Patents by Inventor Masahito YAHAGI
Masahito YAHAGI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11693313Abstract: A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the ?-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic groupType: GrantFiled: November 10, 2020Date of Patent: July 4, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masahito Yahagi, Takahiro Kojima
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Patent number: 11656549Abstract: A resist composition including a resin component (A1) having a structural unit (a01), a structural unit (a02) and a structural unit (a03) derived from compounds represented by general formulae (a01-1), (a02-1) and (a03-1), respectively (W01 represents a polymerizable group-containing group containing no oxygen; W02 represents a polymerizable group-containing group containing oxygen; W03 represents a polymerizable group-containing group which may contain oxygen; Wa01 and Wa02 represent an aromatic hydrocarbon group; Xa03 represents a group which forms an alicyclic hydrocarbon group together with Ya03; Ra00 represents a hydrocarbon group which may have a substituent)Type: GrantFiled: November 2, 2020Date of Patent: May 23, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masahito Yahagi, Yoichi Hori
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Patent number: 11586111Abstract: A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W1 portion converted into a main chain (in formula (d0), Rd01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the ?-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group).Type: GrantFiled: December 2, 2019Date of Patent: February 21, 2023Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yasuhiro Yoshii, Masahito Yahagi, Yoichi Hori, Takahiro Kojima
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Patent number: 11392033Abstract: A resist composition including a resin component whose solubility in a developing solution is changed due to the action of the acid, in which the resin component has a constitutional unit derived from a compound represented by Formula (a0-1) and a constitutional unit containing an acid decomposable group whose polarity is increased due to the action of the acid. In the formula, W represents a polymerizable group-containing group, Ya0 represents a carbon atom, Xa0 represents a group that forms a monocyclic aliphatic hydrocarbon group together with Ya0, some or all hydrogen atoms in the monocyclic aliphatic hydrocarbon group may be substituted with substituents, and Ra00 represents an aromatic hydrocarbon group which may have a substituent.Type: GrantFiled: December 17, 2018Date of Patent: July 19, 2022Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Hitoshi Yamano, Takahiro Kojima, Yoichi Hori, Yasuhiro Yoshii, Masahito Yahagi
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Patent number: 11372329Abstract: A resist composition including a polymeric compound having a structural unit in which a compound represented by formula (a0-1) has a polymerizable group within the W1 portion converted into a main chain, and a compound represented by formula (b1-1) in which W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the ?-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group or a chain hydrocarbon group; R12 and R13 are mutually bonded to form a 5-membered aliphatic monocyclic group, or a condensed polycyclic hydrocarbon group containing a 5-membered aliphatic monocyclic ring; Rb11 represents a cyclic group; Rb10, Rb20 and Rb30 each independently represents a substituent; nb1 represents an integer of 0 to 4; nb2 represents an integer of 0 to 5; nb3 represents an integer of 0 to 5; and X? represents a counteranion.Type: GrantFiled: October 14, 2019Date of Patent: June 28, 2022Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masahito Yahagi, Yoichi Hori, Tatsuya Fujii, Yuki Fukumura
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Publication number: 20220179306Abstract: A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and a compound (B1) represented by General Formula (b0), in which Ra01 represents a hydrocarbon group; Ya02 represents a single bond or a divalent linking group; Ra02 represents a hydrogen atom, a hydroxy group, or a hydrocarbon group; Ar represents a benzene ring or a naphthalene ring; Ra01 and Ra02 may be bonded to each other to form a ring with a secondary carbon atom to which Ra01 and Ya02 are bonded, Ya02, a carbon atom of Ar, to which Ya02 is bonded, and a carbon atom of Ar, to which Ra02 is bonded; n01 represents an integer in a range of 1 to 6; Rb1 represents a fluorine atom or a trifluoromethyl groupType: ApplicationFiled: November 24, 2021Publication date: June 9, 2022Inventors: Rin ODASHIMA, Masatoshi ARAI, Masahito YAHAGI
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Publication number: 20220179314Abstract: A resist composition containing a resin component that exhibits changed solubility in a developing solution under action of acid and a photodecomposable base that controls the diffusion of the acid generated upon exposure, the resin component has a constitutional unit represented by General Formula (a0-1), and the photodecomposable base has an anion moiety and a cation moiety, where the energy of LUMO of the cation moiety is ?4.Type: ApplicationFiled: November 18, 2021Publication date: June 9, 2022Inventors: Rin ODASHIMA, Masatoshi ARAI, Masahito YAHAGI
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Publication number: 20220179313Abstract: A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and contains a photodecomposable base in which an acid dissociation constant of a conjugate acid is 4.Type: ApplicationFiled: November 17, 2021Publication date: June 9, 2022Inventors: Masahito YAHAGI, Takahiro KOJIMA, Rin ODASHIMA
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Publication number: 20220121118Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Mm+ represents an m-valent organic cation, and Rd0 represents a substituentType: ApplicationFiled: October 6, 2021Publication date: April 21, 2022Inventors: Masahito YAHAGI, Tasuku MATSUMIYA, Yosuke SUZUKI, Yuta IWASAWA, Takahiro KOJIMA, Koshi ONISHI
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Publication number: 20220121116Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Rb1 and Rb4 represents an aryl group having a fluorine atom, Rb2, Rb3, and Rb5 represents an aryl group or the like which may have a substituent, and X01? and X02? represents a counter anionType: ApplicationFiled: October 11, 2021Publication date: April 21, 2022Inventors: Koshi ONISHI, Masatoshi ARAI, Masahito YAHAGI, Yosuke SUZUKI, Yuta IWASAWA
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Publication number: 20220107565Abstract: A resist composition containing a silicon-containing resin, an acid generator component which generates an acid upon exposure, and a photodecomposable base which controls diffusion of the acid generated from the acid generator component upon exposure, in which the silicon content proportion in the silicon-containing resin is in a range of 20% to 25% with respect to a total amount of all atoms constituting the silicon-containing resin.Type: ApplicationFiled: September 24, 2021Publication date: April 7, 2022Inventors: Masaru TAKESHITA, Kazufumi SATO, Masahito YAHAGI
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Patent number: 11275306Abstract: A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rd0 represents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Wax0 represents an (nax0+1)-valent aromatic hydrocarbon group which may have a substituent.Type: GrantFiled: November 18, 2019Date of Patent: March 15, 2022Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Kojima, Yasuhiro Yoshii, Masahito Yahagi, Yoichi Hori
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Patent number: 11204551Abstract: A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va1 is a divalent hydrocarbon group, na1 represents an integer of 0 to 2, Ya0 is a carbon atom, Xa0 is a group forming a monocyclic aliphatic hydrocarbon group together with Ya0, and Ra00 is an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group, Yb1 represents a divalent linking group containing an ester bond, Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, and Mm+ is an m-valent organic cation.Type: GrantFiled: June 23, 2017Date of Patent: December 21, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masahito Yahagi, Issei Suzuki, Yuki Fukumura, Toshikazu Takayama, Takashi Kamizono, Tatsuya Fujii
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Patent number: 11187981Abstract: A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.Type: GrantFiled: December 14, 2018Date of Patent: November 30, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoichi Hori, Yasuhiro Yoshii, Masahito Yahagi, Hitoshi Yamano, Takahiro Kojima
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Publication number: 20210149303Abstract: A resist composition including an onium salt acid generator component (B) and a compound (D0) represented by general formula (d0) having a anion moiety and a cation moiety, the cation moiety of at least one of the onium salt acid generator component (B) and the compound (D0) being a cation having an electron-withdrawing group (in formula (d0), represents an m-valent organic cation; Rd0 represents a substituent; n represents an integer of 2 or more).Type: ApplicationFiled: November 10, 2020Publication date: May 20, 2021Inventors: Takahiro KOJIMA, Masahito YAHAGI
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Publication number: 20210149302Abstract: A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the ?-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic groupType: ApplicationFiled: November 10, 2020Publication date: May 20, 2021Inventors: Masahito YAHAGI, Takahiro KOJIMA
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Publication number: 20210132495Abstract: A resist composition including a resin component (A1) having a structural unit (a01), a structural unit (a02) and a structural unit (a03) derived from compounds represented by general formulae (a01-1), (a02-1) and (a03-1), respectively (W01 represents a polymerizable group-containing group containing no oxygen; W02 represents a polymerizable group-containing group containing oxygen; W03 represents a polymerizable group-containing group which may contain oxygen; Wa01 and Wa02 represent an aromatic hydrocarbon group; Xa03 represents a group which forms an alicyclic hydrocarbon group together with Ya03; Ra00 represents a hydrocarbon group which may have a substituent)Type: ApplicationFiled: November 2, 2020Publication date: May 6, 2021Inventors: Masahito Yahagi, Yoichi Hori
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Patent number: 10976661Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including a polymer compound (A1) which has a constitutional unit (a0) derived from a compound represented by Formula (a0-1) and a constitutional unit (a10) derived from a compound represented by Formula (a10-1) and does not have a constitutional unit represented by Formula (1). In the formulas, Rax0 and Rax1 represent a polymerizable group-containing group; Wax0 and Wax1 represent an (nax0+1)-valent or (nax1+1)-valent aromatic hydrocarbon group; nax0 and nax1 represent an integer of 1 to 3; and Z2 represents Fe, Co, Ni, Cr, or Ru.Type: GrantFiled: June 29, 2018Date of Patent: April 13, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroto Yamazaki, Masahito Yahagi, Kenta Suzuki
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Publication number: 20200183275Abstract: A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rd0 represents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Wax0 represents an (nax0+1)-valent aromatic hydrocarbon group which may have a substituent.Type: ApplicationFiled: November 18, 2019Publication date: June 11, 2020Inventors: Takahiro KOJIMA, Yasuhiro YOSHII, Masahito YAHAGI, Yoichi HORI
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Publication number: 20200174369Abstract: A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W1 portion converted into a main chain (in formula (d0), Rd01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the ?-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group).Type: ApplicationFiled: December 2, 2019Publication date: June 4, 2020Inventors: Yasuhiro YOSHII, Masahito YAHAGI, Yoichi HORI, Takahiro KOJIMA