Patents by Inventor Masahiro Yuyama
Masahiro Yuyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11319422Abstract: Provided are a photocatalyst transfer film allowing a photocatalyst layer that is uniform, highly transparent, and exhibits an antimicrobial property in dark places to be transferred to the surfaces of various transfer base materials; and a production method thereof. The photocatalyst transfer film has, on a base film, a photocatalyst layer containing a titanium oxide particle-containing photocatalyst, antimicrobial metal-containing alloy particles, a silicon compound and a surfactant. The production method of the photocatalyst transfer film includes applying a photocatalyst coating liquid to a base film; and performing drying. The photocatalyst coating liquid contains a titanium oxide particle-containing photocatalyst, antimicrobial metal-containing alloy particles, a silicon compound, a surfactant and an aqueous dispersion medium.Type: GrantFiled: March 26, 2019Date of Patent: May 3, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro Yuyama, Manabu Furudate, Tomohiro Inoue
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Publication number: 20210053029Abstract: Provided are a photocatalyst transfer film allowing a photocatalyst layer that is uniform, highly transparent, and exhibits an antimicrobial property in dark places to be transferred to the surfaces of various transfer base materials; and a production method thereof. The photocatalyst transfer film has, on a base film, a photocatalyst layer containing a titanium oxide particle-containing photocatalyst, antimicrobial metal-containing alloy particles, a silicon compound and a surfactant. The production method of the photocatalyst transfer film includes applying a photocatalyst coating liquid to a base film; and performing drying. The photocatalyst coating liquid contains a titanium oxide particle-containing photocatalyst, antimicrobial metal-containing alloy particles, a silicon compound, a surfactant and an aqueous dispersion medium.Type: ApplicationFiled: March 26, 2019Publication date: February 25, 2021Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro YUYAMA, Manabu FURUDATE, Tomohiro INOUE
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Publication number: 20210016249Abstract: Provided are a photocatalyst transfer film allowing a uniform and highly transparent photocatalyst layer to be transferred to the surfaces of various transfer base materials; and a production method thereof. The photocatalyst transfer film has, on a biaxially oriented polypropylene film, a photocatalyst layer containing a titanium oxide particle-containing photocatalyst, a silicon compound and a surfactant. The production method of the photocatalyst transfer film includes applying a photocatalyst coating liquid to a biaxially oriented polypropylene film; and performing drying. The photocatalyst coating liquid contains a titanium oxide particle-containing photocatalyst, a silicon compound, a surfactant and an aqueous dispersion medium.Type: ApplicationFiled: March 26, 2019Publication date: January 21, 2021Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro YUYAMA, Manabu FURUDATE, Tomohiro INOUE
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Patent number: 6620513Abstract: The subject matter of the invention is a base sheet for the preparation of a flexible printed circuit board which is a three-layered laminate consisting of (a) an electrically insulating film of a plastic resin such as a polyimide, (b) an epoxy resin-based adhesive layer and (c) a copper foil bonded to the film (a) with intervention of the adhesive layer (b). The base sheet can exhibit excellent performance in respect of peeling resistance, soldering heat resistance, dimensional stability and solvent resistance as well as workability into a printed circuit board only when each of the layers (a), (b) and (c) has a specified thickness in a narrow range of 10-30 &mgr;m, 5-15 &mgr;m and 5-15 &mgr;m, respectively.Type: GrantFiled: July 2, 2001Date of Patent: September 16, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masahiro Yuyama, Hitoshi Arai, Yoshitsugu Eguchi
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Publication number: 20020012780Abstract: The subject matter of the invention is a base sheet for the preparation of a flexible printed circuit board which is a three-layered laminate consisting of (a) an electrically insulating film of a plastic resin such as a polyimide, (b) an epoxy resin-based adhesive layer and (c) a copper foil bonded to the film (a) with intervention of the adhesive layer (b). The base sheet can exhibit excellent performance in respect of peeling resistance, soldering heat resistance, dimensional stability and solvent resistance as well as workability into a printed circuit board only when each of the layers (a), (b) and (c) has a specified thickness in a narrow range of 10-30 &mgr;m, 5-15 &mgr;m and 5-15 &mgr;m, respectively.Type: ApplicationFiled: July 2, 2001Publication date: January 31, 2002Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masahiro Yuyama, Hitoshi Arai, Yoshitsugu Eguchi
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Patent number: 6339167Abstract: Organohalosilanes are prepared by reacting metallic silicon with a halogenated hydrocarbon in the presence of a copper or copper compound catalyst and an activated aluminum, aluminum alloy or aluminum carbide promotor. The reaction is carried out at a temperature of 250-400° C. in a stirred tank reactor or a fluidized bed reactor. The inventive process shortens the time required for activation in the Rochow reaction and increases the selectivity for desirable diorganodihalosilanes. The steady state is thus prolonged and conversion of the silicon enhanced, resulting in an improved reaction performance.Type: GrantFiled: February 14, 2001Date of Patent: January 15, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mikio Aramata, Kazutoshi Fujioka, Masahiro Yuyama
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Patent number: 6288258Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst and introducing an organohalide-containing gas into the reactor to effect the direct reaction, 50-10,000 ppm of bronze phosphide is added to the contact mass. The invention is successful in efficiently producing organohalosilanes in a high STY and low T/D.Type: GrantFiled: October 24, 2000Date of Patent: September 11, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mikio Aramata, Tatsuya Fujimoto, Ryuichi Saito, Masahiro Yuyama, Tetsuya Inukai, Hajime Ishizaka
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Publication number: 20010020108Abstract: Organohalosilanes are prepared by reacting metallic silicon with a halogenated hydrocarbon in the presence of a copper or copper compound catalyst and an activated aluminum, aluminum alloy or aluminum carbide promotor. The reaction is carried out at a temperature of 250-400° C. in a stirred tank reactor or a fluidized bed reactor. The inventive process shortens the time required for activation in the Rochow reaction and increases the selectivity for desirable diorganodihalosilanes. The steady state is thus prolonged and conversion of the silicon enhanced, resulting in an improved reaction performance.Type: ApplicationFiled: February 14, 2001Publication date: September 6, 2001Inventors: Mikio Aramata, Kazutoshi Fujioka, Masahiro Yuyama
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Publication number: 20010018122Abstract: Disclosed is an improved epoxy resin-based adhesive composition, which is particularly suitable for use in the preparation of a base sheet for flexible printed circuit boards as a laminate of an insulating plastic resin film and a foil of a metal such as copper as well as in the preparation of a coverlay film for protection of the circuit pattern of the metal foil in a flexible printed circuit board. The adhesive composition comprises, as a uniform blend, (a) an epoxy resin, (b) an acrylic rubber modified by carboxyl groups to have a specified content of the carboxyl groups, (c) a curing agent for the epoxy resin such as an aromatic amine compound and (d) a curing promoter, each in a specified weight proportion.Type: ApplicationFiled: January 17, 2001Publication date: August 30, 2001Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masahiro Yuyama, Hitoshi Arai, Yoshitsugu Eguchi
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Patent number: 6054509Abstract: Provided by the invention is a thermosetting adhesive composition suitable for use in the preparation of metal foil-laminated base sheets of flexible printed circuit boards and laminated product related thereto such as coverlay films and bonding sheets. The adhesive composition is a uniform blend which comprises: (A) an epoxy resin including a brominated epoxy resin to exhibit flame retardancy; (B) a combination of two or three kinds of different nitrile rubbers distinguishable relative to the iodine value and content of carboxyl groups at the molecular chain ends in a specified weight proportion; (C) a curing agent for the epoxy resin; and (D) a curing accelerator, with optional admixture of (E) an inorganic filler; and/or (F) a vulcanizing agent for the nitrile rubbers.Type: GrantFiled: July 13, 1998Date of Patent: April 25, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hitoshi Arai, Masahiro Yuyama, Yoshitsugu Eguchi
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Patent number: 5494991Abstract: Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein Ar.sub.1 represents a tetravalent aromatic group and each Ar.sub.2 represents a divalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.Type: GrantFiled: June 17, 1994Date of Patent: February 27, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ichiro Kaneko, Atushi Sugitani, Masahiro Yuyama, Kiyoshi Motomi
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Patent number: 5478914Abstract: Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein R.sub.1 represents a tetravalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.Type: GrantFiled: July 1, 1994Date of Patent: December 26, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ichiro Kaneko, Atushi Sugitani, Masahiro Yuyama, Kiyoshi Motomi
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Patent number: 4978702Abstract: A coating composition is disclosed which includes(A) 15 to 65% by weight (calculated as SiO.sub.2) of colloidal silica,a partially hydrolyzed and partially co-condensed product of the following component (B) and component (C):(B) 10 to 80% by weight (calculated as R.sup.1 Si(OH).sub.3) of a trialkoxysilane of the formula: R.sup.1 Si(OR.sup.2).sub.3 wherein the group R.sup.1 is methyl or vinyl and the group R.sup.2 is alkyl having 1 to 4 carbon atoms,(C) 1 to 50% by weight (calculated as R.sup.3.sub.n Si(OH).sub.4-n) of an acetoxysilane of the formula: R.sup.3.sub.n Si(OCOCH.sub.3).sub.4-n wherein the group R.sup.3 is alkyl having 1 to 3 carbon atoms, vinyl, phenyl, or mercaptoalkyl having 1 to 3 carbon atoms, and n is an integer of 0 to 2, provided that the total amount of the component (B) wherein the group R.sup.1 is methyl and the component (C) wherein the group R.sup.Type: GrantFiled: August 26, 1988Date of Patent: December 18, 1990Assignee: Sumitomo Chemical Company, LimitedInventors: Masahiro Yuyama, Masahiko Moritani, Mikio Futagami
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Patent number: 4965321Abstract: A thermoplastic copolymer which comprises (a) 2.0 to 22.0% by weight of a methyl methacrylate unit, (b) 38.0 to 70.0% by weight of a styrene unit, and 20.0 to 45.0% by weight in total of both (c) a methacrylic acid unit and (d) an acid anhydride unit having a 6-membered ring structures. The acid anhydride unit has a 6-membered ring structure being in an amount of not less than 16.0% by weight per total amount of the units (c) and (d), and the copolymer has a reduced viscosity of 0.3 to 1.5 dl/g (measured in a 1% solution in dimethylformamide at 25.degree. C. which has well balanced heat distortion resisting properties, water absorption properties and mechanical strength and excellent heat stability in the fabrication thereof, and is useful for producing various parts such as automobile parts, electrical parts, industrial parts and miscellaneous goods.Type: GrantFiled: July 28, 1988Date of Patent: October 23, 1990Assignee: Sumitomo Chemical Co., Ltd.Inventors: Masahiro Yuyama, Teruhisa Koyama, Hideaki Matsurra, Shinji Date
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Patent number: 4885125Abstract: An unsaturated compound having a vinyl or vinylidene group is rapidly in-mold polymerized by mixing the unsaturated compound containing a polymerization initiator and the unsaturated compound containing a polymerization accelerator, pouring the mixture into a mold cavity and polymerizing the monomer for not longer than 30 minutes.Type: GrantFiled: August 27, 1986Date of Patent: December 5, 1989Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Yukio Yasunori
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Patent number: 4859750Abstract: Improved method for the production of a polymer of a monofunctional (unsaturated) monomer, particularly polymethyl methacrylate, by a rapid crosslinking polymerization, which comprises polymerizing a mixture of a monofunctional (unsaturated) monomers, selected from methyl methacrylate and a monomer mixture comprising predominantly methyl methacrylate which may partially contain a polymer of the monomer (i.e. a syrup of the monomer or monomer mixture), and a polyfunctional (unsaturated) monomer in the presence of (1) a radical polymerization initiator, (2) a reducing compound containing sulfur in the molecule thereof, (3) an amine hydrohalogenate or a quaternary ammonium halide and (4) a copper-containing compound. Said polymer has high mechanical properties and excellent transparency and is useful particularly for the production of optical parts such as conventional lenses, Fresnel's lens, optical recording disc media, prisms, mirrors, etc.Type: GrantFiled: August 21, 1986Date of Patent: August 22, 1989Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Yukio Yasunori
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Patent number: 4837286Abstract: Improved method for the production of polymethacrylates by a rapid polymerization, which comprises polymerizing an unsaturated monomer selected from a methacrylate and a monomer mixture comprising predominantly a methacrylate which may partially contain a polymer of the monomer (i.e. a syrup of the monomer or monomer mixture) in the presence of a radical polymerization initiator, a reducing compound containing sulfur in the molecule thereof, a copper-containing compound and a specific tertiary amine hydrohalogenate or a quaternary ammonium halide. Said polymethacrylates can give molded products having excellent mold release characteristics and are useful particularly for the production of optical parts such as conventional lenses, Fresnel's lens, optical recording disc media, prisms, mirrors, etc.Type: GrantFiled: August 28, 1986Date of Patent: June 6, 1989Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Yukio Yasunori
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Patent number: 4789709Abstract: A process for the production of a thermoplastic copolymer having excellent heat distortion resistance is disclosed. The process includes heat-treating a raw copolymer comprising a vinyl monomer unit including methacrylic and/or acrylic acid units in the presence of a specific ring-closing promoter selected from basic compounds, whereby the methacrylic and/or acrylic acid unit is converted into six-membered cyclic anhydride unit. The copolymer has excellent heat distortion resistance, transparency, mechanical properties and processability, and can produce a formed product without splash on the surface. The copolymer is useful for the production of various parts, such as automobile parts, electrical parts, industrial parts, and miscellaneous goods.Type: GrantFiled: October 30, 1986Date of Patent: December 6, 1988Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Hideaki Matsuura, Susumu Iijima, Tsuyoshi Hashimoto
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Patent number: 4717756Abstract: A polymerization can be carried out rapidly by polymerizing a methacrylate ester or a mixture of unsaturated monomers comprising the methacrylate ester as a main component in the presence of (1) a hydroperoxide polymerization initiator, (2) a reductant containing sulfur in a molecule, (3) a hydrogen halogenide salt of amine or a quarternary halogenide and (4) a copper-containing compound.Type: GrantFiled: April 6, 1987Date of Patent: January 5, 1988Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Yukio Yasunori
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Patent number: 4699964Abstract: An acrylic resin composition having excellent permanent antistatic properties, which comprises a copolymer of an acrylic monomer comprising predominantly methyl methacrylate with a specific sulfonate and optionally a specific alkylene oxide and/or acidic phosphate, and a method for the production thereof. The acrylic resin composition of the invention shows excellent antistatic properties without losing the excellent properties of methacrylic resin, such as excellent transparency, mechanical properties, heat resistance, etc., and is useful for various utilities, such as preparation of advertising display, lighting fixtures, covers, nameplate, and various decoratings.Type: GrantFiled: May 7, 1986Date of Patent: October 13, 1987Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuyuki Kato, Masahiro Yuyama, Masahiko Moritani, Mikio Futagami