Patents by Inventor Masakazu Ichikawa

Masakazu Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7161874
    Abstract: The power generated by a power generating means (1) of a power-generating type electronic clock is measured by a first power generating sensing means (101) and a second power generating sensing means (102). The power generation level required when the operation is changed from a normal mode to a power-saving mode and the power generation level required when the operation is changed from the power-saving mode back to the normal mode are made different to prevent the phenomenon that the operation changes frequently by imparting hysteresis characteristics to the power generation level which causes a change in the mode, thereby improving the power-saving effect.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: January 9, 2007
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Masakazu Ichikawa, Isao Kitazawa
  • Patent number: 6876602
    Abstract: A first voltage detector detects whether the voltage of a secondary cell has reached to 1.2V and a first timer counts a time duration for which the voltage is equal to or above 1.2V. If the time counted by the first timer reaches one hour, a second timer starts counting time for one hour. An amount of charge accumulated in the secondary cell is displays after counting of the one hour by the second timer is over. As a result, an accurate display of the amount of charge accumulated in the secondary cell can be achieved.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: April 5, 2005
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Masakazu Ichikawa, Isao Kitazawa, Masao Sakuyama, Tomio Okigami
  • Patent number: 6747748
    Abstract: In a process of forming a film on a surface of a wafer by thermal processing, laser light generated by a light source is depolarized by a depolarizer and the deporlarized light is irradiated upon the surface of wafer. As for the light reflected from the surface of wafer, polarization components in predetermined two directions perpendicular to each other are extracted by a beam splitter, and optical sensors receive the extracted light components to detect each intensity. An analytical processing unit determines a thickness of a formed film based on a change in a difference in intensity.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: June 8, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Tatsuo Matsudo, Tomohiro Ohta, Tetsuji Yasuda, Masakazu Ichikawa, Takashi Nakayama
  • Publication number: 20030235117
    Abstract: A first voltage detector detects whether the voltage of a secondary cell has reached to 1.2V and a first timer counts a time duration for which the voltage is equal to or above 1.2V. If the time counted by the first timer reaches one hour, a second timer starts counting time for one hour. An amount of charge accumulated in the secondary cell is displays after counting of the one hour by the second timer is over. As a result, an accurate display of the amount of charge accumulated in the secondary cell can be achieved.
    Type: Application
    Filed: February 19, 2003
    Publication date: December 25, 2003
    Applicant: CITIZEN WATCH CO., LTD.
    Inventors: Masakazu Ichikawa, Isao Kitazawa, Masao Sakuyama, Tomio Okigami
  • Publication number: 20020183865
    Abstract: The power generated by a power generating means (1) of a power-generating type electronic clock is measured by a first power generating sensing means (101) and a second power generating sensing means (102). The power generation level required when the operation is changed from a normal mode to a power-saving mode and the power generation level required when the operation is changed from the power-saving mode back to the normal mode are made different to prevent the phenomenon that the operation changes frequently by imparting hysteresis characteristics to the power generation level which causes a change in the mode, thereby improving the power-saving effect.
    Type: Application
    Filed: July 2, 2002
    Publication date: December 5, 2002
    Inventors: Masakazu Ichikawa, Isao Kitazawa
  • Publication number: 20020115304
    Abstract: In a process of forming a film on a surface of a wafer by thermal processing, laser light generated by a light source is depolarized by a depolarizer and the deporlarized light is irradiated upon the surface of wafer As for the light reflected from the surface of wafer, polarization components in predetermined two directions perpendicular to each other are extracted by a beam splitter, and optical sensors receive the extracted light components to detect each intensity. An analytical processing unit determines a thickness of a formed film based on a change in a difference in intensity.
    Type: Application
    Filed: October 10, 2001
    Publication date: August 22, 2002
    Inventors: Tatsuo Matsudo, Tomohiro Ohta, Tetsuji Yasuda, Masakazu Ichikawa, Tkashi Nakayama
  • Patent number: 5973469
    Abstract: It is an object of this invention to attain reliable starting characteristics and stable rotation performance of a motor in a motor of a phase synchronization driving type.
    Type: Grant
    Filed: April 13, 1998
    Date of Patent: October 26, 1999
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Haruhiko Higuchi, Masakazu Ichikawa, Hiroyuki Kihara, Tomomi Murakami, Hidetaka Tsuchiya
  • Patent number: 5940348
    Abstract: An electronic timepiece in accordance with the present invention includes a time clocking circuit for counting reference signals from a reference signal generating circuit to provide time information as its output; a warning device for warning the user of a specific time, by use of vibrations or a buzzer, on the basis of time information derived from the time clocking circuit; and a timepiece state detection device for detecting the states of the temperature and the power source voltage of the timepiece and, if the detection values deviate from predetermined values, the detection device operates to stop the warning action of the warning means. The timings of time information derived from the time clocking circuit differ from each other between when the timepiece state detection device has detected a low temperature of the timepiece and when it has detected a low voltage at the power source, and differ from the time information timing at the normal state.
    Type: Grant
    Filed: June 8, 1998
    Date of Patent: August 17, 1999
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Tomomi Murakami, Masakazu Ichikawa, Norio Miyauchi
  • Patent number: 5746826
    Abstract: Utilizing rugged pattern of atomic size present on a crystalline substrate of a semiconductor such as silicon or selenium or the like, a microstructure body is produced on the substrate by forming a layer of a first element of one monolayer or less by arranging at the position of the substrate most stable in energy formed by ruggedness the atoms of the first element such as gold, silver, copper, nickel, palladium, platinum or an element of group IV and then depositing successively atoms of at least one second element of group III, group IV and group V on only at a part of the surface of the substrate on which said layer of one monolayer or less by vapor deposition, sputtering or the like.
    Type: Grant
    Filed: December 2, 1994
    Date of Patent: May 5, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Tsuyoshi Hasegawa, Shigeyuki Hosoki, Makiko Kohno, Masakazu Ichikawa, Hitoshi Nakahara, Toshiyuki Usagawa
  • Patent number: 5689494
    Abstract: A fine-fabrication method of solid surfaces relates to a new surface fabrication method allows a solid-device surface to be fabricated at an atomic scale so as to produce an ultra-fine device or a device for recording information at an ultra-high density. A probe is installed with a tip thereof facing to the surface of a specimen to undergo fabrication. A voltage for forming an electric field is applied between the probe and the specimen. The electric field is large enough to field-evaporate atoms constituting the specimen or the probe; the electric field field-evaporates atoms constituting the specimen, removing them from the surface of the specimen; and as another alternative, the electric field field-evaporates atoms constituting the probe, depositing them on the surface of the specimen.
    Type: Grant
    Filed: May 15, 1995
    Date of Patent: November 18, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Masakazu Ichikawa, Shigeyuki Hosoki, Fumihiko Uchida, Shigeo Kato, Yoshihisa Fujisaki, Sumiko Fujisaki, Atsushi Kikugawa, Ryo Imura, Hajime Aoi, Kiyokazu Nakagawa, Eiichi Murakami
  • Patent number: 5572122
    Abstract: An apparatus for measuring an electromagnetic field distribution using a focused electron beam can measure the electromagnetic field distribution in a specimen with high resolution and high reliability. A focused electron beam radiation system irradiates a specimen with a focused electron beam. A specimen tilt mechanism tilts a specimen by 180.degree. about a tilt axis that is perpendicular to the optical axis of the focused electron beam. An electron beam position detector measures the direction and quantity of the deflection given to the focused electron beam when it is transmitted through the specimen.
    Type: Grant
    Filed: October 26, 1993
    Date of Patent: November 5, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Yajima, Yoshio Takahashi, Masakazu Ichikawa, Shigeyuki Hosoki
  • Patent number: 5563465
    Abstract: An actuator includes piezo electric devices which are installed in contact with a drive head and a driven body which is contact-driven by the drive head. Thus, only one mechanism performs coarse motion and micromotion by forming a gap between the drive head and driven body. The high precision positioning mechanism can be miniaturized and constructed at a low price.
    Type: Grant
    Filed: April 12, 1994
    Date of Patent: October 8, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Hitoshi Nakahara, Masakazu Ichikawa, Yuishin Tanaka, Sakae Saitou, Shigeo Moriyama
  • Patent number: 5521390
    Abstract: An optical nanodisplacement producing apparatus is realized by employing an optical parametric oscillator of which cavity length is varied in correspondence with a wavelength or the intensity of the output light signal to achieve a fine-displacement producing mechanism. An optical nanodisplacement producing apparatus having high resolution less than 0.1 nm and a highly stable characteristic is realized as a very fine pattern forming/monitoring apparatus.
    Type: Grant
    Filed: November 16, 1994
    Date of Patent: May 28, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Sato, Masakazu Ichikawa, Toshikazu Shimada
  • Patent number: 5416331
    Abstract: A fine-fabrication method of solid surfaces relates to a new surface fabrication method allows a solid-device surface to be fabricated at an atomic scale so as to produce an ultra-fine device or a device for recording information at an ultra-high density. A probe is installed with a tip thereof facing to the surface of a specimen to undergo fabrication. A voltage for forming an electric field is applied between the probe and the specimen. The electric field is large enough to field-evaporate atoms constituting the specimen or the probe; the electric field field-evaporates atoms constituting the specimen, removing them from the surface of the specimen; and as another alternative, the electric field field-evaporates atoms constituting the probe, depositing them on the surface of the specimen.
    Type: Grant
    Filed: September 11, 1992
    Date of Patent: May 16, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Masakazu Ichikawa, Shigeyuki Hosoki, Fumihiko Uchida, Shigeo Kato, Yoshihisa Fujisaki, Sumiko Fujisaki, Atsushi Kikugawa, Ryo Imura, Hajime Aoi, Kiyokazu Nakagawa, Eiichi Murakami
  • Patent number: 5345080
    Abstract: An electron microscopic image observing method and an apparatus for carrying out the same enables the observation of an electron microscopic image of a specimen by irradiating the specimen with an electron beam and detecting the electron beam after it has transmitted through the specimen. The electron beam transmitted through the specimen is deflected so that the deflection thereof varies with time, and is allowed to pass through an aperture only when the deflection thereof is within a predetermined range of deflection, whereby the electron beam transmitted through the specimen and passed through the aperture is then detected. Thus, the electron microscopic image observing method and the apparatus for carrying out the same enables the observation of time-resolved electron microscopic images of a specimen having internal physical properties varying with time.
    Type: Grant
    Filed: October 13, 1992
    Date of Patent: September 6, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Yajima, Masakazu Ichikawa, Hiroyuki Shinada
  • Patent number: 5298747
    Abstract: A scanning interference electron microscope includes an electron source, a focusing lens, an electron beam deflection system and a biprism. The biprism separates the primary electron beam emanating from the electron source into two beams. One of the separated beams is controlled by the deflection system to scan the sample surface, thereafter interfering with the other separated beam to generated interference fringes. The phase difference due to interaction of the first electron beam with a sample surface produces changes in the interference intensity of the interference fringes, which represent a microscopic image of the sample.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: March 29, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Masakazu Ichikawa, Yusuke Yajima, Masatoshi Takeshita, Toshio Kobayashi
  • Patent number: 5229607
    Abstract: A combination apparatus having a scanning electron microscope includes equipment for performing any of observing, measuring and processing operations on a sample placed in a sample chamber. The sample chamber contains a focused electron beam irradiating unit apart from the components for performing the observing, measuring and processing operations. The focused electron beam irradiating unit irradiates a finely focused electron beam onto the surface of the sample for electron microscopic observation in scanning fashion. This setup allows the observing, measuring or processing equipment to combine with the scanning electron microscope without appreciably enlarging the construction of the combination apparatus.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: July 20, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Hironobu Matsui, Mikio Ichihashi, Sumio Hosaka, Yoshinori Nakayama, Satoshi Haraichi, Fumikazu Itoh, Akira Shimase, Yoshimasa Kondo, Shigeyuki Hosoki, Masakazu Ichikawa, Yukio Honda, Tsuyoshi Hasegawa, Shiji Okazaki, Shunji Maeda, Hitoshi Kubota
  • Patent number: 5153434
    Abstract: An electron microscope and a method for obtaining microscopic images whereby the intensity and distribution of the internal magnetic field of a specimen are acquired with precision. The electron microscope irradiates a focused electron beam at a target specimen and detects the transmitted beam past the specimen. The irradiated position on the specimen is selected by one of three ways: by moving the specimen alone, by deflecting the focused electron beam before it enters the specimen, or by combining these two ways. In this setup, the internal magnetic field of the specimen under its irradiated spot is known through detection of the deflection of the electron beam caused by the Lorentz force and through arithmetic processing of the detected deflection. An actuator that moves the specimen comprises a support with a hole through which the electron beam passes, a specimen stage with a like hole, a plurality of piezoelectric devices, and a structure that lets the electron beam pass therethrough.
    Type: Grant
    Filed: May 16, 1991
    Date of Patent: October 6, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Yajima, Masakazu Ichikawa, Mikio Ichihashi, Ryo Suzuki, Masatoshi Takeshita
  • Patent number: 5144128
    Abstract: An atomic force microscope is provided for sensing displacement of a cantilever based on scanning tunneling microscopy. The atomic force microscope includes a cantilever moving system which allows the cantilever to be moved or slipped between an STM tip and a sample. This results in the microscope being able to carry out atomic force microscopy and tunneling microscopy without changing a single STM tip and to control the very small force between the sample and the tip to be constant.
    Type: Grant
    Filed: February 1, 1991
    Date of Patent: September 1, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Tsuyoshi Hasegawa, Sumio Hosaka, Shigeyuki Hosoki, Yukio Honda, Masakazu Ichikawa