Patents by Inventor Masaie Fujino

Masaie Fujino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6579620
    Abstract: A water-repellent coating has tetrafluoroethylene resin powder, silicone resin binder, and organic solvent. The tetrafluoroethylene resin powder has a ratio of the peak absorbance at 1,800 cm−1 to the peak absorbance at 500 cm−1 of 0.0001 to 0.05 exclusive. A coating film is formed by applying such a coating on a substrate. The coating has the properties of high water repellency, excellent anti-ice-coating, excellent anti-snow-coating, and so on, in spite of not having a large amount of fluororesin powder. In addition, the coating of film keeps the water repellency regardless of whether the coating film is immersed into water for a long time.
    Type: Grant
    Filed: November 14, 2001
    Date of Patent: June 17, 2003
    Assignees: NTT Advanced Technology Corp., Nippon Telegraph and Telephone Corp.
    Inventors: Seiichiro Mizuno, Chiemi Nishi, Yasuhiro Tsukamoto, Masaie Fujino, Tsutomu Yanagawa, Takehito Ota, Hiroki Yonezawa, Ken-ichi Takai, Goro Yamauchi
  • Publication number: 20020111402
    Abstract: A water-repellent coating has tetrafluoroethylene resin powder, silicone resin binder, and organic solvent. The tetrafluoroethylene resin powder has a ratio of the peak absorbance at 1,800 cm−1 to the peak absorbance at 500 cm −1 of 0.0001 to 0.05 exclusive. A coating film is formed by applying such a coating on a substrate. The coating has the properties of high water repellency, excellent anti-ice-coating, excellent anti-snow-coating, and so on, in spite of not having a large amount of fluororesin powder. In addition, the coating of film keeps the water repellency regardless of whether the coating film is immersed into water for a long time.
    Type: Application
    Filed: November 14, 2001
    Publication date: August 15, 2002
    Applicant: NTT Advanced Technology Corporation
    Inventors: Seiichiro Mizuno, Chiemi Nishi, Yasuhiro Tsukamoto, Masaie Fujino, Tsutomu Yanagawa, Takehito Ota, Hiroki Yonezawa, Ken-Ichi Takai, Goro Yamauchi
  • Patent number: 4997899
    Abstract: An improvement in the process for preparing an organometallic polymer having a main chain constituted of silicon and/or germanium or having a main chain constituted of a linkage including carbon and silicon or germanium and further having side chain constituted of organic substituting groups, such as alkyl or aryl group. The improved process comprises the step of dehalogenating an organosilane or organogermane halide in the presence of an alkali metal and a crown ether having 28 or less carbon atoms and 10 or less oxygen atoms, whereby the organosilane or organogermane halide is polymerized by condensation. The crown ether acts as a promotor, and preferable examples used in the process of the invention include 18-crown-6 and 12-crown-4. The molecular weight of the organometallic high polymer prepared by the process of the invention distributes within a relatively narrow range in the neighborhood of about 100,000, resulting in excellent moldability of the polymer.
    Type: Grant
    Filed: February 27, 1990
    Date of Patent: March 5, 1991
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventor: Masaie Fujino