Patents by Inventor Masakazu Murakami

Masakazu Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8499358
    Abstract: A processing device is provided in which unauthorized processing is prevented from being preformed at the time of executing a program or others. The processing device includes a processing portion for executing processing, a program memory portion for memorizing a program that makes the processing portion execute processing, a judge portion for judging whether or not the program is permitted to start, and a control portion for controlling the processing portion so that processing is executed in accordance with the program when the judge portion determines that the program is permitted to start, and for controlling the processing portion so that processing based on the program is not executed when the judge portion determines that the program is not permitted to start.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: July 30, 2013
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Masakazu Murakami, Hironobu Nakata, Kazumi Sawayanagi, Minako Kobayashi
  • Patent number: 8426551
    Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: April 23, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: 8420718
    Abstract: The composition of the present invention contains a product having a thiol group obtained by reacting an Sb or Bi oxide or an Sb or Bi halide with at least one kind of polythiol compounds selected from compounds having at least two thiol groups in a molecule.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: April 16, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tomoyuki Ando, Masakazu Murakami, Mamoru Takashina, Seiichi Kobayashi
  • Patent number: 8402162
    Abstract: A network system that can easily carry out remote access of a different network. The network system comprises a first image processing apparatus connected to a first network and a second image processing apparatus connected to a second network having a network address different from that of the first network.
    Type: Grant
    Filed: August 23, 2007
    Date of Patent: March 19, 2013
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Mitsuzo Iwaki, Tomonari Yoshimura, Masakazu Murakami, Okihisa Yoshida, Yoshikazu Ikenoue
  • Patent number: 8384935
    Abstract: An information processing device includes a plurality of modules for realizing a plurality of functions. The information processing device reproduces contents information and expects information which is to be inputted based on the functions relating to the reproduced contents information. Further, based on the expected information, the information processing device controls operations of at least some of the plurality of modules.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: February 26, 2013
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Masakazu Murakami, Atsushi Ohshima, Masami Yamada, Tomonari Yoshimura
  • Patent number: 8377764
    Abstract: The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
    Type: Grant
    Filed: April 28, 2012
    Date of Patent: February 19, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Hideaki Kuwabara, Masakazu Murakami
  • Publication number: 20130018169
    Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 17, 2013
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: 8349996
    Abstract: Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d?c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: January 8, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8344369
    Abstract: The object of the invention is to provide a method for fabricating a semiconductor device having a peeled layer bonded to a base material with curvature. Particularly, the object is to provide a method for fabricating a display with curvature, more specifically, a light emitting device having an OLED bonded to a base material with curvature. An external force is applied to a support originally having curvature and elasticity, and the support is bonded to a peeled layer formed over a substrate. Then, when the substrate is peeled, the support returns into the original shape by the restoring force, and the peeled layer as well is curved along the shape of the support. Finally, a transfer object originally having curvature is bonded to the peeled layer, and then a device with a desired curvature is completed.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: January 1, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Toru Takayama, Junya Maruyama
  • Publication number: 20120286315
    Abstract: (OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials. (MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.
    Type: Application
    Filed: July 26, 2012
    Publication date: November 15, 2012
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Toru TAKAYAMA, Junya MARUYAMA, Yumiko OHNO, Masakazu MURAKAMI, Toshiji HAMATANI, Hideaki KUWABARA, Shunpei YAMAZAKI
  • Publication number: 20120274965
    Abstract: An image forming apparatus is provided which has an operating panel capable of providing a screen display and a Web browser. The image forming apparatus includes a storage for storing predetermined text that is data to be entered into a text entry box of a Web page; a text entry limiting portion for, when the Web page displayed on the operating panel by the Web browser contains the text entry box, limiting text to be entered into the text entry box to the predetermined text stored in the storage; a display processing portion for, when the text entry limiting portion limits text to be entered, displaying, on the operating panel, a screen for a user to designate the predetermined text as text to be entered into the text entry box; and an operation processing portion for informing the Web browser of the predetermined text designated by the user.
    Type: Application
    Filed: April 13, 2012
    Publication date: November 1, 2012
    Applicant: KONICA MINOLTA BUSINESS TECHNOLOGIES, INC.
    Inventors: Okihisa YOSHIDA, Masakazu MURAKAMI
  • Patent number: 8293864
    Abstract: Disclosed is a metal thietane compound represented by the following general formula (120), (wherein, in the above general formula (120), M is a member selected from the group consisting of Bi, Sb, Ti, Zr and Ta; X1 and X2 are each independently a sulfur atom or an oxygen atom; R1 is a divalent organic group; the bond between M and T shown by a dotted line and a solid line represents a single or double bond; m is an integer of 0 or 1 or more; n is the number of valence of M; and p is an integer of equal to or more than 1 and equal to or less than n, provided that when r is 1, q is 0 and Y is a monovalent inorganic or organic group; when r is 1 and n-p-q is 2 or more, a plurality of Ys contained are each independently selected from monovalent inorganic or organic groups; when r is 1 and n-p-q is 2 or more, a plurality of Ys may be bonded to each other to form a ring containing M; when r is 2, n-p-q is 1 or 2 and Y is a divalent group; when r is 2 and n-p-q is 2, two Ys may form a ring together with two Ms;
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: October 23, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Publication number: 20120225205
    Abstract: The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.
    Type: Application
    Filed: May 17, 2012
    Publication date: September 6, 2012
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Shunpei YAMAZAKI, Masakazu Murakami
  • Publication number: 20120214263
    Abstract: The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
    Type: Application
    Filed: April 28, 2012
    Publication date: August 23, 2012
    Inventors: Shunpei Yamazaki, Hideaki Kuwabara, Masakazu Murakami
  • Publication number: 20120203011
    Abstract: A process for producing bis(thietanylthio)dithiastannolane of the following formula: involving the reaction of tetrakis(thietanylthio)tin having the following formula: with 1,2-ethandiethiol.
    Type: Application
    Filed: April 20, 2012
    Publication date: August 9, 2012
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Masakazu MURAKAMI, Tomoyuki ANDO, Seiichi KOBAYASHI
  • Patent number: 8237164
    Abstract: (OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials. (MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: August 7, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Toru Takayama, Junya Maruyama, Yumiko Ohno, Masakazu Murakami, Toshiji Hamatani, Hideaki Kuwabara, Shunpei Yamazaki
  • Publication number: 20120175620
    Abstract: The inventors have anticipated that there is no problem in employing electron gun deposition as a method of forming a metallic layer on an EL layer of an active matrix light-emitting device because the TFT of the active matrix light-emitting device is disposed below the EL layer. However, since the TFT is extremely sensitive to ionized evaporated particles, the secondary electron, the reflecting electron, and so on generated by the electron gun, while little damage is observed on the EL layer, significant damage is found on the TFT when electron gun deposition is employed. The invention provides an active matrix light-emitting device having superior TFT characteristics (ON current, OFF to current, Vth, S-value, and so on), in which an organic compound layer and a metallic layer (cathode or anode) are formed by means of resistive heating having least influence to the TFT.
    Type: Application
    Filed: March 15, 2012
    Publication date: July 12, 2012
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Naomi Kawakami, Hisashi Ohtani
  • Patent number: 8213028
    Abstract: An image processing system and a software program which simplify customizations when a program for operations in connection with image processing is installed in a plural number of image processing apparatuses. When a program for operations in connection with image processing is newly installed in a first MFP, the first MFP makes an inquiry to other MFPs which are connected to the first MFP via a network. When a second MFP is already installed with the same program and has information on individual users' settings for the program, the first MFP receives the setting information from the second MFP. Then, referring to history information and device information, the first MFP judges whether to store the setting information therein and whether to make modifications to the setting information.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: July 3, 2012
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Takahiro Ikeda, Tomonari Yoshimura, Masakazu Murakami, Mitsuzo Iwaki, Okihisa Yoshida
  • Patent number: 8211492
    Abstract: The present invention is a fabrication method of a light-emitting device characterized by ejecting a solution containing a luminescent material toward an anode or a cathode under a reduced pressure and characterized in that in a duration before the solution is arrived at the anode or the cathode, the solvent in the solution is volatilized, the remaining part of the luminescent material is deposited on the anode or the cathode, and thereby formed a light-emitting layer. By the present invention, a baking process for thickness reduction is not required after applying the solution. Accordingly, it is possible to provide a fabrication method with high throughput although the method is low in cost and simple.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: July 3, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Ryoji Nomura, Satoshi Seo
  • Patent number: 8214430
    Abstract: Network image processing apparatuses constituting a network image processing system display, in list form, a document in units of action. When a user selection is received, a script that defines document handling is remanded to an apparatus that executed an action corresponding to the user selection.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: July 3, 2012
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Masakazu Murakami, Hironobu Nakata, Kazumi Sawayanagi, Minako Kobayashi