Abstract: Provided is a polishing pad material melting device including: a melting unit configured to melt a solid material; a flow path through which the material melted in the melting unit is circulated; and a filter unit fluidically connected to the flow path and including a filter unit body configured to filter the material melted in the melting unit, wherein the flow path includes a circulation path through which the material melted by the melting unit is circulated, and the filter unit is fluidically connected to the circulation path.

Abstract: A polishing pad material purification system includes a melting device configured to melt a solid material put therein, and a homogenizer configured to homogenize the material melted in the melting device. The homogenizer is configured to have a processable amount of material to be homogenized larger than a processable amount of material to be melted by the melting device and configured to stir the material melted in the melting device so as to homogenize it.

Abstract: Provided is a filtration device including: a filter unit having a filter medium; and a holder configured to hold the filter unit and form a flow path in which a fluid passes through the filter medium of the filter unit, wherein a pore size of the filter medium at the downstream end position of the filter unit is smaller than a pore size of the filter medium at the upstream end position of the filter unit.