Abstract: A patterning method includes defining, in the case of an electric current which exceeds an allowable limit flowing between first conduction type well regions arranged in a semiconductor substrate, a first pattern between the first conduction type well regions; defining a second pattern by removing, in the case of a first region in which arrangement is inhibited being in the first pattern, the first region from the first pattern; defining a third pattern by removing, in the case of a second region which exceeds a fabrication limit being in the second pattern, the second region from the second pattern; and using the third pattern as a dummy active region in a second conduction type well region arranged in the semiconductor substrate.

Abstract: A patterning method includes defining, in the case of an electric current which exceeds an allowable limit flowing between first conduction type well regions arranged in a semiconductor substrate, a first pattern between the first conduction type well regions; defining a second pattern by removing, in the case of a first region in which arrangement is inhibited being in the first pattern, the first region from the first pattern; defining a third pattern by removing, in the case of a second region which exceeds a fabrication limit being in the second pattern, the second region from the second pattern; and using the third pattern as a dummy active region in a second conduction type well region arranged in the semiconductor substrate.

Abstract: A fuse element reading circuit including a first fuse element having a resistance which differs in accordance with whether the first fuse element is in a blown state or an unblown state, a reference voltage output circuit unit that outputs a reference voltage that differs in accordance with a normal mode or a test mode, and a voltage comparison circuit unit that compares a read voltage corresponding to the resistance of the first fuse element with the reference voltage output from the reference voltage output circuit unit.

Abstract: A fuse element reading circuit including a first fuse element having a resistance which differs in accordance with whether the first fuse element is in a blown state or an unblown state, a reference voltage output circuit unit that outputs a reference voltage that differs in accordance with a normal mode or a test mode, and a voltage comparison circuit unit that compares a read voltage corresponding to the resistance of the first fuse element with the reference voltage output from the reference voltage output circuit unit.

Abstract: A load distributing method includes receiving information concerning resources of a terminal device from the terminal device in a grid on a network of a grid computing system; extracting, from a computation data group related to grid computing and based on the received information concerning resources, computation data corresponding to the resources; and distributing to the terminal device, the extracted computation data together with content reproducible during processing of the computation data.

Abstract: A patterning method includes defining, in the case of an electric current which exceeds an allowable limit flowing between first conduction type well regions arranged in a semiconductor substrate, a first pattern between the first conduction type well regions; defining a second pattern by removing, in the case of a first region in which arrangement is inhibited being in the first pattern, the first region from the first pattern; defining a third pattern by removing, in the case of a second region which exceeds a fabrication limit being in the second pattern, the second region from the second pattern; and using the third pattern as a dummy active region in a second conduction type well region arranged in the semiconductor substrate.

Abstract: A silicide region includes a first contact region, a fuse region having a narrower longitudinal width than that of the first contact region, and a second contact region provided on an opposite side of the fuse region with respect to the first contact region. A non-silicide region is provided at a position adjacent to a non-fuse-contacting side that is opposite to a side on which the second contact region in contact with the fuse region.