Patents by Inventor Masaki Ohsumi
Masaki Ohsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11161343Abstract: A liquid ejection head includes an ejection orifice forming surface provided with an ejection orifice from which a liquid is ejected. The ejection orifice forming surface includes a first region in a vicinity of the ejection orifice, a second region that is further spaced apart from the ejection orifice than the first region and protrudes from the first region in a liquid ejection direction and a third region that connects the first region and the second region. When a contact angle of pure water in the first region is a first contact angle ?1 and a contact angle of pure water in the third region is a third contact angle ?3, ?1 is larger than ?3 by 10 degrees or more.Type: GrantFiled: December 23, 2019Date of Patent: November 2, 2021Assignee: Canon Kabushiki KaishaInventors: Kenji Tamamori, Masaki Ohsumi, Shingo Nagata
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Patent number: 11155083Abstract: A member transfer method includes sticking a member supported at a support to an object, thinning the support after the sticking of the member to the object, and removing the support from the member after the thinning of the support.Type: GrantFiled: July 15, 2019Date of Patent: October 26, 2021Assignee: Canon Kabushiki KaishaInventors: Teruo Ozaki, Masaki Ohsumi, Tomohiko Nakano, Seiichiro Yaginuma, Keiji Matsumoto
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Publication number: 20200198345Abstract: A liquid ejection head includes an ejection orifice forming surface provided with an ejection orifice from which a liquid is ejected. The ejection orifice forming surface includes a first region in a vicinity of the ejection orifice, a second region that is further spaced apart from the ejection orifice than the first region and protrudes from the first region in a liquid ejection direction and a third region that connects the first region and the second region. ?1 is larger than ?3 by 10 degrees or more, when a contact angle of pure water in the first region is a first contact angle ?1 and a contact angle of pure water in the third region is a third contact angle ?3.Type: ApplicationFiled: December 23, 2019Publication date: June 25, 2020Inventors: Kenji Tamamori, Masaki Ohsumi, Shingo Nagata
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Publication number: 20200023640Abstract: A member transfer method includes sticking a member supported at a support to an object, thinning the support after the sticking of the member to the object, and removing the support from the member after the thinning of the support.Type: ApplicationFiled: July 15, 2019Publication date: January 23, 2020Inventors: Teruo Ozaki, Masaki Ohsumi, Tomohiko Nakano, Seiichiro Yaginuma, Keiji Matsumoto
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Patent number: 9738075Abstract: A liquid discharge head provided with a member having discharge ports formed configured to discharge liquid thereon, wherein a discharge port surface of the member having discharge ports arrayed thereon includes fumed silica.Type: GrantFiled: August 28, 2015Date of Patent: August 22, 2017Assignee: Canon Kabushiki KaishaInventors: Masaki Ohsumi, Kenji Fujii, Junichi Kobayashi, Ken Ikegame, Nobuhisa Tanahashi
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Patent number: 9472639Abstract: A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.Type: GrantFiled: July 18, 2013Date of Patent: October 18, 2016Assignee: Canon Kabushiki KaishaInventors: Hiroyuki Shimoyama, Taichi Yonemoto, Shuji Koyama, Masaki Ohsumi, Keiji Matsumoto, Seiichiro Yaginuma
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Publication number: 20160059553Abstract: A liquid discharge head provided with a member having discharge ports formed configured to discharge liquid thereon, wherein a discharge port surface of the member having discharge ports arrayed thereon includes fumed silica.Type: ApplicationFiled: August 28, 2015Publication date: March 3, 2016Inventors: Masaki Ohsumi, Kenji Fujii, Junichi Kobayashi, Ken Ikegame, Nobuhisa Tanahashi
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Patent number: 9090067Abstract: There is provided a method for manufacturing a liquid discharge head including a substrate in which a liquid supply port is formed, a channel forming member that forms a liquid channel communicating with the liquid supply port on the substrate. The method includes preparing a substrate on which a hole serving as the liquid supply port is open, attaching a dry film on the substrate to cover an opening of the hole with the dry film, curing a cover part of the dry film that covers the hole, patterning the dry film to form a mold for the liquid channel, of a region of the dry film that includes the cover part, forming the channel forming member such that it covers the mold, and removing the mold to form the liquid channel.Type: GrantFiled: November 11, 2014Date of Patent: July 28, 2015Assignee: Canon Kabushiki KaishaInventors: Masaki Ohsumi, Kenji Fujii, Koji Sasaki, Ryotaro Murakami
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Publication number: 20150129542Abstract: There is provided a method for manufacturing a liquid discharge head including a substrate in which a liquid supply port is formed, a channel forming member that forms a liquid channel communicating with the liquid supply port on the substrate. The method includes preparing a substrate on which a hole serving as the liquid supply port is open, attaching a dry film on the substrate to cover an opening of the hole with the dry film, curing a cover part of the dry film that covers the hole, patterning the dry film to form a mold for the liquid channel, of a region of the dry film that includes the cover part, forming the channel forming member such that it covers the mold, and removing the mold to form the liquid channel.Type: ApplicationFiled: November 11, 2014Publication date: May 14, 2015Inventors: Masaki Ohsumi, Kenji Fujii, Koji Sasaki, Ryotaro Murakami
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Patent number: 8956703Abstract: A method for manufacturing a liquid ejecting head including an orifice plate having an ejecting orifice and a liquid channel, and a substrate having a liquid ejecting energy generating element and a liquid supply port, the method including: (1) forming a liquid channel mold of a soluble resin dissolved in (6) on the substrate; (2) coating the liquid channel mold with a photosensitive resin layer having a refractive index of n at an exposure wavelength used in (4); (3) forming an antireflective film having a refractive index of ?n?0.2 or more to ?n+0.2 or less at the exposure wavelength used in (4) on the photosensitive resin layer; (4) exposing and developing the photosensitive resin layer and antireflective film to form the ejecting orifice; (5) forming the liquid supply port on the substrate; and (6) dissolving and removing the liquid channel mold from the liquid supply port.Type: GrantFiled: July 10, 2012Date of Patent: February 17, 2015Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Asai, Masaki Ohsumi, Yoshinori Tagawa
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Publication number: 20140212997Abstract: A process for producing a substrate for a liquid ejection head in which a depressed portion is formed on a second surface that is a surface opposite to a first surface of a silicon substrate having an element formation region on the first surface with a peripheral side region left, the process including the steps of (1) forming an etching mask layer covering the second surface of the silicon substrate; (2) subjecting the etching mask layer and the silicon substrate to laser abrasion processing to form a pattern opening that does not pass through the silicon substrate; and (3) performing a wet etching process to the silicon substrate where the pattern opening is formed from a side of the second surface to form the depressed portion. The depressed portion is formed over a center side region including a position corresponding to the element formation region.Type: ApplicationFiled: January 8, 2014Publication date: July 31, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Seiichiro Yaginuma, Hiroyuki Shimoyama, Masaki Ohsumi, Taichi Yonemoto, Shuji Koyama
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Publication number: 20140199481Abstract: A method for forming a chemical layer on a surface of a substrate by rotationally applying a chemical, including spraying a chemical-removing solvent to a region where a filamentously entangled chemical is generated when excess of the chemical discharged to the outside of the substrate during rotational application of the chemical becomes solidified.Type: ApplicationFiled: January 2, 2014Publication date: July 17, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Masaki Ohsumi, Teruo Ozaki
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Patent number: 8753800Abstract: A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image.Type: GrantFiled: May 28, 2013Date of Patent: June 17, 2014Assignee: Canon Kabushiki KaishaInventors: Kunihito Uohashi, Shuji Koyama, Kazuhiro Asai, Keiji Matsumoto, Tetsuro Honda, Masaki Ohsumi
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Publication number: 20140024148Abstract: A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.Type: ApplicationFiled: July 18, 2013Publication date: January 23, 2014Inventors: Hiroyuki Shimoyama, Taichi Yonemoto, Shuji Koyama, Masaki Ohsumi, Keiji Matsumoto, Seiichiro Yaginuma
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Patent number: 8632163Abstract: A liquid ejecting head includes a liquid ejecting port for ejecting a liquid and a nozzle layer having a liquid channel communicating with the liquid ejecting port. The nozzle layer has two layers: a first layer at the side of the liquid channel having a resin film formed with an acid and a second layer. The first layer has a smaller static contact angle of water as compared with that of the second layer.Type: GrantFiled: June 29, 2012Date of Patent: January 21, 2014Assignee: Canon Kabushiki KaishaInventors: Masaki Ohsumi, Yoshinori Tagawa, Kazuhiro Asai
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Patent number: 8613141Abstract: A manufacturing method of a liquid ejection head provided with a flow passage communicating with an ejection outlet for ejecting liquid includes steps of preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing on the solid layer a pattern having a shape of another part of the flow passage; providing a coating layer, for forming another part of the wall of the flow passage, so as to coat the pattern; providing the ejection outlet to the coating layer; and forming the flow passage by removing the solid layer and the pattern.Type: GrantFiled: November 11, 2008Date of Patent: December 24, 2013Assignee: Canon Kabushiki KaishaInventors: Akihiko Okano, Maki Kato, Masaki Ohsumi, Yoshinori Tagawa, Kazuhiro Asai, Masahiko Kubota, Tamaki Sato
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Publication number: 20130330673Abstract: A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image.Type: ApplicationFiled: May 28, 2013Publication date: December 12, 2013Applicant: CANON KABUSHIKI KAISHAInventors: Kunihito Uohashi, Shuji Koyama, Kazuhiro Asai, Keiji Matsumoto, Tetsuro Honda, Masaki Ohsumi
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Patent number: 8481249Abstract: A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.Type: GrantFiled: July 3, 2012Date of Patent: July 9, 2013Assignee: Canon Kabushiki KaishaInventors: Keiji Matsumoto, Kazuhiro Asai, Tetsuro Honda, Kunihito Uohashi, Shuji Koyama, Masaki Ohsumi
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Patent number: 8450050Abstract: A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.Type: GrantFiled: July 3, 2012Date of Patent: May 28, 2013Assignee: Canon Kabushiki KaishaInventors: Keiji Matsumoto, Kazuhiro Asai, Tetsuro Honda, Kunihito Uohashi, Shuji Koyama, Masaki Ohsumi
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Patent number: 8430476Abstract: A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.Type: GrantFiled: April 26, 2012Date of Patent: April 30, 2013Assignee: Canon Kabushiki KaishaInventors: Jun Yamamuro, Masaki Ohsumi, Masahisa Watanabe, Keiji Edamatsu