Patents by Inventor Masakata Hourai

Masakata Hourai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of silicon wafer
    Publication number: 20050229842
    Abstract: An active layer side silicon wafer is heat-treated in an oxidizing atmosphere to thereby form a buried oxide film therein. The active layer side silicon wafer is then bonded to a supporting side wafer with said buried oxide film interposed therebetween thus to fabricate an SOI wafer. Said oxidizing heat treatment is carried out under a condition satisfying the following formula: [Oi]?2.123×1021exp(?1.035/k(T+273)), where, T is a temperature of the heat treatment, and [Oi] (atmos/cm3) is an interstitial oxygen concentration.
    Type: Application
    Filed: December 19, 2003
    Publication date: October 20, 2005
    Inventors: Shigeru Umeno, Masakata Hourai, Masakazu Sano, Shinichiro Miki