Abstract: A positive electrode active material which is to be included in this nonaqueous electrolyte secondary battery and contains a lithium-containing complex oxide having a prescribed composition which has a layered evaporitic structure, wherein: the lithium-containing complex oxide contains secondary particles formed by clumping primary particles with one another; and a sulfonic acid compound represented by general formula I, one or more types of element selected from Ca and Sr, and one or more types of element selected from W, Mo, Ti, Si, Nb and Zr are present on the surface of the secondary particles or at the interface between the primary particles. (In the formula, A is a Group 1 element or a Group 2 element, R is a hydrocarbon group, and n is 1 or 2.

Abstract: A wafer placement table includes an upper substrate including a ceramic substrate and having a wafer placement surface, a lower substrate disposed on a lower surface of the upper substrate including a refrigerant flow path or a refrigerant flow-path groove, a through hole extending through the lower substrate in an up-down direction to intersect with the refrigerant flow path or the refrigerant flow-path groove, a screw hole provided in the lower surface of the upper substrate, at a position facing the through hole, a screw member inserted from a lower surface of the lower substrate into the through hole and screwed into the screw hole, and a refrigerant-leakage prevention member that prevents the refrigerant from leaking out to the lower surface of the lower substrate through the through hole into which the screw member is inserted.

Abstract: There is provided a method for producing a fluoropolymer, the method including polymerizing a fluoromonomer in an aqueous medium to obtain a polymerization dispersion containing the fluoropolymer, and bringing the fluoropolymer in the polymerization dispersion into contact with an alcohol having 3 to 5 carbon atoms to coagulate the fluoropolymer to thereby obtain the fluoropolymer.

Abstract: Provided is a composition containing: a polymer (I) having a polymerization unit (I) based on a monomer (I) represented by general formula (I); and a fluoroelastomer, wherein a content of the polymer (I) is 0.0001 to 1.0% by mass based on the fluoroelastomer: CX1X3?CX2R(—CZ1Z2-A0)m??(I) wherein X1 and X3 are each independently F, Cl, H, or CF3; X2 is H, F, an alkyl group, or a fluorine-containing alkyl group; A0 is an anionic group; R is a linking group; Z1 and Z2 are each independently H, F, an alkyl group, or a fluorine-containing alkyl group; and m is an integer of 1 or more.

Abstract: The present invention provides a positive electrode active material which has high capacity and improved initial charge and discharge efficiency. This positive electrode active material, which is contained in nonaqueous electrolyte secondary batteries, contains a lithium-containing composite oxide that has a layered rock salt structure and a sulfonic acid compound that is present on the surface of the lithium-containing composite oxide; the lithium-containing composite oxide contains 50% by mole or more of Ni, 0% by mole to 15% by mole of Co and 0% by mole to 4% by mole of Al relative to the total number of moles of metal elements other than Li; and the sulfonic acid compound is represented by general formula I. (In the formula, A represents a group 1 element or a group 2 element; R represents a hydrocarbon group; and n represents 1 or 2.

Abstract: Provided is a positive electrode active material having high capacity and reduced reaction resistance of a battery. This positive electrode active material for a non-aqueous electrolyte secondary battery includes a lithium-containing composite oxide that has a layered rock salt structure and a sulfonic acid compound present on the surface of the lithium-containing composite oxide, wherein: the lithium-containing composite oxide contains at least 85 mol % of Ni, at least 4 mol % of Al, and 0-1.5 mol % of Co relative to the total mole number of metal elements excepting Li; and the sulfonic acid compound is represented by general formula I. (In the formula, A is a group 1 element or a group 2 element, R is a hydrocarbon group, and n is 1 or 2.

Abstract: Provided is a positive electrode active material having a high capacity and improved output characteristics. The positive electrode active material included in this non-aqueous electrolyte secondary battery includes a lithium-containing complex oxide having a layered rock salt structure, and a sulfonic acid compound that is present on the surface of the lithium-containing complex oxide. The lithium-containing complex oxide contains 80 mol % or more of Ni, 1.5 mol % or more of Co, and 4 mol % or more of Al based on the total molar number of metal elements excluding Li. The sulfonic acid compound is represented by the general formula I. (In the formula, A is a Group 1 element or a Group 2 element, R is a hydrocarbon group, and n is 1 or 2.

Abstract: To provide an optical apparatus and a method of preventing contamination of the optical apparatus that can more effectively prevent contamination. An optical apparatus according to an embodiment includes a light source configured to generate irradiation light including EUV light, an optical system chamber in which a target object to be irradiated with the irradiation light is disposed, a drop-in mirror provided in the optical system chamber in order to guide the irradiation light, an introducing unit configured to introduce argon into the optical system chamber, a power supply configured to apply a negative voltage to the drop-in mirror in the optical system chamber, an ammeter configured to measure an ion current flowing to the drop-in mirror, and a control unit configured to control an introduction amount of the argon according to a measurement result of the ammeter.

Abstract: A battery pack is configured to be replaceable in a mobile object. The battery pack includes a battery section and a display section. The battery section is repeatedly charged and discharged. The display section displays history information of the battery section to show the history from the past to the present regarding the state of the battery section.

Abstract: A power storage device includes a first electrode including a first active material layer formed on a first surface, a second electrode including a second active material layer formed on a first surface, a separator, and a spacer. The first active material layer has a longitudinal side of a first length. The second area has a second length between the spacer and the first active material layer. A ratio of the second length to the first length is 0.02 or less. At least one of corners of the first active material layer has a shape chamfered in an arc shape. A radius of curvature at a portion of the corner having a maximum curvature is 5 mm or more.

Abstract: Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of 0.45 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).

Abstract: The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in the inorganic porous body has an oil absorption value of 230 ml/100 g or more, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less. The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in which the inorganic porous body has a pore volume of 1.2 cm3/g or more and 3.5 cm3/g or less, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less.

Abstract: In one aspect, the present disclosure provides a polishing liquid composition for a silicon oxide film that can achieve both of an improved polishing rate for a silicon oxide film and a reduced line width dependence of the polishing rate at raised areas in a pattern layer of raised and trench areas. One aspect of the present disclosure is directed to a polishing liquid composition for a silicon oxide film that contains: cerium oxide particles (component A); a compound represented by Formula (I) or Formula (II) below (component B); a nitrogen-containing heteroaromatic compound in which at least one hydrogen atom is substituted with a hydroxyl group (component C); and an aqueous medium.

Abstract: Notch bottom parts 152a, 152b are arranged side-by-side with terminal accommodation boxes 100a, 100b in a circumferential direction of an insulator 134, and a routing direction of a pair of coil ends 44a inside the terminal accommodation boxes 100a, 100b is directed to a direction intersecting with an insertion direction of flat-type male terminals T1, T2. Accordingly, at the time of inserting the flat-type male terminals T1, T2 into the terminal accommodation boxes 100a, 100b, an unreasonable force is suppressed from being applied to the pair of coil ends 44a, and, as a result, a defect such as disconnection of the pair of coil ends 44a can be prevented from occurring. In addition, it is possible to orderly route the pair of coil ends 44a on the insulator 43 via the notch bottom parts 152a, 152b, and, as a result, a short circuit with another coil 44 can be prevented.

Abstract: A physical quantity measurement device measures a physical quantity of a fluid. A detection unit has a physical quantity detector that detects a physical quantity of the fluid in a measurement flow channel. A housing accommodates at least a part of the detection unit and forms the measurement flow channel. The housing includes a housing attachment that is attached to a predetermined attaching target, and a position holder holding a position of the detection unit by contacting the detection unit. The housing includes an inward part positioned inward of the attaching target and an outward part positioned outward of the attaching target. The position holder is provided inward of the housing attachment in an alignment direction along which the inward part and the outward part are aligned.

Abstract: A substrate processing method performed in a substrate processing apparatus includes providing a substrate which has a first film composed of silicon only and a second film including silicon; and etching the first film by plasma formed from a mixed gas including a halogen-containing gas and a silicon-containing gas but not including an oxygen-containing gas.

Abstract: Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of (145 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).

Abstract: A plasma processing apparatus comprises a processing chamber, a gas supply unit, a power supply unit and a frequency control unit. The processing chamber accommodates a target object. The gas supply unit supplies a processing gas into the processing chamber. The power supply unit supplies a power of a predetermined frequency band into the processing chamber to generate plasma of the processing gas in the processing chamber. The frequency control unit sweeps a frequency of the power supplied into the processing chamber by the power supply unit from a first frequency to a second frequency at the time of generating the plasma of the processing gas in the processing chamber.

Abstract: A substrate processing method performed in a substrate processing apparatus includes providing a substrate which has a first film composed of silicon only and a second film including silicon; and etching the first film by plasma formed from a mixed gas including a halogen-containing gas and a silicon-containing gas but not including an oxygen-containing gas.