Patents by Inventor Masahiro Yomaoka

Masahiro Yomaoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus
    Publication number: 20020048026
    Abstract: An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.
    Type: Application
    Filed: March 28, 2001
    Publication date: April 25, 2002
    Inventors: Fumio Isshiki, Masakazu Sugaya, Tatsundo Suzuki, Masahiro Yomaoka, Sumio Hosaka