Patents by Inventor Masakazu Washio

Masakazu Washio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160193756
    Abstract: There are provided a microstructural material allowing a concavo-convex pattern of a mold to be imprinted thereon by hardening a pattern formative layer through an unprecedented method, and a fabrication method thereof. A PTFE dispersion liquid is used in a pattern formative layer 2a forming an imprint section 2, thereby allowing such pattern formative layer 2a formed on a concavo-convex pattern of a mold 5 to be hardened when irradiated with an ionizing radiation. Accordingly, the fabrication method of a microstructural material 1 of the present invention employs an imprinting method allowing the pattern formative layer 2a to be hardened through an ionizing radiation R, which is completely different from a thermal imprinting and an optical imprinting. That is, the pattern formative layer 2a can be hardened, and the concavo-convex pattern of the mold 5 can thus be imprinted thereon, through an unprecedented method.
    Type: Application
    Filed: March 17, 2016
    Publication date: July 7, 2016
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro OSHIMA, Seiichi TAGAWA, Masakazu WASHIO, Tomoko OYAMA, Tomohiro TAKAHASHI, Satoshi OKUBO, Akinobu KOBAYASHI, Naotsugu NAGASAWA, Mitsumasa TAGUCHI
  • Publication number: 20120231220
    Abstract: There are provided a microstructural material allowing a concavo-convex pattern of a mold to be imprinted thereon by hardening a pattern formative layer through an unprecedented method, and a fabrication method thereof. A PTFE dispersion liquid is used in a pattern formative layer 2a forming an imprint section 2, thereby allowing such pattern formative layer 2a formed on a concavo-convex pattern of a mold 5 to be hardened when irradiated with an ionizing radiation. Accordingly, the fabrication method of a microstructural material 1 of the present invention employs an imprinting method allowing the pattern formative layer 2a to be hardened through an ionizing radiation R, which is completely different from a thermal imprinting and an optical imprinting. That is, the pattern formative layer 2a can be hardened, and the concavo-convex pattern of the mold 5 can thus be imprinted thereon, through an unprecedented method.
    Type: Application
    Filed: December 29, 2011
    Publication date: September 13, 2012
    Applicant: JAPAN ATOMIC ENERGY AGENCY
    Inventors: Akihiro Oshima, Seiichi Tagawa, Masakazu Washio, Tomoko Oyama, Tomohiro Takahashi, Satoshi Okubo, Akinobu Kobayashi, Naotsugu Nagasawa, Mitsumasa Taguchi
  • Patent number: 6094010
    Abstract: In an electron gun, a conductive chamber defines a cavity. A photocathode is disposed in the cavity. Photoelectrons are emitted from the photocathode into the cavity when light is applied to the photocathode. A wave guide mounted on the conductive chamber introduces a micro wave into the cavity. Via an opening formed in the wall of the conductive chamber, the photoelectrons are output to the outside of the cavity. Coolant is flowed through a flow path formed in the wall of the conductive chamber, to suppress a temperature rise of the conductive chamber.
    Type: Grant
    Filed: July 22, 1998
    Date of Patent: July 25, 2000
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventor: Masakazu Washio
  • Patent number: 5933440
    Abstract: A master radio-frequency signal output from a master oscillator is input to a frequency converter. The frequency converter generates and outputs a multiplied signal having a frequency higher than that of the master radio-frequency signal by using the master radio-frequency signal. A loss of light reciprocating in an optic resonator of a laser oscillator is controlled by both the master radio-frequency signal output from the master oscillator and the multiplied signal output from the frequency converter. It is possible to highly precisely synchronize a pulse laser beam and a radio-frequency signal.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: August 3, 1999
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Akira Endo, Masakazu Washio
  • Patent number: 5719478
    Abstract: A method of bunching a charged particle beam including the step of generating an electric field during a certain time duration, the electric field being generally parallel to a travelling direction of the charged particle beam having a kinetic energy of 1 eV to 1 MeV, and an intensity of the electric field changing as a quadratic function of time. In addition to the waveform changing as the quadratic function, a waveform changing linearly may also be used. The linearly changing waveform may be superposed upon a waveform of a half period from phase .pi. to 2.pi. of a sine wave if the linearly changing waveform monotonously increases, or upon a waveform of a half period from phase 0 to .pi. of a sine wave if the linearly changing waveform monotonously decreases. Furthermore, the linearly changing waveform and the sine waveform may be superposed upon a waveform of a half period from phase 0 to .pi.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: February 17, 1998
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Masakazu Washio, Masafumi Hirose
  • Patent number: 5583896
    Abstract: In a slow positron beam generating device comprising a target member (11) having a .beta..sup.+ decay radioisotope producing function for producing, when an incident surface (11a) of the target member is irradiated by accelerated particles (10), .beta..sup.+ decay radioisotopes due to nuclear reaction within the target member so that the .beta..sup.+ decay radioisotopes emit fast positrons around the .beta..sup.+ decay radioisotopes, a moderator (12) is disposed nearer to an opposite surface (11b) of the target member than the incident surface and has a fast positron moderating function for moderating into slow positrons the fast positrons emitted from the opposite surface. The opposite surface is opposite to the incident surface. An ejecting electrode (13) ejects the slow positrons as a slow positron beam (14). Use may be made of a different target member having not only the .beta..sup.
    Type: Grant
    Filed: October 30, 1995
    Date of Patent: December 10, 1996
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Masafumi Hirose, Masakazu Washio
  • Patent number: 5519738
    Abstract: In a slow positron beam generating device comprising a target member (11) having a .beta. decay radioisotope producing function for producing, when an incident surface (11a) of the target member is irradiated by accelerated particles (10 ), .beta..sup.+ decay radioisotopes due to nuclear reaction within the target member so that the .beta..sup.+ decay radioisotopes emit fast positrons around the decay radioisotopes, a moderator ( 12 ) is disposed nearer .beta..sup.+ to an opposite surface (11b) of the target member than the incident surface and has a fast positron moderating function for moderating into slow positrons the fast positrons emitted from the opposite surface. The opposite surface is opposite to the incident surface. An ejecting electrode (13) ejects the slow positrons as a slow positron beam (14). Use may be made of a different target member having not only the .beta..sup.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: May 21, 1996
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Masafumi Hirose, Masakazu Washio
  • Patent number: 5151486
    Abstract: Pure diglycidylether of bisphenol A and pure diaminodiphenylmethane are mixed at a ratio of 1:1 and cured in a two-step curing comprising pre-curing at 80.degree..about.120 .degree. C. and main-curing at 140.degree..about.180.degree. C., to produce very pure epoxy resin having a purity of 99% or more. The product epoxy resin can detect radioactive rays through 630 nm light absorption band.
    Type: Grant
    Filed: May 1, 1990
    Date of Patent: September 29, 1992
    Assignees: Sumitomo Heavy Industries, Ltd., Japan Atomic Energy Research Institute
    Inventors: Masakazu Washio, Syun-ichi Kawanishi