Abstract: When product inspection results and an inspection frequency for each inspection item are input to the product inspection result input device 1, the inspection items are selected, the presence or absence of product inspection results required for each inspection item is determined, selection of previous product inspection results is performed via the inspection item master 2a and inspection frequency master 2b of the product standard management device 2, and product inspection results for other product batches measured previously are cited for insufficient data for each inspection item missing from the inspection results document according to the inspection item conditions of the inspection results document.

Abstract: This invention relates to a method for detecting crystal defects in a silicon single crystal substrate which contains a dopant with the concentration of at least 7.0.times.10.sup.16 atoms/cm.sup.3. In the method, a native oxide film 2 on the surface of a silicon single crystal substrate 1 is removed, then copper 4 is deposited on the surface of silicon single crystal substrate 1, then the silicon single crystal substrate 1 is etched by an alkaline aqueous solution. Finally, the etched surface of silicon single crystal substrate 1 is observed by visual observation or by an optical microscope to evaluate crystal defects 3 of silicon single crystal substrate 1.