Satoshi MIKOSHIBA, Koji ASAKAWA, Masahiro KANNO, Yuriko SEINO, Tsukasa AZUMA
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Publication number: 20120214094Abstract: According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.Type: ApplicationFiled: February 22, 2012Publication date: August 23, 2012Inventors: Satoshi MIKOSHIBA, Koji Asakawa, Hiroko Nakamura, Shigeki Hattori, Atsushi Hieno, Tsukasa Azuma, Yuriko Seino, Masahiro Kanno