Abstract: A knee airbag device including an airbag cushion, a storage case in which is formed a horizontally long opening part where the expanded and deployed airbag cushion pops outs, a first flap for covering the airbag cushion exposed through the opening part such that the airbag cushion is retained in the storage case, and having a first weak part that breaks when pressed by the airbag cushion during expansion and deployment and a second flap, which is a component with a larger dimension in a length direction than the first flap and for covering an outer surface of the first flap so as to transverse in a short direction of the opening part a center part of the airbag cushion in a lateral direction, the second flap having a second weak part that breaks when pressed by the airbag cushion after rupture of the first weak part.

Abstract: It is possible to estimate a slack level accurately in consideration of a shape of a deformed cable. A point cloud analysis device sets a plurality of regions of interest obtained by window-searching a wire model including a quadratic curve model representing a cable obtained from a point cloud consisting of three-dimensional points on an object, the region of interest being divided into a first region and a second region.

Abstract: A power storage device includes a first electrode including a first active material layer formed on a first surface, a second electrode including a second active material layer formed on a first surface, a separator, and a spacer. The first active material layer has a longitudinal side of a first length. The second area has a second length between the spacer and the first active material layer. A ratio of the second length to the first length is 0.02 or less. At least one of corners of the first active material layer has a shape chamfered in an arc shape. A radius of curvature at a portion of the corner having a maximum curvature is 5 mm or more.

Abstract: Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of 0.45 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).

Abstract: The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in the inorganic porous body has an oil absorption value of 230 ml/100 g or more, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less. The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in which the inorganic porous body has a pore volume of 1.2 cm3/g or more and 3.5 cm3/g or less, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less.

Abstract: In one aspect, the present disclosure provides a polishing liquid composition for a silicon oxide film that can achieve both of an improved polishing rate for a silicon oxide film and a reduced line width dependence of the polishing rate at raised areas in a pattern layer of raised and trench areas. One aspect of the present disclosure is directed to a polishing liquid composition for a silicon oxide film that contains: cerium oxide particles (component A); a compound represented by Formula (I) or Formula (II) below (component B); a nitrogen-containing heteroaromatic compound in which at least one hydrogen atom is substituted with a hydroxyl group (component C); and an aqueous medium.

Abstract: Notch bottom parts 152a, 152b are arranged side-by-side with terminal accommodation boxes 100a, 100b in a circumferential direction of an insulator 134, and a routing direction of a pair of coil ends 44a inside the terminal accommodation boxes 100a, 100b is directed to a direction intersecting with an insertion direction of flat-type male terminals T1, T2. Accordingly, at the time of inserting the flat-type male terminals T1, T2 into the terminal accommodation boxes 100a, 100b, an unreasonable force is suppressed from being applied to the pair of coil ends 44a, and, as a result, a defect such as disconnection of the pair of coil ends 44a can be prevented from occurring. In addition, it is possible to orderly route the pair of coil ends 44a on the insulator 43 via the notch bottom parts 152a, 152b, and, as a result, a short circuit with another coil 44 can be prevented.

Abstract: A physical quantity measurement device measures a physical quantity of a fluid. A detection unit has a physical quantity detector that detects a physical quantity of the fluid in a measurement flow channel. A housing accommodates at least a part of the detection unit and forms the measurement flow channel. The housing includes a housing attachment that is attached to a predetermined attaching target, and a position holder holding a position of the detection unit by contacting the detection unit. The housing includes an inward part positioned inward of the attaching target and an outward part positioned outward of the attaching target. The position holder is provided inward of the housing attachment in an alignment direction along which the inward part and the outward part are aligned.

Abstract: A substrate processing method performed in a substrate processing apparatus includes providing a substrate which has a first film composed of silicon only and a second film including silicon; and etching the first film by plasma formed from a mixed gas including a halogen-containing gas and a silicon-containing gas but not including an oxygen-containing gas.

Abstract: Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of (145 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).

Abstract: A plasma processing apparatus comprises a processing chamber, a gas supply unit, a power supply unit and a frequency control unit. The processing chamber accommodates a target object. The gas supply unit supplies a processing gas into the processing chamber. The power supply unit supplies a power of a predetermined frequency band into the processing chamber to generate plasma of the processing gas in the processing chamber. The frequency control unit sweeps a frequency of the power supplied into the processing chamber by the power supply unit from a first frequency to a second frequency at the time of generating the plasma of the processing gas in the processing chamber.

Abstract: A substrate processing method performed in a substrate processing apparatus includes providing a substrate which has a first film composed of silicon only and a second film including silicon; and etching the first film by plasma formed from a mixed gas including a halogen-containing gas and a silicon-containing gas but not including an oxygen-containing gas.

Abstract: A physical quantity measurement device includes a measurement channel through which the fluid flows to be measured, a physical quantity detector that detects a physical quantity of a fluid in the measurement channel, a housing forming the measurement channel, and a measurement outlet provided in the housing as a downstream end of the measurement channel. An outer peripheral surface of the housing includes an outer peripheral flat surface that extends in an arrangement direction along which an upstream end and a downstream end of the housing are arranged, and an outer peripheral inclined surface inclined with respect to the outer peripheral flat surface and provided between the upstream end and the outer peripheral flat surface in the arrangement direction. The measurement outlet is positioned upstream of the downstream end of the housing.

Abstract: Provided are a light emitting element capable of maintaining high fluorescent intensity over a long period, and a fluorescent light source device. The light emitting element according to the present invention includes: a substrate; a reflection layer formed of a material containing Ag or Al, formed on the upper layer of the substrate; a diffusion prevention layer formed of a layer at least part of which being crystallized, the diffusion prevention layer being formed in contact with a surface of the reflection layer on a side opposite to the substrate; an enhanced reflection layer formed in contact with a surface of the diffusion prevention layer on a side opposite to the substrate; and a fluorescent body layer formed on the upper layer of the enhanced reflection layer.

Abstract: The present invention has as its object the provision of a fluorescent light source device capable of stably obtaining high luminous efficiency and a production process of the same. The fluorescent light source device of the present invention includes a fluorescent plate which has a fluorescent light-emitting layer formed of a polycrystalline material and in which a periodic structure body is formed on an excitation light incident side of the fluorescent light-emitting layer. The fluorescent plate has a thermal diffusion layer which is directly bonded to a front surface of the fluorescent light-emitting layer on the excitation light incident side and has a thermal conductivity larger than that of the fluorescent light-emitting layer, and a high thermal conductive layer provided on a back surface of the fluorescent light-emitting layer opposite to the excitation light incident side.

Abstract: A physical quantity measurement device measures a physical quantity of a fluid. A detection unit has a physical quantity detector that detects a physical quantity of the fluid in a measurement flow channel. A housing accommodates at least a part of the detection unit and forms the measurement flow channel. The housing includes a housing attachment that is attached to a predetermined attaching target, and a position holder holding a position of the detection unit by contacting the detection unit. The housing includes an inward part positioned inward of the attaching target and an outward part positioned outward of the attaching target. The position holder is provided inward of the housing attachment in an alignment direction along which the inward part and the outward part are aligned.

Abstract: An air flow meter includes an inward part that is positioned inward of an intake pipe and an outward part that is positioned not inward but outward of the intake pipe. The air flow meter further includes a first detector provided in the inward part, and a second detector provided at a position closer to the outward part than the first detector.

Abstract: A plasma processing apparatus comprises a processing chamber, a gas supply unit, a power supply unit and a frequency control unit. The processing chamber accommodates a target object. The gas supply unit supplies a processing gas into the processing chamber. The power supply unit supplies a power of a predetermined frequency band into the processing chamber to generate plasma of the processing gas in the processing chamber. The frequency control unit sweeps a frequency of the power supplied into the processing chamber by the power supply unit from a first frequency to a second frequency at the time of generating the plasma of the processing gas in the processing chamber.