Patents by Inventor Masakazu Shimada

Masakazu Shimada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6025956
    Abstract: An incident-light fluorescence microscope including: (i) a transmission illuminating optical system which has a first optical member for receiving light emitted from a light source and extracting transmitted light and which irradiates the transmitted light onto a sample, and (ii) an observation optical system which has an objective lens and a second optical member and which is positioned closer to the objective lens than the sample. An incident-light fluorescence illuminating optical system is provided in the observation optical system, wherein the first optical member has a peak of transmittance at a wavelength longer than the fluorescent wavelength, and the second optical member selectively modulates only a wavelength transmitted through the first optical member.
    Type: Grant
    Filed: December 16, 1996
    Date of Patent: February 15, 2000
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Takashi Nagano, Keiji Shimizu, Kenji Kawasaki, Kiyonobu Kurata, Masakazu Shimada
  • Patent number: 5879415
    Abstract: A semiconductor fabricating apparatus comprises a reaction tube defining a space for heat treating a silicon wafer, heater means disposed to extend around the reaction tube, a load-lock chamber connected to the reaction tube by means of a gate valve, a supply pipe communicating with the load-lock chamber for supplying an inert gas and a gas including oxygen thereto, an oxygen densitometer, an inert gas flow rate adjuster and an oxygen flow rate regulator, and based on the results detected by the oxygen densitometer, controls the flow rate of the inert gas and the gas including oxygen, by means of the flow rate adjuster, the flow rate regulator, to maintain the oxygen concentration within the load-lock chamber at a desire value.
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: March 9, 1999
    Assignee: Kokusai Electric Co., Ltd.
    Inventor: Masakazu Shimada
  • Patent number: 5735961
    Abstract: A semiconductor fabricating apparatus comprises a reaction tube defining a space for heat treating a silicon wafer, heater means disposed to extend around the reaction tube, a load-lock chamber connected to the reaction tube by means of a gate valve, a supply pipe communicating with the load-lock chamber for supplying an inert gas and a gas including oxygen thereto, an oxygen concentration meter, an inert gas flow rate adjuster and an oxygen flow rate regulator. Based on the results detected by the oxygen concentration meter the flow rate of the inert gas and the gas including oxygen are controlled by means of the flow rate adjuster and the flow rate regulator to maintain the oxygen concentration within the load-lock chamber at a desired value.
    Type: Grant
    Filed: May 16, 1996
    Date of Patent: April 7, 1998
    Assignee: Kokusai Electric Co., Ltd.
    Inventor: Masakazu Shimada
  • Patent number: 5516436
    Abstract: An agent for treating textile materials comprising at least one compound selected from the group consisting of compounds of the general formula (I) ##STR1## wherein X.sub.1 is hydrogen or a halogen, and R.sub.1 is hydrogen, a halogen or an alkyl of 1 to 4 carbon atoms, and compounds of the general formula (II) ##STR2## wherein X.sub.2 is hydrogen or a halogen, R.sub.2 is hydrogen, a halogen or an alkyl of 1 to 4 carbon atoms, and n is an integer of 1 to 3.
    Type: Grant
    Filed: July 12, 1994
    Date of Patent: May 14, 1996
    Assignee: Nicca Chemical Co., Ltd.
    Inventors: Juji Uchida, Masakazu Shimada, Takayoshi Kamano, Kuniaki Wakita, Masaaki Okawa
  • Patent number: 5277215
    Abstract: A plurality of airtight chambers are connected through blocking means, which can communicate or shut off the chambers, and at least one of the airtight chambers is used as a processing chamber. One of the adjacent airtight chambers is replaced by a replacement gas, and the replacement gas is supplied to the other of the adjacent airtight chambers. When pressure difference or pressure in the two adjacent airtight chambers is below a predetermined value, the adjacent two airtight chambers are communicated, and pressure in the two airtight chambers is equalized.
    Type: Grant
    Filed: January 21, 1993
    Date of Patent: January 11, 1994
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Hidehiro Yanagawa, Hiroyuki Nishiuchi, Masakazu Shimada, Mitsuhiro Hirano, Tomoshi Taniyama, Kazumi Nikaido, Yoshikazu Hisajima, Michio Sato