Patents by Inventor Masaki Fujimori

Masaki Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11976442
    Abstract: A construction machine includes an attitude sensor that detects the current attitude of an upper turning body; a reference angular acceleration calculation unit that calculates a reference angular acceleration to be generated when an electric turning motor is driven by a torque command value generated according to the operation amount of an operation part; a reference gravity torque calculation unit that, on the basis of the current attitude and the deviation between an actual angular acceleration, calculates a reference gravity torque; a gravity compensation torque calculation unit that calculates a gravity compensation torque for compensating a torque component generated about the turning axis by the gravity in the current attitude; and a correction unit that corrects the torque command value by using the gravity compensation torque so as to cancel the torque component generated about the turning axis by the gravity in the current attitude.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: May 7, 2024
    Assignee: YANMAR POWER TECHNOLOGY CO., LTD.
    Inventors: Naohiro Hara, Shingo Eguchi, Keishi Yamanaka, Tatsuya Fujimori, Masaki Yamada, Kensuke Kaneda
  • Patent number: 8727708
    Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: May 20, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
  • Publication number: 20110162678
    Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
    Type: Application
    Filed: March 14, 2011
    Publication date: July 7, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi MORIYA, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
  • Patent number: 7927066
    Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: April 19, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
  • Publication number: 20060257243
    Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
    Type: Application
    Filed: March 2, 2006
    Publication date: November 16, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori