Abstract: According to an embodiment, a template includes steps in first to Nth (N is an integer of 2 or greater) stairs formed in a staircase pattern in a height direction. The steps include first steps in the first to Kth (K is an integer of 1 or greater and N?1 or less) stairs and second steps in (K+1)th to Mth (M is an integer of K+1 or greater and N or less) stairs. A height of the second steps is greater than a height of the first steps.

Abstract: According to one embodiment, a template includes a first stepwise structure that includes first level differences and first terraces provided between the first level differences adjacent to each other. The first level differences are a first to an N-th (N is an integer of 3 or more) provided while being shifted in a first direction. Each of the first terraces includes a second stepwise structure that includes second level differences and second terraces provided between the second level differences adjacent to each other. The second level differences are a first to an M-th (M is an integer of 2 or more) provided while being shifted in a second direction perpendicular to the first direction. In the second terraces in each of the first terraces, as a portion dug in the template is deeper, the portion has a larger length in the second direction.

Abstract: A photomask according to the embodiment includes a glass substrate which has a first face and a second face located on a side opposite from the first face. The second face includes a transmission area and a light shielding area corresponding to an exposure pattern of a resist film exposed via the glass substrate. The transmission area is oblique to the first face.

Abstract: According to an embodiment, a template includes steps in first to Nth (N is an integer of 2 or greater) stairs formed in a staircase pattern in a height direction. The steps include first steps in the first to Kth (K is an integer of 1 or greater and N?1 or less) stairs and second steps in (K+1)th to Mth (M is an integer of K+1 or greater and N or less) stairs. A height of the second steps is greater than a height of the first steps.

Abstract: A photomask according to the embodiment includes a glass substrate which has a first face and a second face located on a side opposite from the first face. The second face includes a transmission area and a light shielding area corresponding to an exposure pattern of a resist film exposed via the glass substrate. The transmission area is oblique to the first face.