Patents by Inventor Masahiro Nishiura
Masahiro Nishiura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160022393Abstract: An object of the present invention is to provide an electric toothbrush with a thinner handle part to ensure the ease of manual tooth-brushing while improving the ease of a switch operation between the operating state and the stopped state, the electric toothbrush being configured to realize an effective oral cleaning by automatically giving a necessary mechanical assistance to a brush part according to the brushing state constantly varying during tooth-brushing depending on the cleaned part and the ways of holding and moving the toothbrush. The electric toothbrush includes: a toothbrush main body (2) having a brush part (15) and a handle part (20) for manually operating the brush part (15); a vibration generation means (3) that vibrates the brush part (15); an acceleration sensor (4) that detects a manual brushing action; and a control means (5) that controls at least the vibration generation means (3).Type: ApplicationFiled: March 7, 2014Publication date: January 28, 2016Inventors: Kazuaki YOSHIDA, Masahiro NISHIURA
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Publication number: 20160013033Abstract: An FePt—C-based sputtering target containing Fe, Pt, and C, wherein the FePt—C-based sputtering target has a structure in which primary particles of C that contain unavoidable impurities are dispersed in an FePt-based alloy phase containing 33 at % or more and 60 at % or less of Pt with the balance being Fe and unavoidable impurities, the primary particles of C being dispersed so as not to be in contact with each other.Type: ApplicationFiled: January 31, 2014Publication date: January 14, 2016Inventors: Yasuyuki GOTO, Takamichi YAMAMOTO, Masahiro NISHIURA, Ryousuke KUSHIBIKI
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Patent number: 9228255Abstract: An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.Type: GrantFiled: June 23, 2014Date of Patent: January 5, 2016Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takanobu Miyashita, Yasuyuki Goto, Ryousuke Kushibiki, Masahiro Aono, Masahiro Nishiura
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Publication number: 20150282908Abstract: Provided is an oral cleaning device capable of ensuring a sufficient ejection pressure for a cleaning liquid while employing a small and low-cost electric air pump with a low output. An oral cleaning device is provided with an air-tightly closable cleaning liquid tank 2 which stores a cleaning liquid, a cleaning liquid supply passage 24 which has an ejection port 4a for ejecting the cleaning liquid into the oral cavity on one end and an introduction port 23a open inside the bottom part of the cleaning liquid tank 2 on the other end, and an electric air pump 44 which supplies air into the cleaning liquid tank 2 to pressurize the inside of the cleaning liquid tank 2. The cleaning liquid inside the cleaning liquid tank 2 is supplied to the ejection port 4a through the cleaning liquid supply passage 24 by air pressure inside the cleaning liquid tank 2.Type: ApplicationFiled: October 24, 2013Publication date: October 8, 2015Inventors: Yukinori Wada, Masahiro Nishiura
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Publication number: 20150280537Abstract: Provided is a linear actuator which is simple in structure, inexpensive to manufacture, in addition, has small magnetic leakage, and can provide a large inertial force without increasing the number of parts and weight.Type: ApplicationFiled: June 11, 2015Publication date: October 1, 2015Applicant: SUNSTAR INC.Inventor: Masahiro Nishiura
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Patent number: 9095901Abstract: An FePt-based sputtering target has a structure in which an FePt-based alloy phase, a C phase containing unavoidable impurities, and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities, wherein C is contained in an amount of more than 0 vol % and 20 vol % or less based on the total amount of the target, the metal oxide is contained in an amount of 10 vol % or more and less than 40 vol % based on the total amount of the target, and the total content of C and the metal oxide is 20 vol % or more and 40 vol % or less based on the total amount of the target.Type: GrantFiled: July 10, 2014Date of Patent: August 4, 2015Assignee: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takanobu Miyashita, Yasuyuki Goto, Takamichi Yamamoto, Ryousuke Kushibiki, Masahiro Aono, Masahiro Nishiura
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Patent number: 9072576Abstract: Provided is a linear actuator which is simple in structure, inexpensive to manufacture, in addition, has small magnetic leakage, and can provide a large inertial force without increasing the number of parts and weight.Type: GrantFiled: December 3, 2009Date of Patent: July 7, 2015Assignee: SUNSTAR INC.Inventor: Masahiro Nishiura
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Publication number: 20140322063Abstract: A process for producing an FePt-based sputtering target includes adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy powder and the metal oxide powder to produce a powder mixture.Type: ApplicationFiled: July 14, 2014Publication date: October 30, 2014Inventors: Takanobu MIYASHITA, Yasuyuki GOTO, Takamichi YAMAMOTO, Ryousuke KUSHIBIKI, Masahiro AONO, Masahiro NISHIURA
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Publication number: 20140318955Abstract: An FePt-based sputtering target contains Fe, Pt, and a metal oxide, and further contains one or more kinds of metal elements other than Fe and Pt, wherein the FePt-based sputtering target has a structure in which an FePt-based alloy phase and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and less than 60 at % and the one or more kinds of metal elements in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with the total amount of Pt and the one or more kinds of metal elements being 60 at % or less, and wherein the metal oxide is contained in an amount of 20 vol % or more and 40 vol % or less based on the total amount of the target.Type: ApplicationFiled: July 14, 2014Publication date: October 30, 2014Inventors: Takanobu MIYASHITA, Yasuyuki GOTO, Takamichi YAMAMOTO, Ryousuke KUSHIBIKI, Masahiro AONO, Masahiro NISHIURA
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Publication number: 20140322062Abstract: A process for producing an FePt-based sputtering target includes adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities so that the C powder and the metal oxide powder are contained to satisfy: 0<??20; 10??<40; and 20??+??40, where ? and ? represent contents of the C powder and the metal oxide powder by vol %, respectively, based on a total amount of the FePt-based alloy powder, the C powder, and the metal oxide powder, followed by mixing the FePt-based alloy powder, the C powder, and the metal oxide powder to produce a powder mixture.Type: ApplicationFiled: July 10, 2014Publication date: October 30, 2014Inventors: Takanobu MIYASHITA, Yasuyuki GOTO, Takamichi YAMAMOTO, Ryousuke KUSHIBIKI, Masahiro AONO, Masahiro NISHIURA
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Publication number: 20140318954Abstract: An FePt-based sputtering target has a structure in which an FePt-based alloy phase, a C phase containing unavoidable impurities, and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities, wherein C is contained in an amount of more than 0 vol % and 20 vol % or less based on the total amount of the target, the metal oxide is contained in an amount of 10 vol % or more and less than 40 vol % based on the total amount of the target, and the total content of C and the metal oxide is 20 vol % or more and 40 vol % or less based on the total amount of the target.Type: ApplicationFiled: July 10, 2014Publication date: October 30, 2014Inventors: Takanobu MIYASHITA, Yasuyuki GOTO, Takamichi YAMAMOTO, Ryousuke KUSHIBIKI, Masahiro AONO, Masahiro NISHIURA
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Patent number: 8858674Abstract: An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.Type: GrantFiled: March 15, 2012Date of Patent: October 14, 2014Assignee: Tanaka Kikinzoku Kogyo K.K.Inventors: Takanobu Miyashita, Yasuyuki Goto, Ryousuke Kushibiki, Masahiro Aono, Masahiro Nishiura
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Publication number: 20140301887Abstract: An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.Type: ApplicationFiled: June 23, 2014Publication date: October 9, 2014Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takanobu MIYASHITA, Yasuyuki GOTO, Ryousuke KUSHIBIKI, Masahiro AONO, Masahiro NISHIURA
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Publication number: 20140021043Abstract: An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.Type: ApplicationFiled: March 15, 2012Publication date: January 23, 2014Applicant: TANAKA KIKINZOKU KOGYO K.K.Inventors: Takanobu Miyashita, Yasuyuki Goto, Ryousuke Kushibiki, Masahiro Aono, Masahiro Nishiura
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Publication number: 20120156641Abstract: A vibrational frequency adjustment device comprises, as a vibrational frequency adjustment means (22): a first conversion means (40) which is provided with an input-side rotating member (41), an output-side rotating member (42), and a one-way clutch (44) for transmitting only the rotational motion in one direction of the input-side rotating member (41) to the output-side rotating member (42) and which, by causing the input-side rotating member (41) to pivot in a reciprocating manner by a set angle by means of the reciprocating linear motion of an output shaft (10), transmits only the forward motion or the reverse motion of the input-side rotating member (41) to the output-side rotating member (42) through the one-way clutch (44) to thereby rotate the output-side rotating member (42) by a given angle; and a second conversion means (50) which converts the rotational motion of the output-side rotating member (42) into the reciprocating linear motion of a second shaft member (43).Type: ApplicationFiled: August 9, 2010Publication date: June 21, 2012Applicant: Sunstar Suisse SAInventors: Yukinori Wada, Masahiro Nishiura
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Publication number: 20110239383Abstract: Provided is a linear actuator which is simple in structure, inexpensive to manufacture, in addition, has small magnetic leakage, and can provide a large inertial force without increasing the number of parts and weight.Type: ApplicationFiled: December 3, 2009Publication date: October 6, 2011Applicant: SUNSTAR INC.Inventor: Masahiro Nishiura