Patents by Inventor Masakatsu MATSUSHITA

Masakatsu MATSUSHITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION
    Publication number: 20100126351
    Abstract: A material for chemical vapor deposition of the present invention contains a precursor composed of a metal compound, and has 100 or less particles having a size of 0.5 ?m or more in 1 ml, in particle measurement by a light scattering type submerged particle detector in a liquid phase. A thin film can be prevented from being contaminated by particles even when a highly degradable metal compound is used as the precursor.
    Type: Application
    Filed: January 19, 2010
    Publication date: May 27, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Masaru HOSOKAWA, Masakatsu MATSUSHITA, Satoshi NAKAGAWA
  • Material for chemical vapor deposition and thin film forming method
    Publication number: 20070190249
    Abstract: A material for chemical vapor deposition of the present invention contains a precursor composed of a metal compound, and has 100 or less particles having a size of 0.5 ?m or more in 1 ml, in particle measurement by a light scattering type submerged particle detector in a liquid phase. A thin film can be prevented from being contaminated by particles even when a highly degradable metal compound is used as the precursor.
    Type: Application
    Filed: April 28, 2005
    Publication date: August 16, 2007
    Applicant: ADEKA CORPORATION
    Inventors: Masaru Hosokawa, Masakatsu Matsushita, Satoshi Nakagawa