Abstract: A source-gas supply apparatus for supplying a source gas into a CVD reactor includes: a reservoir for storing a liquid material; a gas flow path connected the reservoir and the CVD reactor; a sonic nozzle disposed in the gas flow path, through which the source gas is introduced into the CVD reactor; a pressure sensor disposed in the gas flow path upstream of the sonic nozzle; a flow control valve disposed in the gas flow path upstream of the pressure sensor; and a flow control circuit which receives a signal from the pressure sensor and outputs a signal to the flow control valve to adjust opening of the flow control valve as a function of the signal from the pressure sensor.

Abstract: A solenoid valve having a movable member being moved by an electromagnetic attraction of a solenoid section in a valve chest between the solenoid section. A valve seat opposed thereto and a valve body provided an the movable member is abutted against or separated from the valve seat to close or open a valve port or ports. The movable member is supported in the valve chest through a support member or members for regulating a displacement of the movable member in a direction perpendicular to the moving direction of the movable member. The valve body may be fixed to or movable from the movable member. The movable member is formed with a through-hole for receiving the valve body, which extends in the moving direction thereof. The valve body, formed of an elastic material, is disposed in the through-hole and a surface of the valve body, which is opposed to the solenoid section forms a surface of the movable member, which is abutted against the solenoid section.