Patents by Inventor Masahlko Ishizone

Masahlko Ishizone has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8072712
    Abstract: At both sides of an element portion, a first hard bias layer having a higher residual magnetization Mr and a second hard bias layer having a higher coercive force Hc are deposited in that order from the bottom with one end of the first hard bias layer being closed close to a free magnetic layer. A film thickness ratio of the first hard bias layer in a whole hard bias layer is from 35% to 75%. This stabilizes magnetization in the free magnetic layer to reduce asymmetry, thus enabling improvement in stability of reproducing characteristics including noise suppression.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: December 6, 2011
    Assignee: TDK Corporation
    Inventors: Masahlko Ishizone, Yasuo Hayakawa